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Windy L Farnsworth

from New Milford, CT

Windy Farnsworth Phones & Addresses

  • 10 Pheasant Ln, New Milford, CT 06776 (860) 210-0746
  • Selden, NY
  • New York, NY
  • South Jordan, UT

Work

Company: Asml lithography Feb 2005 Position: Senior fea analyst

Education

Degree: BS School / High School: California State Polytechnic University-Pomona 1977 to 1980 Specialities: Aerospace Engineering

Skills

Fea Analysis and Post Processing • Team Leadership • Aerospace Engineering • Machine Design • Computer Proficiency • Construction • Private Piloting • Aircraft • Analysis

Interests

Disaster and Humanitarian Relief

Emails

Industries

Electrical/Electronic Manufacturing

Resumes

Resumes

Windy Farnsworth Photo 1

Senior Fea Analyst

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Location:
New Milford, CT
Industry:
Electrical/Electronic Manufacturing
Work:
ASML Lithography since Feb 2005
Senior FEA Analyst

ASML since Dec 2004
Senior Engineer

ASML Corp since Dec 2004
Senior Engineer

GE Aircraft Engines Feb 2002 - Dec 2009
Senior Engineer

Belcan Jan 2002 - Jun 2007
Project Engineer
Education:
California State Polytechnic University-Pomona 1977 - 1980
BS, Aerospace Engineering
California State Polytechnic University 1980
Degree: Bachelor, Aerospace Engineering; Science
California Polytechnic State University-San Luis Obispo 1975 - 1977
BS, Aerospace Engineering
Skills:
Fea Analysis and Post Processing
Team Leadership
Aerospace Engineering
Machine Design
Computer Proficiency
Construction
Private Piloting
Aircraft
Analysis
Interests:
Disaster and Humanitarian Relief

Publications

Us Patents

Lithographic Apparatus, Projection System And Damper For Use In A Lithographic Apparatus And Device Manufacturing Method

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US Patent:
20090180091, Jul 16, 2009
Filed:
Oct 27, 2008
Appl. No.:
12/258689
Inventors:
Windy Lynn FARNSWORTH - New Milford CT, US
Santiago E. Del Puerto - Milton NY, US
Samir A. Nayfeh - Shrewsbury MA, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/54
G03B 27/58
F16F 9/34
US Classification:
355 67, 355 72, 188275
Abstract:
In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.

Apparatus For Supporting And Optical Element, And Method Of Making Same

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US Patent:
20110109891, May 12, 2011
Filed:
Apr 15, 2009
Appl. No.:
12/933506
Inventors:
Windy Lynn Farnsworth - New Milford CT, US
Sohrab Simani - Norwalk CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/54
G02B 7/02
B23H 1/00
B23P 11/00
US Classification:
355 67, 359811, 219 6911, 29428
Abstract:
An apparatus for supporting an optical element is provided. The apparatus includes a lens cell () and a plurality of fingers () coupled to the lens cell. Each finger includes a base () configured to be coupled to the optical element when mounted therein, first () and second () flexures coupled at first respective ends to and extending from the base () at a divergence angle between about 75 and 165 degrees, and a mounting member () configured to couple together second respective ends of the first and second flexures. The mounting member thereby couples the base () to the lens cell ().
Windy L Farnsworth from New Milford, CT Get Report