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Sharyl L Maraviov

from Fremont, CA
Age ~57
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Also known as:
Sharyl L Marviov, Sharyl Maraviou
Phone and address:
4101 Vintage Ter, Fremont, CA 94536
(510) 744-0689
Related to:
Virginia RobertsonCecilia A Alvarado, 63Kevin LinvilleBetty Robertson
Connected to:
Angelo V Maravilla, 34Anne M Maravilla, 53Beatriz Maravilla, 33Carl Maravilla, 58Carlo R Maravilla, 50Carlos Maravilla, 51Cynthia Maravilla, 35Diana Maravillas, 56Donald Maravilla, 48Elbert K Maravilla, 55

Sharyl Maraviov Phones & Addresses

  • 4101 Vintage Ter, Fremont, CA 94536 (510) 744-0689
  • Scotts Valley, CA
  • 1349 San Benito St, Hollister, CA 95023
  • Orinda, CA
  • Tres Pinos, CA
  • Bridgton, ME
  • Pleasanton, CA
  • Alameda, CA

Resumes

Resumes

Sharyl Maraviov Photo 1

President

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Location:
San Francisco, CA
Industry:
Semiconductors
Work:
Pct Systems Inc. Apr 2006 - Jul 2008
Vice President Operations
Pct Systems Inc. Apr 2006 - Jul 2008
President
Pct Systems Inc. Jan 1998 - Apr 2006
Engineering Manager
Education:
Pepperdine Graziadio Business School 2006 - 2008
Master of Business Administration, Masters San Jose State University 1986 - 1991
Bachelors, Bachelor of Science, Chemistry
Skills:
Semiconductors
Engineering Management
R&D
Solar Energy
Operations Management
Mems
Interests:
Solar Cell Manufacturing
Product Marketing
Skiing
Semiconductor Capital Equipment
Leadership and Management Training
Sharyl Maraviov Photo 2

Sharyl Maraviov

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Location:
San Francisco Bay Area
Industry:
Semiconductors

Business Records

Name / Title
Company / Classification
Phones & Addresses
Sharyl Maraviov
President
Oak Terrace Homeowners Association of Scotts Valley
230 Mt Hermon Rd, Santa Cruz, CA 95066
1100 Water St, Santa Cruz, CA 95062
Sharyl Maraviov
COO
PCT SYSTEMS, INC
Manufactures Semiconductors and Related Devices · Mfg Semiconductors/Related Devices · Semiconductor and Related Device Manufacturing · Special Industry Machinery, NE
49000 Milmont Dr, Fremont, CA 94538
44060 Old Warm Spg Blvd, Fremont, CA 94538
44000 Old Warm Spg Blvd, Fremont, CA 94538
(510) 657-4412, (510) 657-0112

Publications

Us Patents

Method And Apparatus To Process Substrates With Megasonic Energy

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US Patent:
7238085, Jul 3, 2007
Filed:
Jun 4, 2004
Appl. No.:
10/861793
Inventors:
Garry L. Montierth - Fremont CA, US
Henry R. Miranda - Fremont CA, US
Sharyl L. Maraviov - Pleasanton CA, US
Ahmed A. Busnaina - Ashland MA, US
Assignee:
P.C.T. Systems, Inc. - Fremont CA
International Classification:
B24B 1/00
US Classification:
451 36, 451 37, 451910
Abstract:
A variety of techniques may be employed, alone or in combination, to enhance contact between a processed substrate and applied megasonic energy. In accordance with one embodiment of the new invention, the vibration plate is brought into intimate contact with one surface of the substrate, while cleaning or processing fluid contacts the other. In accordance with an alternative embodiment of the present invention, a reflecting surface may be provided to cause emanated energy to be reflected back into the near field and make it more uniform. In accordance with another alternative embodiment of the present invention, energy may be transferred across a substrate bounded on both sides by liquid with incidence of megasonic energy that is either normal to the substrate surface or within a critical range of incident angles. In yet another embodiment, generated dilatational waves may be converted to surface waves prior to contacting the substrate.

Bath System With Sonic Transducers On Vertical And Angled Walls

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US Patent:
20020195133, Dec 26, 2002
Filed:
Jun 20, 2001
Appl. No.:
09/886358
Inventors:
Henry Miranda - Fremont CA, US
Sharyl Maraviov - Fremont CA, US
International Classification:
B08B003/12
US Classification:
134/186000
Abstract:
A bath system for processing semiconductor wafers with an efficient and uniform delivery of sonic energy to the semiconductor wafers. The bath system includes a container (e.g., a quartz container) configured for receiving at least one semiconductor wafer (e.g., a 300 mm diameter semiconductor wafer) and holding processing liquid. The container has two vertical sidewalls and two angled walls, with each of the two angled walls being disposed below one of the vertical sidewalls. The bath system also includes at least one sonic transducer attached to each of the two angled walls. These sonic transducers are arranged so that sonic energy emanating therefrom is directed across the at least one semiconductor wafer during processing. The system further includes at least one sonic transducer attached to each of the vertical sidewalls. The sonic transducers attached to each of the vertical sidewalls are also arranged so that sonic energy therefrom is directed across the at least one semiconductor wafer during processing.

Method And Apparatus To Process Substrates With Megasonic Energy

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US Patent:
20070197138, Aug 23, 2007
Filed:
Jan 26, 2007
Appl. No.:
11/698551
Inventors:
Garry Montierth - Fremont CA, US
Henry Miranda - Fremont CA, US
Sharyl Maraviov - Pleasanton CA, US
Ahmed Busnaina - Ashland MA, US
Assignee:
P.C.T. Systems, Inc. - Fremont CA
International Classification:
B24B 1/00
US Classification:
451036000
Abstract:
A variety of techniques may be employed, alone or in combination, to enhance contact between a processed substrate and applied megasonic energy. In accordance with one embodiment of the new invention, the vibration plate is brought into intimate contact with one surface of the substrate, while cleaning or processing fluid contacts the other. In accordance with an alternative embodiment of the present invention, a reflecting surface may be provided to cause emanated energy to be reflected back into the near field and make it more uniform. In accordance with another alternative embodiment of the present invention, energy may be transferred across a substrate bounded on both sides by liquid with incidence of megasonic energy that is either normal to the substrate surface or within a critical range of incident angles. In yet another embodiment, generated dilatational waves may be converted to surface waves prior to contacting the substrate.

Method And Apparatus To Process Substrates With Megasonic Energy

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US Patent:
20070207707, Sep 6, 2007
Filed:
Jan 26, 2007
Appl. No.:
11/698962
Inventors:
Garry Montierth - Fremont CA, US
Henry Miranda - Fremont CA, US
Sharyl Maraviov - Pleasanton CA, US
Ahmed Busnaina - Ashland MA, US
Assignee:
P.C.T. Systems, Inc. - Fremont CA
International Classification:
B24B 1/00
US Classification:
451036000
Abstract:
A variety of techniques may be employed, alone or in combination, to enhance contact between a processed substrate and applied megasonic energy. In accordance with one embodiment of the new invention, the vibration plate is brought into intimate contact with one surface of the substrate, while cleaning or processing fluid contacts the other. In accordance with an alternative embodiment of the present invention, a reflecting surface may be provided to cause emanated energy to be reflected back into the near field and make it more uniform. In accordance with another alternative embodiment of the present invention, energy may be transferred across a substrate bounded on both sides by liquid with incidence of megasonic energy that is either normal to the substrate surface or within a critical range of incident angles. In yet another embodiment, generated dilatational waves may be converted to surface waves prior to contacting the substrate.

Method And Apparatus To Process Substrates With Megasonic Energy

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US Patent:
20070207710, Sep 6, 2007
Filed:
Jan 23, 2007
Appl. No.:
11/657428
Inventors:
Garry Montierth - Fremont CA, US
Henry Miranda - Fremont CA, US
Sharyl Maraviov - Pleasanton CA, US
Ahmed Busnaina - Ashland MA, US
Assignee:
P.C.T. Systems, Inc. - Fremont CA
International Classification:
B24B 1/00
B24B 31/00
US Classification:
451056000, 451104000
Abstract:
A variety of techniques may be employed, alone or in combination, to enhance contact between a processed substrate and applied megasonic energy. In accordance with one embodiment of the new invention, the vibration plate is brought into intimate contact with one surface of the substrate, while cleaning or processing fluid contacts the other. In accordance with an alternative embodiment of the present invention, a reflecting surface may be provided to cause emanated energy to be reflected back into the near field and make it more uniform. In accordance with another alternative embodiment of the present invention, energy may be transferred across a substrate bounded on both sides by liquid with incidence of megasonic energy that is either normal to the substrate surface or within a critical range of incident angles. In yet another embodiment, generated dilatational waves may be converted to surface waves prior to contacting the substrate.

Apparatus And Methods For Sonochemical Degradation Of Per- And Polyfluoroalkyl Substances

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US Patent:
20210299504, Sep 30, 2021
Filed:
Mar 9, 2021
Appl. No.:
17/196981
Inventors:
- Oakland CA, US
- San Jose CA, US
Sharyl Maraviov - San Jose CA, US
International Classification:
A62D 3/13
Abstract:
The present disclosure includes systems, devices, and methods for a reactor, such as a sonication reactor, for destruction of Per- and polyfluoroalkyl substances (PFASs). In one aspect of the disclosure, the reactor includes a housing having a base and one or more walls that cooperate to define a chamber and a transducer disposed the chamber. The transducer is configured to generate a plurality of sound waves such that when PFAS solution is disposed within the chamber, the sound waves propagate through the liquid and at least some of the one or more PFAS compounds are pyrolyzed or otherwise degraded. Other aspects and features are also claimed and described.
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Sharyl L Maraviov from Fremont, CA, age ~57 Get Report