Search

Wenbo Yan

from Redmond, WA
Age ~42
Get Report
Also known as:
Wen Bo Yan
Related to:
Qilin X Qi, 36Yanhong Zhao, 43
Connected to:
Andrew H Yan, 45Beizhan Yan, 54Camellia J Yan, 45Cecile S Yan, 73Chang Q Yan, 63Demas W Yan, 61Demi X Yan, 28Elena Yan, 51Elsa W Yan, 41Emy K Yan, 75

Wenbo Yan Phones & Addresses

  • Redmond, WA
  • Plantation, FL
  • Coral Springs, FL
  • Milpitas, CA
  • San Jose, CA
  • Sunnyvale, CA
  • Irvine, CA

Work

Company: Amazon May 2019 Position: Data scientist

Education

Degree: Doctorates, Doctor of Philosophy School / High School: Uc Irvine 2008 to 2013 Specialities: Philosophy, Chemistry

Skills

Powder X Ray Diffraction • Afm • Nanotechnology • Nanomaterials • Electrochemistry • Materials Science • Characterization • Photolithography • Scanning Electron Microscopy • Tem • Chemistry • Nanofabrication • Mathematica • Experimentation • Lithium Ion Batteries • Spectroscopy • Design of Experiments • Microfabrication • Analytical Chemistry • Supercapacitors • Ir Spectroscopy • Uv/Vis • Fib • Nanoparticles • Surface Chemistry • Chromatography • Igor Pro • Microsoft Office • Materials • Xrd • 1H Nmr • Thin Films • Atomic Layer Deposition • Python • Machine Learning • Sql • Data Mining • Statistics • R • Latex • Data Analysis • Design of Experiments • Material Science • Html • Javascript • Statistical Inference • Jmp • T Tests • Hypothesis Testing • Deep Learning • Natural Language Processing • Tensorflow • Kereas

Languages

English • Mandarin

Ranks

Certificate: Deep Learning Specialization

Industries

Internet

Resumes

Resumes

Wenbo Yan Photo 1

Data Scientist

View page
Location:
San Francisco, CA
Industry:
Internet
Work:
Amazon
Data Scientist
Insight Data Science
Fellow
Magic Leap Jun 2017 - Dec 2018
Senior Optical Process Engineer
Applied Materials Aug 2013 - Jan 2016
Ald Process Engineer and Li-Ion Battery
Uc Irvine Jan 2009 - Jul 2013
Research Assistant
Education:
Uc Irvine 2008 - 2013
Doctorates, Doctor of Philosophy, Philosophy, Chemistry
Skills:
Powder X Ray Diffraction
Afm
Nanotechnology
Nanomaterials
Electrochemistry
Materials Science
Characterization
Photolithography
Scanning Electron Microscopy
Tem
Chemistry
Nanofabrication
Mathematica
Experimentation
Lithium Ion Batteries
Spectroscopy
Design of Experiments
Microfabrication
Analytical Chemistry
Supercapacitors
Ir Spectroscopy
Uv/Vis
Fib
Nanoparticles
Surface Chemistry
Chromatography
Igor Pro
Microsoft Office
Materials
Xrd
1H Nmr
Thin Films
Atomic Layer Deposition
Python
Machine Learning
Sql
Data Mining
Statistics
R
Latex
Data Analysis
Design of Experiments
Material Science
Html
Javascript
Statistical Inference
Jmp
T Tests
Hypothesis Testing
Deep Learning
Natural Language Processing
Tensorflow
Kereas
Languages:
English
Mandarin
Certifications:
Deep Learning Specialization
Applied Data Science With Python
Machine Learning
Python For Everybody

Publications

Us Patents

Method And Apparatus For Selective Deposition Of Dielectric Films

View page
US Patent:
20210043448, Feb 11, 2021
Filed:
Oct 27, 2020
Appl. No.:
17/081256
Inventors:
- Santa Clara CA, US
Mihaela A. Balseanu - Sunnyvale CA, US
Li-Qun Xia - Cupertino CA, US
Dongqing Yang - Pleasonton CA, US
Lala Zhu - Fremont CA, US
Malcolm J. Bevan - Santa Clara CA, US
Theresa Kramer Guarini - San Jose CA, US
Wenbo Yan - Sunnyvale CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 21/02
H01L 21/3105
C23C 16/458
C23C 16/455
C23C 16/04
C23C 16/02
C23C 16/56
Abstract:
Processing platforms having a central transfer station with a robot and an environment having greater than or equal to about 0.1% by weight water vapor, a pre-clean chamber connected to a side of the transfer station and a batch processing chamber connected to a side of the transfer station. The processing platform configured to pre-clean a substrate to remove native oxides from a first surface, form a blocking layer using a alkylsilane and selectively deposit a film. Methods of using the processing platforms and processing a plurality of wafers are also described.

Method And Apparatus For Selective Deposition Of Dielectric Films

View page
US Patent:
20180211833, Jul 26, 2018
Filed:
Jan 24, 2018
Appl. No.:
15/879008
Inventors:
- Santa Clara CA, US
Mihaela Balseanu - Sunnyvale CA, US
Li-Qun Xia - Cupertino CA, US
Dongqing Yang - Pleasonton CA, US
Lala Zhu - Fremont CA, US
Malcolm J. Bevan - Santa Clara CA, US
Theresa Kramer Guarini - San Jose CA, US
Wenbo Yan - Sunnyvale CA, US
International Classification:
H01L 21/02
C23C 16/455
C23C 16/458
H01L 21/3105
Abstract:
Processing platforms having a central transfer station with a robot and an environment having greater than or equal to about 0.1% by weight water vapor, a pre-clean chamber connected to a side of the transfer station and a batch processing chamber connected to a side of the transfer station. The processing platform configured to pre-clean a substrate to remove native oxides from a first surface, form a blocking layer using a alkylsilane and selectively deposit a film. Methods of using the processing platforms and processing a plurality of wafers are also described.

Accurate Film Thickness Control In Gap-Fill Technology

View page
US Patent:
20150299856, Oct 22, 2015
Filed:
Feb 19, 2015
Appl. No.:
14/625846
Inventors:
- Santa Clara CA, US
Wenbo YAN - Sunnyvale CA, US
Victor NGUYEN - Novato CA, US
Cong TRINH - Santa Clara CA, US
Mihaela BALSEANU - Cupertino CA, US
Li-Qun XIA - Cupertino CA, US
Assignee:
APPLIED MATERIALS, INC. - Santa Clara CA
International Classification:
C23C 16/455
H01L 21/3065
Abstract:
Embodiments disclosed herein generally relate to the processing of substrates, and more particularly, relate to methods for accurate control of film thickness using deposition-etch cycles. Particularly, embodiments of the present disclosure may be used in controlling film thickness during filling high aspect ratio features.
Control profile
Wenbo Yan from Redmond, WA, age ~42 Get Report