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Younus M Vora

from San Jose, CA
Age ~67
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Related to:
Sohaib H VoraFatema Vora Seher, 32Hasan Vora Sohaib, 31
Connected to:
Adnan Z Vora, 49Ameeta V Vora, 56Amish Vora, 33Anjali S Vora, 36Ariana J Vora, 50Ashit K Vora, 39Ateet A Vora, 42Atul S Vora, 68Bhargav P Vora, 42Bindu K Vora, 47

Younus Vora Phones & Addresses

  • 3060 Serpa Dr, San Jose, CA 95148 (408) 223-7529
  • Sunnyvale, CA
  • Cupertino, CA
  • Happy Valley, OR
  • Sparks, NV
  • Corvallis, OR
  • Santa Clara, CA

Work

Company: Kla-tencor ebeam division 2015 Position: Program manager - kla-tencor

Education

Degree: Master of Science, Masters School / High School: Oregon State University 1982 to 1985 Specialities: Engineering

Skills

Semiconductors • Product Development • Cross Functional Team Leadership • Product Management • Systems Engineering • Product Lifecycle Management • Engineering Management • Automation • Simulations • Semiconductor Industry • Matlab • Optics • Program Management • Testing • Software Development • Management • R&D • Engineering

Languages

English • Urdu • Gujarati • German • Arabic

Ranks

Certificate: An Introduction To Interactive Programming In Python

Interests

Poverty Alleviation • Science and Technology • Education

Industries

Semiconductors

Resumes

Resumes

Younus Vora Photo 1

Program Manager - Kla-Tencor

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Location:
San Francisco, CA
Industry:
Semiconductors
Work:
Kla-Tencor Ebeam Division
Program Manager - Kla-Tencor
Kla-Tencor Optical Wafer Inspection Division 2008 - 2015
Systems Engineer Manager and Program Manager
Kla-Tencor 1999 - 2008
Software Development Manager
Kla-Tencor 1994 - 1999
Software Engineer
Prometrix Corp 1990 - 1994
Mechanical Engineer
Education:
Oregon State University 1982 - 1985
Master of Science, Masters, Engineering Ned University of Engineering and Technology 1975 - 1980
Bachelor of Engineering, Bachelors, Engineering
Skills:
Semiconductors
Product Development
Cross Functional Team Leadership
Product Management
Systems Engineering
Product Lifecycle Management
Engineering Management
Automation
Simulations
Semiconductor Industry
Matlab
Optics
Program Management
Testing
Software Development
Management
R&D
Engineering
Interests:
Poverty Alleviation
Science and Technology
Education
Languages:
English
Urdu
Gujarati
German
Arabic
Certifications:
An Introduction To Interactive Programming In Python
Coursera

Publications

Us Patents

Computer-Implemented Methods, Computer-Readable Media, And Systems For Identifying One Or More Optical Modes Of An Inspection System As Candidates For Use In Inspection Of A Layer Of A Wafer

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US Patent:
8073240, Dec 6, 2011
Filed:
May 6, 2008
Appl. No.:
12/115832
Inventors:
Verlyn Fischer - San Jose CA, US
Chris Maher - Campbell CA, US
Harish Hiriyannaiah - San Jose CA, US
Younus Vora - San Jose CA, US
Ping Ding - San Jose CA, US
Andrew Hill - San Jose CA, US
Assignee:
KLA-Tencor Corp. - San Jose CA
International Classification:
G06K 9/00
US Classification:
382145
Abstract:
Computer-implemented methods, computer-readable media, and systems for identifying one or more optical modes of an inspection system as candidates for use in inspection of a layer of a wafer are provided. One method includes determining one or more characteristics of images of the layer of the wafer acquired using the inspection system and different optical modes available on the inspection system. The method also includes identifying a first portion of the different optical modes as not candidates for use in the inspection of the layer of the wafer based on the one or more characteristics of the images. In addition, the method includes generating output by eliminating the first portion of the different optical modes from the different optical modes at which the images were acquired such that the output includes a second portion of the different optical modes indicated as the candidates for use in the inspection.

Diode Laser Based Broad Band Light Sources For Wafer Inspection Tools

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US Patent:
20130342825, Dec 26, 2013
Filed:
Jun 21, 2013
Appl. No.:
13/924216
Inventors:
Younus Vora - San Jose CA, US
Rudolf Brunner - Mountain View CA, US
International Classification:
G01N 21/95
US Classification:
356 51, 3562375
Abstract:
Disclosed are methods and apparatus for performing inspection or metrology of a semiconductor device. The apparatus includes a plurality of laser diode arrays that are configurable to provide an incident beam having different wavelength ranges. The apparatus also includes optics for directing the incident beam towards the sample, a detector for generating an output signal or image based on an output beam emanating from the sample in response to the incident beam, and optics for directing the output beam towards the detector. The apparatus further includes a controller for configuring the laser diode arrays to provide the incident beam at the different wavelength ranges and detecting defects or characterizing a feature of the sample based on the output signal or image.

Method And Apparatus To Reduce Thermal Stress By Regulation And Control Of Lamp Operating Temperatures

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US Patent:
20140060792, Mar 6, 2014
Filed:
Aug 26, 2013
Appl. No.:
13/975945
Inventors:
Anant Chimmalgi - San Jose CA, US
Rajeev Patil - Fremont CA, US
Erik Kim - Sunnyvale CA, US
Rudolf Brunner - Mountain View CA, US
Quang Giang - San Francisco CA, US
Lauren Wilson - San Jose CA, US
Ken Gross - San Carlos CA, US
Ilya Bezel - Sunnyvale CA, US
Dan Scott - San Jose CA, US
Younus Vora - San Jose CA, US
Matthew Derstine - Los Gatos CA, US
Cedric Lasfargues - Castro Valley CA, US
Assignee:
KLA-Tencor Corporation - Milpitas CA
International Classification:
F28C 3/04
US Classification:
165185
Abstract:
A fluid input manifold distributes injected fluid around the body of a bulb to cool the bulb below a threshold. The injected fluid also distributes heat more evenly along the surface of the bulb to reduce thermal stress. The fluid input manifold may comprise one or more airfoils to direct a substantially laminar fluid flow along the surface of the bulb or it may comprise a plurality of fluid injection nozzles oriented to produce a substantially laminar fluid flow. An output portion may be configured to facilitate fluid flow along the surface of the bulb by allowing injected fluid to easily escape after absorbing heat from the bulb or by applying negative pressure to actively draw injected fluid along the surface of the bulb and away.

Method And Apparatus For Imaging Dense Linewidth Features Using An Optical Microscope

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US Patent:
53863178, Jan 31, 1995
Filed:
May 13, 1992
Appl. No.:
7/882499
Inventors:
Timothy R. Corle - Palo Alto CA
Younus Vora - San Jose CA
Kamran Sarmadi - Milpitas CA
Assignee:
Prometrix Corporation - Santa Clara CA
International Classification:
G02B 2106
G02B 2700
US Classification:
359386
Abstract:
A method and apparatus for imaging a substrate (such as silicon or silicon dioxide) beneath and between a dense array of strips (such as photoresist strips composed of dielectric or other material) using a polarizing optical microscope. In preferred embodiments, the apparatus of the invention includes a polarizer for polarizing optical illuminating radiation, an analyzer for receiving polarized radiation reflected from the sample, and a variable retarder whose retardation characteristic can be controlled to enhance the light signal transmitted through the analyzer from the substrate in a region of interest of the sample. The variable retarder can be a fixedly mounted retarder whose birefringence is variable in response to a control signal, or a rotatably mounted retarder plate having fixed birefringence which is mechanically rotatable to control the orientation of its optical axis. In one embodiment, the retarder is a quarter wave plate, the projection on the sample of the polarization axis of linearly polarized radiation from the polarizer forms an angle of about 45 degrees to the sample's strips, and the optical axis of the quarter wave plate is oriented at an optimal angle to the strips, so that the quarter wave plate converts the linearly polarized illuminating radiation into elliptically polarized radiation, the elliptically polarized radiation undergoes a polarization change upon reflection from the sample, and the quarter wave plate converts the reflected elliptically polarized radiation from the sample into radiation whose polarization is oriented so that it can be transmitted by the analyzer.

Diode Laser Based Broad Band Light Sources For Wafer Inspection Tools

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US Patent:
20150042979, Feb 12, 2015
Filed:
Oct 23, 2014
Appl. No.:
14/521977
Inventors:
- Milpitas CA, US
Younus Vora - San Jose CA, US
Rudolf Brunner - Mountain View CA, US
Assignee:
KLA-Tencor Corporation - Milpitas CA
International Classification:
G01N 21/95
US Classification:
356 51, 3562374
Abstract:
Disclosed are methods and apparatus for performing inspection or metrology of a semiconductor device. The apparatus includes a plurality of laser diode arrays that are configurable to provide an incident beam having different wavelength ranges. At least some of the laser diode arrays form two dimensional stacks that have different wavelength ranges from each other. The apparatus also includes optics for directing the incident beam towards the sample, a detector for generating an output signal or image based on an output beam emanating from the sample in response to the incident beam, and optics for directing the output beam towards the detector. The apparatus further includes a controller for configuring the laser diode arrays to provide the incident beam at the different wavelength ranges and detecting defects or characterizing a feature of the sample based on the output signal or image.
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Younus M Vora from San Jose, CA, age ~67 Get Report