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Yoshikazu Takiguchi Phones & Addresses

  • Freeport, NY
  • 7 Shadow Ln, Larchmont, NY 10538 (914) 833-0862
  • Port Washington, NY
  • Hartsdale, NY

Publications

Us Patents

Process For Producing Multilayer Wiring Boards

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US Patent:
60109564, Jan 4, 2000
Filed:
Feb 27, 1997
Appl. No.:
8/807504
Inventors:
Yoshikazu Takiguchi - New York NY
Hiroyuki Obiya - Kanagawa-ken, JP
Toru Takahashi - Kanagawa-ken, JP
Taisuke Shiroyama - Kanagawa-ken, JP
Kenji Tazawa - Kanagawa-ken, JP
Assignee:
Tokyo Ohka Kogyo Co., Ltd. - Kanagawa
International Classification:
H01L 214763
US Classification:
438623
Abstract:
An improved process for producing a multilayer wiring board that has a plurality of conductor patterns and an interlevel dielectric layer on at least one surface of a substrate, with via holes or trench-like channels being provided at specified sites of said interlevel dielectric layer to establish an electrical interconnection between said conductor patterns, wherein prior to the provision of said via holes or trench-like channels, a coating having resistance to sandblasting is formed in a pattern over the interlevel dielectric layer and then sandblasting is performed to remove the interlevel dielectric layer in selected areas to form the via holes or trench-like channels and, thereafter, the coating having resistance to sandblasting is removed, followed by the provision of a conductive layer.

Process For Producing Multilayer Wiring Boards

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US Patent:
62284657, May 8, 2001
Filed:
Mar 22, 1999
Appl. No.:
9/273265
Inventors:
Yoshikazu Takiguchi - Port Washington NY
Hiroyuki Obiya - Kanagawa-ken, JP
Toru Takahashi - Kanagawa-ken, JP
Taisuke Shiroyama - Kanagawa-ken, JP
Kenji Tazawa - Kanagawa-ken, JP
Assignee:
Tokyo Ohka Kogyo Co., Ltd. - Kanagawa-ken
International Classification:
B32B 300
US Classification:
428209
Abstract:
An improved process for producing a multilayer wiring board that has a plurality of conductor patterns and an interlevel dielectric layer on at least one surface of a substrate, with via holes or trench-like channels being provided at specified sites of said interlevel dielectric layer to establish an electrical interconnection between said conductor patterns, wherein prior to the provision of said via holes or trench-like channels, a coating having resistance to sandblasting is formed in a pattern over the interlevel dielectric layer and then sandblasting is performed to remove the interlevel dielectric layer in selected areas to form the via holes or trench-like channels and, thereafter, the coating having resistance to sandblasting is removed, followed by the provision of a conductive layer.
Yoshikazu Takiguchi from Freeport, NY, age ~69 Get Report