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Yang Da

from Austin, TX
Age ~50
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Also known as:
Da A Yang
Related to:
Jingyi Yang, 50Yu W YangKuei L YangWei Wang, 46Shengjun Wang, 61Xiaoyu Wang, 43
Connected to:
Angela Da, 50Bryan J Da, 32Gloria D Da, 74Jackson Da, 81Jia Da, 40Liang Da, 39Lin Da, 44Marcus G Da, 45Meng Da, 32Moon Da, 66

Yang Da Phones & Addresses

  • Austin, TX
  • 11740 Scripps Creek Dr, San Diego, CA 92131
  • Wappingers Falls, NY
  • Fishkill, NY
  • Scottsdale, AZ
  • Ithaca, NY
  • Cleveland, OH
  • Tucson, AZ

Resumes

Resumes

Yang Da Photo 1

Senior Advisor, Data Modeling Analysis

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Location:
Austin, TX
Industry:
Financial Services
Work:
Travelers
Senior Consultant, Predictive Modeling and Research
Education:
University of Illinois at Urbana-Champaign
University of Science and Technology of China
Skills:
Predictive Analytics
Statistical Modeling
Predictive Modeling
Insurance
R
Sas
Data Mining
Actuarial Science
Data Analysis
Databases
Data Modeling
Analytics
Sas Programming
Yang Da Photo 2

Yang Da

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Publications

Us Patents

Combining Cut Mask Lithography And Conventional Lithography To Achieve Sub-Threshold Pattern Features

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US Patent:
20140312500, Oct 23, 2014
Filed:
Apr 17, 2013
Appl. No.:
13/864344
Inventors:
- San Diego CA, US
Zhongze Wang - San Diego CA, US
Yang Da - San Diego CA, US
Assignee:
Qualcomm Incorporated - San Diego CA
International Classification:
H01L 21/283
H01L 21/768
H01L 23/50
US Classification:
257773, 438597, 355 18
Abstract:
Features are fabricated on a semiconductor chip. The features are smaller than the threshold of the lithography used to create the chip. A method includes patterning a first portion of a feature (such as a local interconnect) and a second portion of the feature to be separated by a predetermined distance, such as a line tip to tip space or a line space. The method further includes patterning the first portion with a cut mask to form a first sub-portion (e.g., a contact) and a second sub-portion. A dimension of the first sub-portion is less than a dimension of a second predetermined distance, which may be a line length resolution of a lithographic process having a specified width resolution. A feature of a semiconductor device includes a first portion and a second portion having a dimension less than a lithographic resolution of the first portion.
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Yang Da from Austin, TX, age ~50 Get Report