US Patent:
20080066619, Mar 20, 2008
Inventors:
John Petinarides - Waxhaw NC, US
International Classification:
B01D 53/22
Abstract:
A gas flow system and method are provided for controlling the moisture in a gas flow. The system may include a gas source from which gas flows, a processing chamber to which the gas flows, and a gas flow line through which the gas flows from the gas source to the processing chamber. The gas flow line may include a moisture control line section. The moisture control line section includes a pass-through line through which the gas may pass, so as to be exposed to a dryer. The exposure to a dryer may be controlled by a suitable valve. A scrubber is disposed in the gas flow line, the scrubber removing contaminates from the gas in the gas flow. The system may include a moisture sensor disposed in the gas flow, the moisture sensor sensing at least one parameter of the gas and outputting a signal representing the at least parameter to a moisture sensor controller, such that the moisture sensor controller determines the moisture in the gas. The moisture sensor controller controls the flow of the gas so as to control the moisture in the gas by adjusting the valve.