US Patent:
20080063798, Mar 13, 2008
Inventors:
Shreyas Kher - Campbell CA, US
Son Nguyen - San Jose CA, US
Pravin Narwankar - Sunnyvale CA, US
Sanjeev Tandon - Sunnyvale CA, US
Steve Jumper - Dublin CA, US
Vincent Sermona - San Diego CA, US
International Classification:
C23C 16/22
US Classification:
427255394, 118715000, 427255280
Abstract:
The present invention generally comprises an apparatus for depositing high k dielectric or metal gate materials in which toxic, flammable, or pyrophoric precursors may be used. Exhaust conduits may be placed on the liquid precursor or solid precursor delivery cabinet, the gas panel, and the water vapor generator area. The exhaust conduits permit a technician to access the apparatus without undue exposure to toxic, pyrophoric, or flammable gases that may collect within the liquid deliver cabinet, gas panel, and water vapor generator area.