Inventors:
Wang Yueh - Portland OR, US
Shane Nolen - Hillsboro OR, US
Balijeet Bains - Portland OR, US
Alison Noble - Hillsboro OR, US
Rex Frost - Hillsboro OR, US
International Classification:
G03C 1/76
Abstract:
A composition including a photoresist formulation and a surfactant additive is described herein.