Todd D Hiar

7019268, Mar 28, 2006

Feb 23, 2004

10/783088

Theodore A. Paxton - Chandler AZ, US
Todd Hiar - Gilbert AZ, US

ASML Netherlands B.V. - Veldhoven

H05B 3/68

2194441, 2194431, 219390, 219405, 2194461, 2194471, 21944817, 21944811, 392416, 392418, 118724, 118725, 118 501, 118728, 118729, 118730

A system, apparatus, and method for thermal processing of substrates undergoing lithographic chemical processes is provided. The thermal processing system includes at least one heating element, a heat distributing plate, having a heating surface and being disposed in thermal communication with the at least one heating element. The heat distributing plate is constructed and arranged to distribute heat from the heating element onto the heating surface. A substrate support, supports a substrate at a position above the heating surface and the system includes an actuator that rotates the substrate relative to the heating surface during a heat transfer operation.

7274429, Sep 25, 2007

Dec 10, 2003

10/731430

Theodore A. Paxton - Chandler AZ, US
Todd Hiar - Gilbert AZ, US
Todd Davis - Gilbert AZ, US

ASML Netherlands B.V. - Veldhoven

G03B 27/32
G03B 27/42
G03D 5/00
G03C 5/00

355 27, 355 53, 355 77, 396611, 414935, 430311

An integrated lithographic fabrication cluster system, as presented herein, comprises an exposure apparatus to expose a pattern onto a substrate with an associated exposure controller to control the exposure apparatus and a track apparatus interconnecting a plurality of processing modules with an associated track controller to control the track apparatus. The cluster system also comprises a wafer handling apparatus coupled to the exposure apparatus and track apparatus that is configured to transfer substrates between the processing modules utilized by the exposure apparatus and track apparatus and a wafer handling controller to control the wafer handling apparatus. The cluster system further comprises a cluster controller that communicates control information to at least one of the exposure controller, the track controller, and the wafer handling controller to manage operations of the exposure apparatus, the track apparatus, and the wafer handling apparatus during the lithographic fabrication process.

7738075, Jun 15, 2010

May 23, 2005

11/134625

Todd D. Hiar - Gilbert AZ, US
Theodore A. Paxton - Chandler AZ, US
Todd J. Davis - Gilbert AZ, US
Cassandra M. Owen - Chandler AZ, US

ASML Netherlands B.V. - Veldhoven

G03B 27/52
G03B 27/32

355 30, 355 77

A method, computer program product, and apparatus configured to improve attribute uniformity of a substrate is disclosed. In an embodiment, the method involves calculating corrective data based on measured values of an attribute of a substrate processed by a lithographic exposure apparatus, the corrective data configured to at least partially correct non-uniformity of the values of the substrate attribute by controlling the temperature generated by a zone of a thermal plate used to heat or cool the substrate, and making the corrective data available to the thermal plate.

7781149, Aug 24, 2010

Mar 23, 2006

11/387047

Theodore Allen Paxton - Chandler AZ, US
Steven George Hansen - Phoenix AZ, US
Cassandra May Owen - Chandler AZ, US
Todd J. Davis - Gilbert AZ, US
Todd David Hiar - Gilbert AZ, US
James J Hunter - Tempe AZ, US

ASML Netherlands B.V. - Veldhoven

G03F 7/26

430311

A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.

7906270, Mar 15, 2011

Mar 23, 2005

11/086664

Theodore A Paxton - Chandler AZ, US
Todd J Davis - Tempe AZ, US
Todd D. Hiar - Gilbert AZ, US
Cassandra May Owen - Chandler AZ, US
Steven George Hansen - Phoenix AZ, US

ASML Netherlands B.V. - Veldhoven

G03F 7/20

430311, 430394

A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form a patterned image having enhanced resolution.

7981595, Jul 19, 2011

Jul 11, 2005

11/177490

Theodore A. Paxton - Chandler AZ, US
Todd J. Davis - Temple AZ, US
Todd D. Hiar - Gilbert AZ, US
Cassandra May Owen - Chandler AZ, US
Steven George Hansen - Phoenix AZ, US
James J. Hunter - Tempe AZ, US

ASML Netherlands B.V. - Veldhoven

G03F 7/20

430394, 430311

A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.

20050075819, Apr 7, 2005

Sep 17, 2003

10/663904

Theodore Paxton - Chandler AZ, US
Todd Hiar - Gilbert AZ, US
Wim Tel - Helmond, NL
Todd Davis - Temple AZ, US

ASML Netherlands B.V. - Veldhoven

G06F019/00

702117000

A system, apparatus, and method for improving CD uniformity in lithographic system is presented herein. The system includes an exposure apparatus configured to expose substrates, a track apparatus that is operatively coupled to the exposure apparatus and a plurality of processing modules and apparatus. The system also includes a measuring device configured to measure attributes of the exposed and processed substrates and to assess whether the exposed and processed substrate attributes are uniform based on pre-specified substrate profile information. The system further includes a module configured to adaptively calculate corrective exposure data based on the measured attributes upon determining that said attributes are not uniform. The corrective exposure data is configured to correct for non-uniformities in the substrates by regulating the exposure dosage of the exposure apparatus. Once the substrates are assessed to achieve the desired uniformity, the substrates are exposed by the exposure apparatus in accordance with the corrective exposure data, the uniformity of the exposed substrate continues to be monitored and the dose corrections are updated as required to maintain uniformity.

20070046917, Mar 1, 2007

Aug 31, 2005

11/215123

Wim Tel - Helmond, NL
Hans Van Der Laan - Veldhoven, NL
Cassandra Owen - Chandler AZ, US
Todd Davis - Gilbert AZ, US
Todd Hiar - Gilbert AZ, US
Theodore Paxton - Chandler AZ, US

ASML Netherlands B.V. - Veldhoven

G03B 27/54

355067000, 355053000

A lithographic apparatus operable in a substrate exposing configuration to expose a substrate with a pattern of radiation and a radiation beam inspection configuration in which the pattern of radiation that would be exposed on the substrate if the lithographic apparatus was in the substrate exposing configuration is inspected by a radiation beam inspection device. In the radiation beam inspecting configuration, the operation of the lithographic apparatus is modified in order to minimize the difference between the pattern of radiation exposed on the substrate and the required pattern of radiation to be exposed on the substrate.