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Yu Tai Chang

from Houston, TX
Age ~75
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Also known as:
Yu T Chang, Yutai T Chang, Yu Margaret Chang, Yutai Tai Chang, Yutai M Chang, Yutai H Chang, Yutai I Chang, Chang Yu Tai, Yu-Tai Chang, Yt Chang
Phone and address:
15046 Vistamont Dr, Houston, TX 77083
(281) 642-3799
Related to:
Michael L Chang, 47Chanh L Nguyen, 60Grace C Cho, 42Joe Montes, 51Margaret L Chang, 76Chuong H Nguyen, 67Yuan-Hwa J Chang, 69Alicia C Cho, 41Christina C Cho, 46Michelle J Chang, 44
Connected to:
Adam Chang, 43Adela Chang, 88Ahn S Chang, 77Ai L Chang, 61Ailing Chang, 52Aimee K Chang, 52Alec K Chang, 57Alison H Chang, 73Alistair I Chang, 49Allison Chang, 37

Yu Chang Phones & Addresses

  • 15046 Vistamont Dr, Houston, TX 77083 (281) 642-3799
  • Schertz, TX
  • Fremont, CA
  • Angleton, TX
  • Sugar Land, TX
  • Leslie, WV
  • Alief, TX

Professional Records

License Records

Yu Chang

License #:
88287 - Expired
Category:
Nursing Support
Issued Date:
Apr 16, 2009
Effective Date:
Apr 12, 2011
Type:
Nurse Aide

Medicine Doctors

Yu Chang Photo 1

Yu Fang Chang

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Specialties:
Psychiatry
Work:
Maria Sardinas Wellness & Recovery Center
1465 30 St STE K, San Diego, CA 92154
(619) 428-1000 (phone), (619) 428-1091 (fax)

Crossroads Family Center
1679 E Main St STE 102, El Cajon, CA 92021
(619) 441-1907 (phone), (619) 441-1908 (fax)
Languages:
English
Spanish
Tagalog
Description:
Dr. Chang works in San Diego, CA and 1 other location and specializes in Psychiatry.

Lawyers & Attorneys

Yu Chang Photo 2

Yu Ling Chang - Lawyer

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Licenses:
New York - Currently registered 2007
Education:
The University of British Columbia
Specialties:
White Collar Crime - 34%
International Law - 33%
Real Estate - 33%
Yu Chang Photo 3

Yu Chien Chang - Lawyer

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Licenses:
New York - Currently registered 2012
Education:
University of Pennsylvania Law School

Business Records

Name / Title
Company / Classification
Phones & Addresses
Yu Chang
Manager
Royal Dry Cleaners
Dry Cleaners
4 - 40 Richmond Street E., Toronto, ON M5C 1N7
(416) 364-7187
Yu Chang
President
Cai Investment Inc
Yu Chia Chang
President
TOUCH EXPERT INC
Whol Durable Goods
2080 Walsh Ave SUITE A, Santa Clara, CA 95050
Yu Chang
Manager
Royal Dry Cleaners
Dry Cleaners
(416) 364-7187
Yu Ann Chang
SYSC INVESTMENTS, LLC
11715 Empress Oaks Ct, Houston, TX 77082
Yu Zhong Chang
President, Director, Secretary
JIANG HAI TECHNOLOGIES, INC
7457 Harwin Dr STE 309, Houston, TX 77036
Yu Chang
President
MICRO COMPUTER CENTER, INC
Yu Chang
President
C.A.I. INVESTMENTS, INC

Publications

Wikipedia References

Yu Chang Photo 4

Yu Chang

Isbn (Books And Publications)

Making Quality Work: A Leadership Guide for the Results-Driven Manager

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Author

Yu Sang Chang

ISBN #

0887305822

Making Quality Work: A Leadership Guide for the Results-Driven Manager

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Author

Yu Sang Chang

ISBN #

0939246546

Us Patents

Multi-Zone Resistive Heater

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US Patent:
6423949, Jul 23, 2002
Filed:
May 19, 1999
Appl. No.:
09/314845
Inventors:
Steven Aihua Chen - Fremont CA
Henry Ho - San Jose CA
Michael X. Yang - Fremont CA
Bruce W. Peuse - San Carlos CA
Karl Littau - Palo Alto CA
Yu Chang - San Jose CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H05B 368
US Classification:
2194441, 118725
Abstract:
A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater. A method of controlling the temperature in a reactor comprising providing a resistive heater in a chamber of a reactor, measuring the temperature with at least two temperature sensors, and controlling the temperature in the reactor by regulating a power supply to the first heating element and the second heating element according to the temperature measured by the first temperature sensor and the second temperature sensor.

Semiconductor Substrate Processing Chamber Having Interchangeable Lids Actuating Plural Gas Interlock Levels

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US Patent:
6500263, Dec 31, 2002
Filed:
Mar 26, 2001
Appl. No.:
09/817786
Inventors:
Yu Chang - San Jose CA
Wen Xiao Chen - Roseville CA
Assignee:
Applied Materials, Inc, - Santa Clara CA
International Classification:
C23C 16000
US Classification:
118715, 118707, 118733, 42725528
Abstract:
Multiple levels of interlocks are provided relative to gas flow for a chemical vapor deposition chamber. When a chamber lid used for normal processing is in place, no interlock is in effect. When a lid used during maintenance operations is in place, flow of toxic gas to the chamber is interlocked, but flow of purge gas is permitted. When no lid is in place, all gas flow to the chamber is interlocked. The interlock arrangement may be implemented with two switches, both of which are actuated when the lid for normal processing is in place, and only one of which is actuated by the lid for the maintenance process.

Wiring Arrangement Ensuring All-Or-None Operation Of A Series Of Modular Load Elements

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US Patent:
6618265, Sep 9, 2003
Filed:
Oct 1, 2001
Appl. No.:
09/969202
Inventors:
Fong M. Chang - Los Gatos CA
Yu Chang - San Jose CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H05K 702
US Classification:
361760, 361775, 361823, 361828, 307 12, 307 29
Abstract:
All-or-none operation of a series of modular load elements is ensured by routing high and low voltage lines from a power source through opposite nodes positioned at either end of the series of load elements. This arrangement prevents activation of only a portion of the load elements where electrical connection between them is not successfully established.

Multi-Zone Resistive Heater

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US Patent:
6646235, Nov 11, 2003
Filed:
Oct 19, 2001
Appl. No.:
10/037151
Inventors:
Steven Aihua Chen - Fremont CA
Henry Ho - San Jose CA
Michael X. Yang - Fremont CA
Bruce W. Peuse - San Carlos CA
Karl Littau - Palo Alto CA
Yu Chang - San Jose CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H05B 368
US Classification:
2194441, 118725
Abstract:
A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater. A method of controlling the temperature in a reactor comprising providing a resistive heater in a chamber of a reactor, measuring the temperature with at least two temperature sensors, and controlling the temperature in the reactor by regulating a power supply to the first heating element and the second heating element according to the temperature measured by the first temperature sensor and the second temperature sensor.

Valve Control System For Atomic Layer Deposition Chamber

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US Patent:
6734020, May 11, 2004
Filed:
Mar 7, 2001
Appl. No.:
09/800881
Inventors:
Siqing Lu - San Jose CA
Yu Chang - San Jose CA
Dongxi Sun - Cupertino CA
Vinh Dang - San Jose CA
Michael X. Yang - Palo Alto CA
Anzhong Chang - San Jose CA
Anh N. Nguyen - Milpitas CA
Ming Xi - Milpitas CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G01N 3508
US Classification:
436 55
Abstract:
A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.

High Speed Optical Transmission Assembly

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US Patent:
7039083, May 2, 2006
Filed:
Mar 12, 2003
Appl. No.:
10/387926
Inventors:
Chris H. Carroll - Santa Clara CA, US
Shiming Wang - Fremont CA, US
Yu Chung Chang - Cupertino CA, US
Joseph Indhiran Vanniasinkam - Toronto, CA
Assignee:
Opnext, Inc. - Fremont CA
International Classification:
H01S 3/04
US Classification:
372 36, 372 34
Abstract:
An optical assembly that can be utilized as a transmitter in a high data rate optical transceiver system is presented. The optical assembly allows a laser driver to be mounted near the laser and allows the laser driver and the laser to utilize a common heat sink. Further, assembly can be performed reliably and quickly to reduce the cost of production of the optical assembly.

Method And Apparatus For Dynamically Measuring The Thickness Of An Object

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US Patent:
7112961, Sep 26, 2006
Filed:
Oct 14, 2003
Appl. No.:
10/685210
Inventors:
Lawrence C. Lei - Milpitas CA, US
Siqing Lu - San Jose CA, US
Yu Chang - San Jose CA, US
Cecilia Martner - Los Gatos CA, US
Quyen Pham - Sunnyvale CA, US
Yu Ping Gu - Sunnyvale CA, US
Joel Huston - San Jose CA, US
Paul Smith - Campbell CA, US
Gabriel Lorimer Miller - Eastham MA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G01B 7/06
G01N 27/72
US Classification:
324230, 324226
Abstract:
A method and apparatus are provided for measuring the thickness of a test object. The apparatus includes an eddy current sensor having first and second sensor heads. The sensor heads are positioned to have a predetermined gap therebetween for passage by at least a portion of the test object through the gap. The sensor heads make measurements at given sampling locations on the test object as the test object is moved through the gap. The apparatus also includes a position sensing mechanism to determine positions of the sampling locations on the test object. The apparatus also includes an evaluation circuit in communication with the eddy current sensor and to the position sensing mechanism for determining the thickness of the test object at the sampling locations.

Valve Control System For Atomic Layer Deposition Chamber

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US Patent:
7201803, Apr 10, 2007
Filed:
Dec 9, 2003
Appl. No.:
10/731651
Inventors:
Siqing Lu - San Jose CA, US
Yu Chang - San Jose CA, US
Dongxi Sun - Cupertino CA, US
Vinh Dang - San Jose CA, US
Michael X. Yang - Palo Alto CA, US
Anzhong (Andrew) Chang - San Jose CA, US
Anh N. Nguyen - Milpitas CA, US
Ming Xi - Milpitas CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
B05C 11/00
US Classification:
118710
Abstract:
A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.
Control profile
Yu Tai Chang from Houston, TX, age ~75 Get Report