Inventors:
Thomas J. Cardinali - Burlington VT
Burn J. Lin - Scarsdale NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 312
Abstract:
Spin coating of resist on a semiconductor wafer is done in a controlled chamber, starting with introducing a resist solvent vapor into the chamber from a nozzle or an adjacent chamber, applying the resist by spraying a very thin layer of the resist material and then removing solvent from the chamber. The result is a saving in resist material and enhanced coating uniformity.