Yong Liu

6670082, Dec 30, 2003

Oct 9, 2001

09/974507

Yong Liu - Fremont CA
Hua-Yu Liu - Palo Alto CA

Numerical Technologies, Inc. - Mountain View CA

G03F 900

430 5, 716 19

An accurate, cost-effective system and method for correcting 3D effects on an alternating phase-shifting mask (PSM) is provided. To facilitate this correction, a library can be built to include a first group of 180 degree phase-shifting regions, wherein these regions have a common first size. Based on this first size, 3D simulation is performed. A transmission and a phase are altered in a 2D simulation based on this first size until a shape dependent transmission and a shape dependent phase allow the 2D simulation to substantially match the 3D simulation. Finally, a modified first size is chosen using the shape dependent transmission and the shape dependent phase such that a 2D simulation based on the modified first size substantially matches the 3D simulation based on the first size. The library associates the first size with the modified first size, the shape dependent transmission, and the shape dependent phase.

6830854, Dec 14, 2004

Oct 14, 2003

10/685751

Yong Liu - Fremont CA
Hua-Yu Liu - Palo Alto CA

Numerical Technologies, Inc. - Mountain View CA

G03F 900

430 5

An accurate, cost-effective system and method for correcting 3D effects on an alternating phase-shifting mask (PSM) is provided. To facilitate this correction, a library can be built to include a first group of 180 degree phase-shifting regions, wherein these regions have a common first size. Based on this first size, 3D simulation is performed. A transmission and a phase are altered in a 2D simulation based on this first size until a shape dependent transmission and a shape dependent phase allow the 2D simulation to substantially match the 3D simulation. Finally, a modified first size is chosen using the shape dependent transmission and the shape dependent phase such that a 2D simulation based on the modified first size substantially matches the 3D simulation based on the first size. The library associates the first size with the modified first size, the shape dependent transmission, and the shape dependent phase.

7602199, Oct 13, 2009

May 9, 2007

11/746515

Benjamin M. Johnston - Los Gatos CA, US
Sriram Krishnaswami - Saratoga CA, US
Hung T. Nguyen - Fremont CA, US
Matthias Brunner - Kirchheim, DE
Yong Liu - San Jose CA, US

Applied Materials, Inc. - Santa Clara CA

G01R 31/02
G01R 31/00
G01R 31/26
G01R 31/28
G02F 1/133

324754, 324761, 324770, 324765, 3241581, 349 31

An apparatus and method for testing large area substrates is described. The large area substrates include patterns of displays and contact points electrically coupled to the displays. The apparatus includes a prober assembly that is movable relative to the large area substrate and may be configured to test various patterns of displays and contact points. The prober assembly is also configured to test fractional sections of the large area substrate. The apparatus also includes a test chamber configured to store at least two prober assemblies within an interior volume.

7751332, Jul 6, 2010

Oct 25, 2007

11/923777

Yong Liu - San Jose CA, US
Eun Il Seo - Hwaseong-si, KR
Jin Young Yang - Seoul, KR
Myung Jong Lee - New York NY, US
Xuhui Hu - New York NY, US

Samsung Electronics Co., Ltd. - Suwon-si
The Research Foundation of the City University of New York - New York NY

H04L 12/28

370238, 370251, 370254, 709241

A data routing method and system, the data routing method including: locating a destination node using a destination locating packet; establishing a preliminary route including anchor nodes based on a route where the destination locating packet is transmitted to the destination node; determining a link cost between neighbor nodes of each of the anchor nodes, and also between the anchor nodes and the neighbor nodes of each of the anchor nodes; generating minimum cost information with respect to a route consuming a minimum cost from the destination node to a source node using the link cost; and forming a data route from the destination node to the source node using the minimum cost information.

7786742, Aug 31, 2010

May 9, 2007

11/746530

Sriram Krishnaswami - Saratoga CA, US
Matthias Brunner - Kirchheim, DE
William Beaton - San Mateo CA, US
Yong Liu - San Jose CA, US
Benjamin M. Johnston - Los Gatos CA, US
Hung T. Nguyen - Fremont CA, US
Ludwig Ledl - Groebenzell, DE
Ralf Schmid - Poing, DE

Applied Materials, Inc. - Santa Clara CA

G01R 31/02

324754, 324758

An apparatus and method for testing large area substrates is described. The large area substrates include patterns of displays and contact points electrically coupled to the displays on the large area substrate. The apparatus includes a prober assembly that is movable relative to the large area substrate and/or the contact points, and may be configured to test various patterns of displays and contact points on various large area substrates. The prober assembly is also configured to test fractional sections of the large area substrate positioned on a testing table, and the prober assembly may be configured for different display and contact point patterns without removing the prober assembly from the testing table.

7793253, Sep 7, 2010

Oct 4, 2006

11/538782

Daniel S. Abrams - Mountain View CA, US
Danping Peng - Fremont CA, US
Yong Liu - Fremont CA, US
Paul Rissman - Palo Alto CA, US

Luminescent Technologies, Inc. - Palo Alto CA

G06F 17/50

716 19, 716 21

A method for determining a mask pattern to be used on a photo-mask in a photolithographic process is described. During the method, a target pattern that includes at least one continuous feature is provided. Then a mask pattern that includes a plurality of distinct types of regions corresponding to the distinct types of regions of the photo-mask is determined. Note that the mask pattern includes at least two separate features corresponding to at least the one continuous feature. Furthermore, at least the two separate features are separated by a spacing having a length and the spacing overlaps at least a portion of at least the one continuous feature.

8082525, Dec 20, 2011

Apr 14, 2009

12/423693

Yong Liu - Fremont CA, US
John F. McCarty - Redwood City CA, US
Kelly Gordon Russell - Santa Clara CA, US
Linyong Pang - Palo Alto CA, US

Luminescent Technologies, Inc. - Palo Alto CA

G06F 17/50
G06F 19/00
G03F 1/00
G21K 5/00

716 52, 716 53, 716 54, 716 55, 716111, 700120, 700121, 430 5, 378 35

Embodiments of a method for determining a mask pattern to be used on a photo-mask in a lithography process are described. This method may be performed by a computer system. During operation, this computer system receives at least a portion of a first mask pattern including first regions that violate pre-determined rules associated with the photo-mask. Next, the computer system determines a second mask pattern based on at least the portion of the first mask pattern, where the second mask pattern includes second regions that are estimated to comply with the pre-determined rules. Note that the second regions correspond to the first regions, and the second mask pattern is determined using a different technique than that used to determine the first mask pattern.

8115260, Feb 14, 2012

Jan 6, 2010

12/683058

Dan Kinzer - San Jose CA, US
Yong Liu - Scarborough ME, US
Stephen Martin - South Portland ME, US

Fairchild Semiconductor Corporation - San Jose CA

H01L 27/088

257401, 257500, 257724, 257774, 257E23169, 257E2706

This document discusses, among other things, an IC package including first and a second discrete components fabricated into a semiconductor substrate. The first and second discrete components can be adjacent to one another in the semiconductor substrate, and an integrated circuit die can be mounted on the semiconductor substrate and coupled to the first and second discrete components.