Song Zhu

20130015734, Jan 17, 2013

Jul 10, 2012

13/545758

Chang-Shou Liu - Taipei City, TW
Song Zhu - San Francisco CA, US

MaxForce Energy Technologies Co., Ltd. - Taoyuan County

H02K 49/04

310 62, 310105

A magnetic coupler comprises a magnet rotor that includes a permanent magnet; a conductor rotor that includes a non-ferrous electroconductive plate; and a fan mounted on one of the magnet rotor and the conductor rotor, wherein the fan is designed to blow air into the magnetic coupler during operation. The permanent magnet of the magnet rotor is spaced by an air gap from the electroconductive plate of the conductor rotor.

20200341373, Oct 29, 2020

Oct 23, 2018

16/757431

- Shanghai, CN
Wei WANG - Shanghai, CN
Song ZHU - San Francisco CA, US

Shanghai Bixiufu Enterprise Management Co., Ltd. - Shanghai

G03F 7/004
C07D 417/14
G03F 7/22
G03F 7/32
G03F 7/20

This invention relates to the field of lithography and particularly to a lithographic method, a lithographic product and a lithographic material. The invention provides a lithographic method including the steps of: 1) providing first light and second light to the lithographic material, wherein at least part of molecules for generating effector molecules controllable by a molecular switch in a turned-on state generate effector molecules, thereby changing physical and/or chemical properties of the lithographic material in an area where the molecular switch is turned on; and 2) removing either the lithographic material that has changed in physical or chemical properties or the lithographic material that has not changed. The novel lithographic method provided by the invention can effectively break through the diffraction limit of light, thereby further improving lithography precision.

20200249574, Aug 6, 2020

Oct 23, 2018

16/757378

- Shanghai, CN
Wei WANG - Shanghai, CN
Song ZHU - San Francisco CA, US

Shanghai Bixiufu Enterprise Management Co., Ltd. - Shanghai

G03F 7/20
G02B 27/10

The invention provides a light generating method and system, the method including: generating first light, the first light being capable of forming a first area, a second area, and a third area, and intensity of the first light in the first area being higher than that in the second area and the third area, respectively; generating second light, the second light being capable of simultaneously irradiating the first area and the second area; generating third light, the third light being capable of simultaneously irradiating the first area and the third area; and controlling intensity of the second light and the third light, respectively. The light generating method and system provided by the invention can not only generate light having a super-resolution that may approach infinitesimal in theory but also employ light output by a laser as the only original light source, featuring extremely low costs and freedom from the diffraction limit of the light source, showing a great prospect of applications in the field of lithography.