Search

Sherman K Poultney

from Pittsboro, NC
Age ~87
Get Report
Also known as:
Sherman Dr Poultney, Sherman K Overton, Sherman Y
Phone and address:
31 Speyside Cir, Pittsboro, NC 27312
Related to:
Heidi Martinez Caballero, 40
Connected to:
David S Poultney, 56Richard H Poultney, 87Brenda D Poulton, 61Harold A Poulton, 93Kimberlee L Poulton, 63Russell E Poulton, 71Sean W Poulton, 36Susan K Poulton, 54Amanda M Poumakis, 36Avinel M Pounal, 57

Sherman Poultney Phones & Addresses

  • 31 Speyside Cir, Pittsboro, NC 27312
  • Wilton, CT
  • Ridgefield, CT

Skills

Systems Engineering • Requirements Analysis • Excel • Matlab • Problem Solving • Proposal Writing

Industries

Defense & Space

Resumes

Resumes

Sherman Poultney Photo 1

Sherman Poultney

View page
Location:
Wilton, CT
Industry:
Defense & Space
Skills:
Systems Engineering
Requirements Analysis
Excel
Matlab
Problem Solving
Proposal Writing

Publications

Us Patents

System And Method For Calibrating A Spatial Light Modulator Array Using Shearing Interferometry

View page
US Patent:
6847461, Jan 25, 2005
Filed:
Jan 29, 2004
Appl. No.:
10/765947
Inventors:
Azat M. Latypov - Danbury CT, US
Sherman K. Poultney - Wilton CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G01B 902
G01J 120
US Classification:
356520, 2502019
Abstract:
A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane.

Tailored Reflecting Diffractor For Euv Lithographic System Aberration Measurement

View page
US Patent:
6867846, Mar 15, 2005
Filed:
Jan 9, 2004
Appl. No.:
10/753557
Inventors:
Sherman K. Poultney - Wilton CT, US
Assignee:
ASML Holding NV
International Classification:
G03B027/52
G03B027/42
G03B027/54
US Classification:
355 55, 355 53, 355 67
Abstract:
A wavefront measurement system includes a source of electromagnetic radiation. An imaging system directs the electromagnetic radiation at an object plane that it uniformly illuminates. A first grating is positioned in the object plane to condition the radiation entering the input of a projection optic. A projection optical system projects an image of the first grating onto the focal plane. A second grating is positioned at the focal plane that receives a diffracted image of the source to form a shearing interferometer. A CCD detector receives the image of the first grating through the projection optical system and the second grating that forms a fringe pattern if there are aberrations in the projection optical system. Phaseshift readout of fringe pattern can be accomplished by stepping the first grating in a lateral direction and reading each frame with the CCD detector. The first grating includes a plurality of reflecting lines each formed by a plurality of reflecting dots.

System And Method For Calibrating A Spatial Light Modulator Array Using Shearing Interferometry

View page
US Patent:
6965436, Nov 15, 2005
Filed:
Nov 5, 2004
Appl. No.:
10/981706
Inventors:
Azat M. Latypov - Danbury CT, US
Sherman K. Poultney - Wilton CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G01B009/02
G01J001/20
US Classification:
356520, 2502019
Abstract:
A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane.

System And Method To Compensate For Static And Dynamic Misalignments And Deformations In A Maskless Lithography Tool

View page
US Patent:
7102733, Sep 5, 2006
Filed:
Aug 13, 2004
Appl. No.:
10/917380
Inventors:
Azat M. Latypov - Danbury CT, US
Christopher J. Mason - Newtown CT, US
Sherman K. Poultney - Wilton CT, US
Arno J. Bleeker - Westerhoven, NL
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/54
G03B 27/42
US Classification:
355 67, 355 53
Abstract:
The present invention provides systems and methods for maskless lithographic printing that compensate for static and/or dynamic misalignments and deformations. In an embodiment, a misalignment of a pattern formed by a spatial light modulator is measuring during printing. Rasterizer input data is generated based on the measured misalignment and passed the rasterizer. The rasterizer generates pattern data, based on the rasterizer input data, that is adjusted to compensate for the measured misalignment. The pattern data generated by the rasterizer is passed to the spatial light modulator and used to form a second pattern, which includes compensation for the measured misalignment. In an embodiment, deformations caused, for example, by a warping a surface of the spatial light modulator are measured and used by the rasterizer to generate pattern data that compensates for the deformations.

Grating Patch Arrangement, Lithographic Apparatus, Method Of Testing, Device Manufacturing Method, And Device Manufactured Thereby

View page
US Patent:
7113255, Sep 26, 2006
Filed:
Dec 19, 2003
Appl. No.:
10/739525
Inventors:
Sherman Poultney - Wilton CT, US
Haico Victor Kok - Eindhoven, NL
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/42
US Classification:
355 53, 356399, 356400, 355 67, 355 71
Abstract:
In one configuration of an arrangement according to an embodiment of the invention, a first grating patch on one module is aligned with a first grating patch on another module. In a different configuration of the arrangement, a second grating patch on the one module is aligned with a second grating patch on the other module. The two configurations are not aligned at the same time.

System And Method For Calibrating A Spatial Light Modulator Array Using Shearing Interferometry

View page
US Patent:
7158238, Jan 2, 2007
Filed:
Jun 13, 2005
Appl. No.:
11/150344
Inventors:
Azat M. Latypov - Danbury CT, US
Sherman K. Poultney - Wilton CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G01B 9/02
G01J 1/20
US Classification:
356520, 2502019
Abstract:
A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane.

Method And System For A Maskless Lithography Rasterization Technique Based On Global Optimization

View page
US Patent:
7469058, Dec 23, 2008
Filed:
Jan 27, 2006
Appl. No.:
11/340865
Inventors:
Azat Latypov - San Jose CA, US
Sherman Poultney - Wilton CT, US
Wenceslao Cebuhar - Danbury CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G06K 9/00
G02F 1/1335
G02F 1/135
G21K 5/00
G03C 5/20
G02B 27/42
G03H 1/12
G03B 27/54
US Classification:
382144, 349 4, 349 30, 378 34, 430396, 250550, 359 11, 359237, 355 67, 355 71
Abstract:
Provided are a method and system for determining states of spatial light modulator (SLM) pixels in a lithography system configured to print a desired pattern. The method includes determining diffraction orders associated with an ideal mask of a pattern to be printed by the lithography system, and then configuring the states of the SLM pixels to match all the diffraction orders that are relevant in the image formation.

System And Method For Calibrating A Spatial Light Modulator

View page
US Patent:
7580559, Aug 25, 2009
Filed:
Jan 29, 2004
Appl. No.:
10/765948
Inventors:
Azat M. Latypov - Danbury CT, US
Sherman K. Poultney - Wilton CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G06K 9/00
G06K 9/20
G03C 5/00
G02B 26/00
US Classification:
382152, 382286, 430 30, 359290
Abstract:
A method and system as used to calibrate a reflective SLM. The system can include the SLM having an array of pixels and a projection optical system resolving individual pixels and having an apodized pupil. During a calibration operation, the pixels of the SLM receive varying voltage values to move them through various angles. Light reflecting from the pixels during these movements forms individual images for each pixel at each angle. The light passes through the apodized pupil and is received on one or more sections of a detector. The apodization pattern is selected so that individual pixels remain well resolved with strong sensitivity to the pixel mirror tilt. The light intensity received for each pixel at each angle is correlated to the voltage value received at the pixel to tilt the pixel to that angle producing a result signal used by a control device to calibrate the SLM.
Control profile
Sherman K Poultney from Pittsboro, NC, age ~87 Get Report