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Thomas A Koes

from Riverside, CA
Age ~64
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Also known as:
Thomas Allan Koes, Tom Koes, Thomas Kose
Phone and address:
17424 Star Canyon Ct, Riverside, CA 92503
(909) 215-9417
Related to:
Elizabeth M Koes, 31Sarah A Koes, 29Maria L Koes, 65
Connected to:
Alvin Koes, 65David P Koes, 61Robert M Koes, 56Charlotte C Koesel, 73Gregory P Koesel, 77Morgan L Koeser, 39Della Koeshall, 71Ruth M Koesling, 92Douglas A Koessel, 73Ryan P Koessel, 40

Thomas Koes Phones & Addresses

  • 17424 Star Canyon Ct, Riverside, CA 92503 (909) 215-9417
  • Star Canyon Ct, Riverside, CA 92503
  • Corona, CA
  • Burbank, CA
  • Montebello, CA

Work

Position: Professional/Technical

Education

Degree: Graduate or professional degree

Publications

Us Patents

Photoresist Composition

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US Patent:
6818375, Nov 16, 2004
Filed:
Nov 28, 2001
Appl. No.:
09/995921
Inventors:
Thomas A. Koes - Riverside CA
Todd Johnson - Corona CA
Assignee:
Eternal Technology Corporation - Colonia Heights VA
International Classification:
G03C 173
US Classification:
4302701, 4302811, 4302851, 430311, 430319, 430325, 430326, 430905, 430914, 430916, 430919, 430920, 430923, 430921, 430922, 430924, 430925
Abstract:
Disclosed are photoimageable compositions having improved stripping properties including a photoresist strip enhancer. Also disclosed are methods of enhancing the strippability of photoimageable compositions and methods for manufacturing printed wiring boards using such photoimageable compositions.

Low Loss Prepregs, Compositions Useful For The Preparation Thereof And Uses Therefor

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US Patent:
7364672, Apr 29, 2008
Filed:
Dec 6, 2004
Appl. No.:
11/006211
Inventors:
Thomas Allan Koes - Riverside CA, US
Ousama Najjar - Rancho Cucamonga CA, US
Assignee:
Arlon, Inc. - Rancho Cucamonga CA
International Classification:
H01B 1/12
C08L 23/08
US Classification:
252500, 525240, 525241, 525238
Abstract:
In accordance with the present invention, we have developed compositions useful for the preparation of prepregs, laminates, and the like having excellent performance properties. Invention compositions comprise a combination of a first component (i. e. , a low loss, low dielectric constant, hydrocarbyl thermoplastic resin), a second component (i. e. , a component which is capable of crosslinking to produce a thermoset in the presence of the first component), a free radical source, and optionally, one or more additives and/or diluents. Invention compositions can be prepared from widely available and inexpensive starting materials. As a result, invention compositions not only provide fabricated articles having outstanding performance properties, in addition, the cost of producing the resulting articles compares quite favorably with the cost of making competitive materials which require the use of more expensive, less readily available starting materials. Also provided in accordance with the present invention are prepregs prepared from invention compositions, laminated sheets prepared from the above-described prepregs, printed wiring boards, methods of making each of the above, and the like.

Metal-Clad Laminates Having Improved Peel Strength And Compositions Useful For The Preparation Thereof

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US Patent:
8193274, Jun 5, 2012
Filed:
Aug 1, 2008
Appl. No.:
12/184994
Inventors:
Sam Najjar - Yucaipa CA, US
Chenghong Li - Cary NC, US
Thomas Allan Koes - Riverside CA, US
Daniel Chang - Fullerton CA, US
Assignee:
Arlon - Bear DE
International Classification:
C08L 39/04
B32B 27/04
US Classification:
524516, 525193, 4282974, 428500, 264136, 427331
Abstract:
In accordance with the present invention, compositions are described which are useful, for example, for the preparation of metal-clad laminate structures, methods for the preparation thereof, and various uses therefor. Invention metal-clad laminate structures are useful, for example, multi-layer board (MLB) industry, in the preparation of burn-in test boards and high reliability boards, applications where low coefficient of thermal expansion (CTE) is beneficial, in the preparation of boards used in down-hole drilling, and the like.

Photoresist Composition

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US Patent:
20030022098, Jan 30, 2003
Filed:
Nov 28, 2001
Appl. No.:
09/995880
Inventors:
Thomas Koes - Riverside CA, US
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03F007/004
US Classification:
430/270100, 430/311000
Abstract:
Disclosed are photoimageable compositions having improved stripping properties including an organic acid. Also disclosed are methods of enhancing the strippability of photoimageable compositions and methods for manufacturing printed wiring boards using such photoimageable compositions.

Metal-Clad Laminates Having Improved Peel Strength And Compositions Useful For The Preparation Thereof

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US Patent:
20090176918, Jul 9, 2009
Filed:
Jan 8, 2008
Appl. No.:
11/971122
Inventors:
Ousama Najjar - Redlands CA, US
Chenghong Li - Cary NC, US
Thomas Allan Koes - Riverside CA, US
Daniel Chang - Fullerton CA, US
International Classification:
C08K 3/34
C08L 67/00
C08K 3/28
C08K 3/38
C08K 3/00
US Classification:
524404, 524539, 524451, 524428, 524847
Abstract:
In accordance with the present invention, compositions are described which are useful, for example, for the preparation of metal-clad laminate structures, methods for the preparation thereof, and various uses therefor. Invention metal-clad laminate structures are useful, for example, multi-layer board (MLB) industry, in the preparation of burn-in test boards and high reliability boards, applications where low coefficient of thermal expansion (CTE) is beneficial, in the preparation of boards used in down-hole drilling, and the like.

High Resolution Positive Acting Dry Film Photoresist

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US Patent:
59811358, Nov 9, 1999
Filed:
Aug 13, 1997
Appl. No.:
8/910188
Inventors:
Thomas A. Koes - Riverside CA
Grieg B. Beltramo - Orange CA
Assignee:
Morton International, Inc. - Chicago IL
International Classification:
G03F 7023
US Classification:
430165
Abstract:
A positive acting photoresist composition (e. g. , a monolayer dry film) which is strippable in aqueous alkaline solution comprises a photo acid generator and a UV-transparent resin binder system which allows efficient photo bleaching of the photoactive component. An acid functional cellulosic resin may be the only binder resin, an acidic acrylate resin being optional. The dry coating is flexible and may be used as an etch and plating resist.

Method Of Forming A Multilayer Printed Circuit Board And Product Thereof

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US Patent:
57006075, Dec 23, 1997
Filed:
Nov 8, 1996
Appl. No.:
8/748518
Inventors:
James Rath - Orange CA
William Luong-Gia Tran - Garden Grove CA
Kathy M. Flynn - Santa Clarita CA
Vinai Ming Tara - Anaheim CA
Thomas A. Koes - Riverside CA
Vincent J. Nizzo - Tustin CA
Assignee:
Morton International, Inc. - Chicago IL
International Classification:
G03F 7027
US Classification:
430 15
Abstract:
In a process for fabricating a multilayer printed circuit board with permanent innerlayers of photoresist, the photoimageable composition used to form the hard permanent layer comprises a polymerizable acrylate monomer; an oligomer formed by the reaction of an epoxy resin and an acrylic or methacrylic acid; a photosensitive, free radical generating initiator for polymerization of the acrylic monomer and oligomer; a curable epoxy resin; a curing agent for the epoxy resin; and, optionally, a crosslinking agent reactive with hydroxyl groups. After exposure and development of a layer of the photoimageable composition and etching of the underlying metal layer on a board, the resultant photoresist is left on the circuitry traces. The innerlayers of photoresist are stacked in a press where it initially conforms under heat and pressure to fill voids between the innerlayers and then cures to permanence.

Source Of Photochemically Generated Acids From Diazonaphthoquinone Sulfonates Of Nitrobenzyl Derivatives

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US Patent:
53087445, May 3, 1994
Filed:
Mar 5, 1993
Appl. No.:
8/026923
Inventors:
Thomas A. Koes - Riverside CA
Assignee:
Morton International, Inc. - Chicago IL
International Classification:
G03F 723
G03F 730
US Classification:
430326
Abstract:
A new photoacid generator having the formula ##STR1## wherein R=hydrogen, hydroxyl, or the --O--S(. dbd. O). sub. 2 --Q moiety; R. sup. 1 =CH. sub. 2 OS(. dbd. O). sub. 2 --Q, or --NO. sub. 2 ; R. sup. 2 =CH. sub. 2 OS(. dbd. O). sub. 2 --Q, or --NO. sub. 2 ; R. sup. 3 =lower alkyl or hydrogen; R. sup. 4 =hydrogen, --CH. sub. 2 OS(. dbd. O). sub. 2 --Q, or --NO. sub. 2 ; R. sup. 5 =hydrogen, --CH. sub. 2 OS(. dbd. O). sub. 2 --Q, or --NO. sub. 2 ; and Q is a diazonaphthoquinone moiety; with the proviso that R. sup. 3 is lower alkyl when R. sup. 2 and R. sup. 4 are NO. sub. 2, and with the proviso that R. sup. 1. noteq. R. sup. 2 and R. sup. 4. noteq. R. sup. 5. exhibits unprecedented sensitivity to actinic radiation. This compound is photochemically transformed from a non-acidic entity to photoproducts which contain both sulfonic and carboxylic acid functuional groups.
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Thomas A Koes from Riverside, CA, age ~64 Get Report