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Wenjian Cai

from San Francisco, CA
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Related to:
James Y Kim, 53Danny Huang, 36Li Ming Tan, 68Huan Cai Yin, 63Francis Hok Ha, 56Lianxiang Cai, 70Sandy Choi, 52Andy Choi, 55Lie CaiDianxin Cai, 69June Choi Louie, 61
Connected to:
Adam Cai, 33Adrianne Cai, 39Amelia Cai, 32Anthony R Cai, 32Antony Cai, 30Bei Cai, 62Ben L Cai, 41Chaotong Cai, 41Chaoyin Cai, 41Cheryl Q Cai, 54

Wenjian Cai Phones & Addresses

  • San Francisco, CA

Resumes

Resumes

Wenjian Cai Photo 1

Manager, Optical Engineering

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Location:
7 Technology Dr, Livermore, CA 94551
Industry:
Semiconductors
Work:
KLA-Tencor since May 2006
Optical Engineer
Education:
University of Colorado at Boulder 1999 - 2006
Ph.D, Physics University of Science and Technology of China 1994 - 1999
B.S., Physics
Skills:
Optics
Matlab
Metrology
Semiconductors
Optical Engineering
Physics
Sensors
Thin Films
Zemax
Labview
Nanotechnology
R
Wenjian Cai Photo 2

Wenjian Cai

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Publications

Us Patents

System And Method For Apodization In A Semiconductor Device Inspection System

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US Patent:
20140016125, Jan 16, 2014
Filed:
Feb 6, 2013
Appl. No.:
13/760829
Inventors:
Gary Janik - Palo Alto CA, US
Steve Cui - Fremont CA, US
Rex Runyon - , US
Dieter Wilk - San Jose CA, US
Steve Short - San Jose CA, US
Mikhail Haurylau - San Jose CA, US
Qiang Q. Zhang - San Jose CA, US
Grace Hsiu-Ling Chen - Los Gatos CA, US
Robert M. Danen - San Jose CA, US
Suwipin Martono - Castro Valley CA, US
Shobhit Verma - Fremont CA, US
Wenjian Cai - Sunnyvale CA, US
Meier Brender - San Jose CA, US
Assignee:
KLA-TENCOR CORPORATION - Milpitas CA
International Classification:
G01N 21/88
G02B 27/58
US Classification:
3562375, 359227
Abstract:
An inspection system with selectable apodization includes an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light emanating from the surface of the sample, the illumination source and the detector being optically coupled via an optical pathway of an optical system, a selectably configurable apodization device disposed along the optical pathway, wherein the apodization device includes one or more apodization elements operatively coupled to one or more actuation stages configured to selectably actuate the one or more apodization elements along one or more directions, and a control system communicatively coupled to the one or more actuation and configured to selectably control apodization of illumination transmitted along the optical pathway by controlling an actuation state of the one or more apodization elements.

System And Method For Apodization In A Semiconductor Device Inspection System

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US Patent:
20160054232, Feb 25, 2016
Filed:
Nov 2, 2015
Appl. No.:
14/930254
Inventors:
- Milpitas CA, US
Gary Janik - Palo Alto CA, US
Steve Cui - Fremont CA, US
Rex Runyon - , US
Dieter Wilk - San Jose CA, US
Steve Short - San Jose CA, US
Mikhail Haurylau - San Jose CA, US
Qiang Q. Zhang - San Jose CA, US
Grace Hsiu-Ling Chen - Los Gatos CA, US
Robert M. Danen - San Jose CA, US
Suwipin Martono - Castro Valley CA, US
Shobhit Verma - Fremont CA, US
Wenjian Cai - Sunnyvale CA, US
Meier Brender - San Jose CA, US
International Classification:
G01N 21/88
G01N 21/95
Abstract:
An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.
Control profile
Wenjian Cai from San Francisco, CA Get Report