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Thomas S Zemanian

from Vancouver, WA
Age ~63
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Also known as:
Thos Zemanian, Tom S Zemanian
Related to:
Lisa Staudinger, 59
Connected to:
Gerald G Zemanski, 88Jay A Zemansky, 74Jackie ZemantauskiHollis J Zemany, 40Paul D Zemany, 77Arthur R Zemar, 70Nigist M Zemariame, 51Brandon J Zemba, 45Roger F Zemba, 72Pamela A Zembal, 71

Thomas Zemanian Phones & Addresses

  • Vancouver, WA
  • 1501 Hains Ave, Richland, WA 99352 (509) 943-1383
  • 505 Jadwin Ave, Richland, WA 99352
  • 1501 Hains Ave, Richland, WA 99354

Work

Company: Aecom Apr 2015 Position: Cognizant systems engineer

Education

Degree: Doctorates, Doctor of Philosophy School / High School: Cornell University 1983 to 1989 Specialities: Chemical Engineering, Philosophy

Skills

Co2 Capture • Solar Energy • Petroleum/Coal Technology • Chemical Engineering • Thermodynamics • Materials Science • Spectroscopy • Simulations • R&D • Chemistry • Design of Experiments • Nuclear • Uv/Vis • Matlab • Analytical Chemistry • Energy • Fuel Cells • Science • Nanotechnology • Fortran • Thin Films • Mathematical Modeling • Catalysis • Experimentation • Nanomaterials • Electrochemistry

Interests

Science and Technology • Education • Environment

Industries

Research

Resumes

Resumes

Thomas Zemanian Photo 1

Cognizant Systems Engineer

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Location:
Pasco, WA
Industry:
Research
Work:
Aecom
Cognizant Systems Engineer
Washington State University/Tri-Cities Aug 2013 - Dec 2013
Visiting Clinical Professor
Pacific Northwest National Laboratory 1993 - 2012
Senior Research Engineer
Pacific Northwest National Laboratory Feb 1990 - Sep 1993
Postdoctoral Associate
Battelle Feb 1990 - Sep 1993
Senior Research Engineer
Education:
Cornell University 1983 - 1989
Doctorates, Doctor of Philosophy, Chemical Engineering, Philosophy Princeton University 1979 - 1983
Bachelor of Science In Engineering, Bachelors, Chemical Engineering
Skills:
Co2 Capture
Solar Energy
Petroleum/Coal Technology
Chemical Engineering
Thermodynamics
Materials Science
Spectroscopy
Simulations
R&D
Chemistry
Design of Experiments
Nuclear
Uv/Vis
Matlab
Analytical Chemistry
Energy
Fuel Cells
Science
Nanotechnology
Fortran
Thin Films
Mathematical Modeling
Catalysis
Experimentation
Nanomaterials
Electrochemistry
Interests:
Science and Technology
Education
Environment

Publications

Us Patents

Self-Assembled Monolayer And Method Of Making

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US Patent:
6531224, Mar 11, 2003
Filed:
Mar 17, 2000
Appl. No.:
09/528345
Inventors:
Glen E. Fryxell - Kennewick WA
Thomas S. Zemanian - Richland WA
Jun Liu - West Richland WA
Yongsoon Shin - Richland WA
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B32B 516
US Classification:
428405, 4283126, 428333, 428406, 428447
Abstract:
According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

Self-Assembled Monolayer And Method Of Making

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US Patent:
6733835, May 11, 2004
Filed:
Jan 17, 2003
Appl. No.:
10/347040
Inventors:
Glen E. Fryxell - Kennewick WA
Thomas S. Zemanian - Richland WA
Jun Liu - West Richland WA
Yongsoon Shin - Richland WA
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B05D 300
US Classification:
427299, 427387, 4273936
Abstract:
According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

Mesoporous Carbonates And Method Of Making

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US Patent:
6749825, Jun 15, 2004
Filed:
May 2, 2002
Appl. No.:
10/139408
Inventors:
Glen Fryxell - Kennewick WA
Jun Liu - Albuquerque NM
Thomas S. Zemanian - Richland WA
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
C01B 3124
US Classification:
4234191, 423105, 423165, 423186, 423421, 423430
Abstract:
Mesoporous metal carbonate structures are formed by providing a solution containing a non-ionic surfactant and a calcium acetate salt, adding sufficient base to react with the acidic byproducts to be formed by the addition of carbon dioxide, and adding carbon dioxide, thereby forming a mesoporous metal carbonate structure containing the metal from said metal salt.

Self-Assembled Monolayer And Method Of Making

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US Patent:
6753038, Jun 22, 2004
Filed:
Jan 17, 2003
Appl. No.:
10/346866
Inventors:
Glen E. Fryxell - Kennewick WA
Thomas S. Zemanian - Richland WA
Jun Liu - West Richland WA
Yongsoon Shin - Richland WA
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B05D 310
US Classification:
427337, 427377
Abstract:
According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

Hydroetching Of High Surface Area Ceramics Using Moist Supercritical Fluids

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US Patent:
6812259, Nov 2, 2004
Filed:
Oct 26, 2001
Appl. No.:
10/045930
Inventors:
Glen Fryxell - Kennewick WA
Thomas S. Zemanian - Richland WA
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
C01B 3314
US Classification:
516110, 516 98, 516111, 516112, 423335
Abstract:
Aerogels having a high density of hydroxyl groups and a more uniform pore size with fewer bottlenecks are described. The aerogel is exposed to a mixture of a supercritical fluid and water, whereupon the aerogel forms a high density of hydroxyl groups. The process also relaxes the aerogel into a more open uniform internal structure, in a process referred to as hydroetching. The hydroetching process removes bottlenecks from the aerogels, and forms the hydrogels into more standard pore sizes while preserving their high surface area.

Self-Assembled Monolayer And Method Of Making

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US Patent:
6846554, Jan 25, 2005
Filed:
Jan 17, 2003
Appl. No.:
10/347042
Inventors:
Glen E. Fryxell - Kennewick WA, US
Thomas S. Zemanian - Richland WA, US
Jun Liu - West Richland WA, US
Yongsoon Shin - Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B32B 306
US Classification:
4283073, 4283066, 428405, 428446, 428447
Abstract:
According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

Monolayer Coated Aerogels And Method Of Making

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US Patent:
7019037, Mar 28, 2006
Filed:
Oct 26, 2001
Appl. No.:
10/045948
Inventors:
Thomas Samuel Zemanian - Richland WA, US
Glen Fryxell - Kennwick WA, US
Oleksiy A. Ustyugov - Spokane WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
C01B 33/159
C09K 3/00
B01J 13/00
US Classification:
516100, 516101, 428405, 427219, 427220
Abstract:
Aerogels having a monolayer coating are described. The aerogel and a monolayer forming precursor are provided in a supercritical fluid, whereupon the aerogel and the monolayer forming precursor are reacted in said supercritical fluid to form a covalent bond between the aerogel and the monolayer forming precursor. Suitable aerogels are ceramic oxides such as silica, alumina, aluminosilicate, and combinations thereof. Suitable monolayer forming precursors include alkyl silanes, chlorosilanes, boranes, chloroboranes, germanes, and combinations thereof. The method may also include providing a surface preparation agent such as water, or hydroetching an aerogel to enhance the coating of the monolayer.

Backfilled, Self-Assembled Monolayers And Methods Of Making Same

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US Patent:
7553547, Jun 30, 2009
Filed:
Dec 21, 2005
Appl. No.:
11/315646
Inventors:
Glen E. Fryxell - Kennewick WA, US
Thomas S. Zemanian - Richland WA, US
R. Shane Addleman - Benton City WA, US
Christopher L. Aardahl - Sequim WA, US
Feng Zheng - Richland WA, US
Brad Busche - Raleigh NC, US
Oleg B. Egorov - West Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B32B 25/20
US Classification:
428447, 528 38, 4273977
Abstract:
Backfilled, self-assembled monolayers and methods of making the same are disclosed. The self-assembled monolayer comprises at least one functional organosilane species and a substantially random dispersion of at least one backfilling organosilane species among the functional organosilane species, wherein the functional and backfilling organosilane species have been sequentially deposited on a substrate. The method comprises depositing sequentially a first organosilane species followed by a backfilling organosilane species, and employing a relaxation agent before or during deposition of the backfilling organosilane species, wherein the first and backfilling organosilane species are substantially randomly dispersed on a substrate.
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Thomas S Zemanian from Vancouver, WA, age ~63 Get Report