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Vincent E Stenger

from Mason, OH
Age ~61
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Also known as:
Vincent E Steuger, Vincente Stenger, Vicent Stenger, Stenger Vicent
Phone and address:
4410 Placepointe Dr, Mason, OH 45040
(513) 229-0433
Connected to:
Angela Stenger, 74Annemarie C Stenger, 45April M Stenger, 36Bridget K Stenger, 52Cathy Stenger, 54Connie D Stenger, 65Daniel E Stenger, 53Gary S Stenger, 74Geraldine L Stenger, 81Harry A Stenger, 93

Vincent Stenger Phones & Addresses

  • 4410 Placepointe Dr, Mason, OH 45040 (513) 229-0433
  • 1342 Firethorn Dr, Mason, OH 45040 (513) 229-0433 (513) 229-7383
  • Royal Oak, MI
  • Atlanta, GA
  • West Chester, OH
  • West Covina, CA
  • Walnut, CA
  • Westborough, MA
  • Warren, OH

Professional Records

Medicine Doctors

Vincent Stenger Photo 1

Vincent Stenger

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Specialties:
General Practice, Pain Management
Work:
Florida Personal Injury Physicians
4132 20 St W, Bradenton, FL 34205
(941) 752-1700 (phone), (941) 752-1717 (fax)
Education:
Medical School
Johns Hopkins University School of Medicine
Graduated: 1958
Procedures:
Hysterectomy
Myomectomy
Ovarian Surgery
Tubal Surgery
Vaginal Repair
Conditions:
Abnormal Vaginal Bleeding
Breast Disorders
Conditions of Pregnancy and Delivery
Endometriosis
Herpes Genitalis
Languages:
English
Spanish
Description:
Dr. Stenger graduated from the Johns Hopkins University School of Medicine in 1958. He works in Bradenton, FL and specializes in General Practice and Pain Management.

Business Records

Name / Title
Company / Classification
Phones & Addresses
Vincent Stenger
Principal
Photonic Engineering Services
Services-Misc
1342 Firethorn Dr, Mason, OH 45040
Vincent Edward Stenger
SYOPTICS LLC

Publications

Us Patents

Seamless Stitching Of Patterns Formed By Interference Lithography

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US Patent:
7718326, May 18, 2010
Filed:
Jun 17, 2006
Appl. No.:
11/454274
Inventors:
Vincent E Stenger - West Chester OH, US
International Classification:
G03F 9/00
US Classification:
430 22, 430 30, 430394
Abstract:
This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that achieves seamless stitching of nanostructure surface textures at the pattern exposure level. The described tiling approach will enable scaling up of coherent nanostructured surfaces to arbitrary area sizes. Such a large form factor nanotechnology will be essential for fabricating large aperture, coherent diffractive elements. Other applications include high performance, antiglare/antireflection and smudge resistant Motheye treatments for display products such as PDA's, laptop computers, large screen TV's, cockpit canopies, instrument panels, missile and targeting domes, and, more recently, “negative-index” surfaces. Although ideal for seamless stitching of nanometer scale patterns, the technology is broadly applicable to any situation where an arbitrarily large area needs to be seamlessly tiled with a smaller base pattern that has periodic overlap able boundaries.

Angle Tunable Thin Film Interference Optical Filter For Wavelength Multiplexing

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US Patent:
20040130764, Jul 8, 2004
Filed:
Sep 3, 2003
Appl. No.:
10/655500
Inventors:
Vincent Stenger - West Covina CA, US
Frank Xu - Glendora CA, US
Xinxiong Zhang - Arcadia CA, US
International Classification:
G02B026/08
US Classification:
359/223000
Abstract:
An angle tunable thin film interference optical filter for wavelength multiplexing and demultiplexing. The optical filter may be used in an OADM to drop one or more target channels from an optical signal without interfering with any channels between a starting channel and the dropped channels. During tuning, all of the channels in the optical signal are expressed. In one embodiment of the optical filter, a filter is fixedly coupled to a tiltable filter stage. Reflections from the filter are collected by a corner mirror for reflection back to the filter. In another embodiment, a plurality of optical elements are coupled to rotationally coupled carousels. In another embodiment, tunable thin film interference optical filters are coupled to rotationally independent carousals for expanded wavelength coverage.

Tunable Optical Filter, Optical Switch, And Optical Add/Drop Multiplexer Employing Linearly Variable Thin Film Optical Filters

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US Patent:
20040131309, Jul 8, 2004
Filed:
Sep 3, 2003
Appl. No.:
10/654695
Inventors:
Xinxiong Zhang - Arcadia CA, US
Vincent Stenger - West Covina CA, US
International Classification:
G02B006/28
US Classification:
385/024000, 385/018000
Abstract:
A reconfigurable non-blocking Optical Add/Drop Module (OADM) using linearly variable thin film optical filters. The OADM is tunable to drop one or more target channels from an optical signal without interfering with any channels between a starting channel and the dropped channels. During tuning, all of the channels in the optical signal are expressed. In one embodiment of the OADM, two linearly variable thin film optical filters are optically coupled in a cascade series such that one or more channels may be dropped by tuning both to the dropped channels. The optical filters are electronically coupled to a common controller that controls the operation of each of the linearly variable thin film optical filters. The filters are tuned separately to reach the target dropped channels without interfering with any intermediate channels.

Non-Blocking Tunable Filter With Flexible Bandwidth For Reconfigurable Optical Networks

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US Patent:
20040136717, Jul 15, 2004
Filed:
Sep 3, 2003
Appl. No.:
10/655499
Inventors:
Xinxiong Zhang - Arcadia CA, US
Vincent Stenger - West Covina CA, US
International Classification:
H04J014/02
US Classification:
398/085000
Abstract:
A reconfigurable non-blocking Optical Add/Drop Module (OADM). The OADM is tunable to drop one or more target channels from an optical signal without interfering with any channels between a starting channel and the dropped channels. During tuning, all of the channels in the optical signal are expressed. In one embodiment of the OADM, two tunable optical filters are optically coupled in a cascade series such that one or more channels may be dropped by tuning both to the dropped channels. The optical filters are electronically coupled to a common controller that controls the operation of each of the tunable filters. The filters are tuned separately to reach the target dropped channels without interfering with any intermediate channels.

Monolithic Integrated Photonic Interconnect Device

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US Patent:
20050111777, May 26, 2005
Filed:
Oct 14, 2004
Appl. No.:
10/965366
Inventors:
Vincent Stenger - West Covina CA, US
Fred Beyette - Cincinnati OH, US
International Classification:
G02B006/12
US Classification:
385014000
Abstract:
The present invention relates to a monolithic integrated photonic interconnect device which includes an optical layer having an input end and an output end, capable of conveying light between the input end and the output end, a semiconductor substrate layer comprising an integrated optical-electronic device and electronic circuitry operationally connected to the integrated optical-electronic device, and an optical coupling device disposed between, and operationally connected to, the optical layer and the optical-electronic device. In one embodiment of the interconnect device, the integrated optical-electronic device is able to generate light, detect light, amplify light or otherwise modulate amplitude or phase of light. In another embodiment of the interconnect device, the integrated optical-electronic device is a traveling wave type photodetector. In a further embodiment of the interconnect device, the optical coupling device is an asymmetric multimode interference coupler. In another embodiment of the interconnect device, the optical layer includes a first single mode transport channel wave guide portion operationally connected to the input end of the optical layer and the optical coupling device and a second single mode transport channel wave guide portion operationally connected to the output end of the optical layer and the optical coupling device. The first and second single mode channel wave guide portions and the optical coupling device have substantially the same layer dimensions.

Seamless Stitching Of Patterns Formed By Interference Lithography

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US Patent:
20110255063, Oct 20, 2011
Filed:
Mar 29, 2010
Appl. No.:
12/748854
Inventors:
Vincent E. Stenger - Mason OH, US
International Classification:
G03B 27/58
US Classification:
355 53
Abstract:
This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that achieves seamless stitching of nanostructure surface textures at the pattern exposure level. The described tiling approach will enable scaling up of coherent nanostructured surfaces to arbitrary area sizes. Such a large form factor nanotechnology will be essential for fabricating large aperture, coherent diffractive elements. Other applications include high performance, antiglare/antireflection and smudge resistant Motheye treatments for display products such as PDA's, laptop computers, large screen TV's, cockpit canopies, instrument panels, missile and targeting domes, and, more recently, “negative-index” surfaces. Although ideal for seamless stitching of nanometer scale patterns, the technology is broadly applicable to any situation where an arbitrarily large area needs to be seamlessly tiled with a smaller base pattern that has periodic overlap able boundaries.
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Vincent E Stenger from Mason, OH, age ~61 Get Report