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Scott W Dunham

from Coos Bay, OR
Age ~61
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Also known as:
Scott W Dunahm, Lori Dunham
Related to:
Kevin C Dunham, 64Gloria Ramirez, 66Chantal Flores, 33Fabian A Flores, 35Maria Flores, 51Lori E Dunham, 62Peggy Ash Sturtz, 67Shayla Malagon, 37Gladys Baltazarflores, 34Jean A Dunham, 89
Connected to:
Allen Dunham, 36Amy Dunham, 46Ava A Dunham, 101Barbara Dunham, 59Bradley W Dunham, 52Candice Dunham, 42Carolyn Dunham, 73Charlis E Dunham, 95Chrissie E Dunham, 63Christy K Dunham, 58

Scott Dunham Phones & Addresses

  • Coos Bay, OR
  • Cupertino, CA
  • 3654 Franklin Ave, Fremont, CA 94538
  • Bandon, OR
  • 3654 Franklin Ave, Fremont, CA 94538 (510) 673-6300

Work

Company: Sprint / ericsson 2011 Position: Construction manager

Education

School / High School: THE CENTER FOR ADVANCED LEGAL STUDIES- Houston, TX 1992 Specialities: Certificate in Paralegal

Resumes

Resumes

Scott Dunham Photo 1

Scott Dunham

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Work:
South Dakota Financial Group Jun 1983 - Jan 2002
Owner and Sales Manager
Scott Dunham Photo 2

Scott Dunham

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Scott Dunham Photo 3

Scott Dunham

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Scott Dunham Photo 4

Scott Dunham

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Scott Dunham Photo 5

Scott Dunham

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Location:
United States
Scott Dunham Photo 6

Scott Dunham

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Location:
United States
Scott Dunham Photo 7

Scott Dunham

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Location:
United States
Scott Dunham Photo 8

Scott Dunham Wellington, FL

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Work:
Sprint / Ericsson

2011 to 2000
Construction Manager
SBA Network Services

2010 to 2011
Project Manager / Team Lead
DUNHAM DEVELOPMENT SERVICES, INC
El Paso, TX
2006 to 2010
President / Owner / Project Manager
T-MOBILE
Concord, CA
2005 to 2006
Development / Project Manager
AMERICAN TOWER CORPORATION
San Diego, CA
2004 to 2005
Project / Program Manager
DUNHAM CONSTRUCTION COMPANY
Alto, NM
2002 to 2004
Owner / Consultant
AT&T and Cricket Communications

2002 to 2002
Director of Site Acquisitions & Development
LIBERTY WIRESTAR INC
Albuquerque, NM
2000 to 2000
ESPIRE COMMUNICATIONS
Albuquerque, NM
1999 to 2000
Project Manager
WESTERN WIRELESS CORP
Albuquerque, NM
1996 to 1998
Site Acquisition Associate
GIBBS & BRUNS, L.L.P
Houston, TX
1992 to 1996
Paralegal / Legal Assistant
FOUR STAR INTERNATIONAL, INC
El Paso, TX
1991 to 1992
Director of Sales & Marketing
DETECTION TECHNOLOGIES PLUS, INC
Redmond, WA
1986 to 1990
Sales / Engineer
Education:
THE CENTER FOR ADVANCED LEGAL STUDIES
Houston, TX
1992
Certificate in Paralegal
THE UNIVERSITY OF TEXAS AT EL PASO
El Paso, TX
1986
Baccalaureate

Business Records

Name / Title
Company / Classification
Phones & Addresses
Mr. Scott J. Dunham
Service Manager
Apartment Lines
Cardinal One Ventures. LLC
Answering Services
391 Las Colinas Blvd E Ste 130, - 601, Irving, TX 75039-6225
(800) 583-7769, (877) 225-9824
Scott G Dunham
K AND S OF CLEVELAND, LLC

Publications

Amazon

Creative Life: Spirit, Power And Relationship In The Practice Of Art

Creative Life: Spirit, Power and Relationship in the Practice of Art

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Is contemporary art undermining the sacred roots of human culture’ Is art meant for a noble purpose, greater self-knowledge, and entry to a deeper dimension of life’ In sharp, streetwise language, this artist, a skateboarding punk meditator, presents practical ways serious artists can use their live...
Author

Bandhu Scott Dunham, Bandhu Dunham

Binding

Paperback

Pages

252

Publisher

Hohm Press

ISBN #

1890772461

EAN Code

9781890772468

ISBN #

5

Contemporary Lampworking: A Practical Guide To Shaping Glass In The Flame (Volume 1 And 2) Third Edition

Contemporary Lampworking: A Practical Guide to Shaping Glass in the Flame (Volume 1 and 2) Third Edition

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This 2-volume set is an outstanding teaching guide for lampworking glass. The sprial binding allows the books to lie flat while working. Included in the volumes are a glossary of terms and techniques and a reference for locating glass working tools. Hundreds of photos and step-by-step processes.
Author

Bandhu Scott Dunham

Binding

Hardcover-spiral

Pages

511

Publisher

Salusa Glassworks

ISBN #

0965897214

EAN Code

9780965897211

ISBN #

1

The Trinity And Creation In Augustine: An Ecological Analysis (Suny Series On Religion And The Environment)

The Trinity and Creation in Augustine: An Ecological Analysis (Suny Series on Religion and the Environment)

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Looks at Augustine's theology in light of environmental concerns.
Author

Scott A. Dunham

Binding

Paperback

Pages

210

Publisher

State University of New York Press

ISBN #

0791475247

EAN Code

9780791475249

ISBN #

4

Contemporary Lampworking : A Practical Guide to Shaping Glass in the Flame

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Book by Bandhu Scott Dunham
Author

Bandhu Scott Dunham

Binding

Hardcover

Pages

384

Publisher

Salusa Glassworks

ISBN #

0965897206

EAN Code

9780965897204

ISBN #

6

Contemporary Lampworking A Practical Guide to Shaping Glass in the Flame - 1995 publication.

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Book by Bandhu Scott Dunham
Author

Bandhu Scott Dunham

Binding

Hardcover

Pages

242

Publisher

Salusa Glassworks, Prescott, A

ISBN #

0934252564

EAN Code

9780934252560

ISBN #

2

Us Patents

Method And Apparatus For Providing Uniform Gas Delivery To Substrates In Cvd And Pecvd Processes

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US Patent:
6616766, Sep 9, 2003
Filed:
Dec 30, 2002
Appl. No.:
10/335404
Inventors:
Scott William Dunham - Fremont CA
Assignee:
Genus, Inc. - Sunnyvale CA
International Classification:
C23C 1600
US Classification:
118715, 2391323, 239132, 239424, 438758
Abstract:
A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber. In preferred embodiments the supply ports, transition passages, and diffusion passages into the chamber do not align, and there is a special plasma-quenching ring in each of the second channels preventing plasma ignition within the channels in the showerhead methods and systems using the showerhead are also taught.

Plasma Generator Assembly For Use In Cvd And Pecvd Processes

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US Patent:
6626998, Sep 30, 2003
Filed:
Nov 8, 2000
Appl. No.:
09/709228
Inventors:
Scott William Dunham - Fremont CA
Assignee:
Genus, Inc. - Sunnyvale CA
International Classification:
C23C 1600
US Classification:
118723, 118715, 118723 R
Abstract:
An RF electrode module for use with a gas-diffuser showerhead device in a CVD chamber has an electrically-conductive electrode ring with a ring, inside diameter (R-ID) and a ring outside diameter (R-OD). The ring has an upwardly-extending power post, and an internal water-cooling channel open to an upwardly extending inlet tube and an upwardly-extending outlet tube, the post and tubes parallel to a central axis of the ring. There is further an electrical-insulator ring having an insulator outside diameter (I-OD) equal to or greater than the R-OD and an insulator inside diameter (I-ID) equal to or smaller than the R-ID, and through-openings extending in the direction of the central axis of the ring and spaced such that the power post, inlet tube, and outlet tube extend through the through-openings in the insulator ring. In a preferred embodiment the I-ID is sized to engage a shoulder diameter of the gas diffuser showerhead device. The disclosure also teaches a split nut for providing a secure and removable connection of a fluid-supply apparatus to a tube in a manner to withstand substantial internal fluid pressure.

Method And Apparatus For Providing Uniform Gas Delivery To Substrates In Cvd And Pecvd Processes

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US Patent:
7018940, Mar 28, 2006
Filed:
Sep 4, 2003
Appl. No.:
10/655682
Inventors:
Scott William Dunham - Fremont CA, US
Assignee:
Genus, Inc. - Sunnyvale CA
International Classification:
H01L 21/30
C23C 16/00
B05B 1/24
US Classification:
438758, 427 99, 4272551, 118715, 2391323, 239132, 239424
Abstract:
A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber. In preferred embodiments the supply ports, transition passages, and diffusion passages into the chamber do not align, and there is a special plasma-quenching ring in each of the second channels preventing plasma ignition within the channels in the showerhead methods and systems using the showerhead are also taught.

Method And Apparatus For Providing Uniform Gas Delivery To Substrates In Cvd And Pecvd Processes

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US Patent:
20010054391, Dec 27, 2001
Filed:
Aug 23, 2001
Appl. No.:
09/939272
Inventors:
Scott Dunham - Fremont CA, US
International Classification:
H01L021/31
H01L021/469
C23C016/00
US Classification:
118/733000, 438/788000, 438/792000, 118/715000
Abstract:
A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber. In preferred embodiments the supply ports, transition passages, and diffusion passages into the chamber do not align, and there is a special plasma-quenching ring in each of the second channels preventing plasma ignition within the channels in the showerhead. methods and systems using the showerhead are also taught.

Method And Apparatus For Providing Uniform Gas Delivery To Substrates In Cvd And Pecvd Processes

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US Patent:
62069721, Mar 27, 2001
Filed:
Jul 8, 1999
Appl. No.:
9/350417
Inventors:
Scott William Dunham - Fremont CA
Assignee:
Genus, Inc. - Sunnyvale CA
International Classification:
C23C16/00
7
B05B1/24
US Classification:
118715
Abstract:
A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber. In preferred embodiments the supply ports, transition passages, and diffusion passages into the chamber do not align, and there is a special plasma-quenching ring in each of the second channels preventing plasma ignition within the channels in the showerhead. Methods and systems using the showerhead are also taught.

Method For Providing Uniform Gas Delivery To Substrates In Cvd And Pecvd Processes

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US Patent:
62846736, Sep 4, 2001
Filed:
Jan 24, 2001
Appl. No.:
9/769634
Inventors:
Scott William Dunham - Fremont CA
Assignee:
Genus Inc. - Sunnyvale CA
International Classification:
H01L 2131
H01L 2126
C23C 800
US Classification:
438758
Abstract:
A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber. In preferred embodiments the supply ports, transition passages, and diffusion passages into the chamber do not align, and there is a special plasma-quenching ring in each of the second channels preventing plasma ignition within the channels in the showerhead methods and systems using the showerhead are also taught.

Preparing A Semiconductor Surface For Epitaxial Deposition

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US Patent:
20160225608, Aug 4, 2016
Filed:
Jan 28, 2016
Appl. No.:
15/008663
Inventors:
- Herzogenrath, DE
Shahab Khandan - Pleasanton CA, US
Scott Dunham - Fremont CA, US
Tac van Huynh - Fremont CA, US
Kenneth B.K. Teo - Great Cambourne, GB
Assignee:
AIXTRON - Herzogenrath
International Classification:
H01L 21/02
H01L 21/67
Abstract:
Provided is a method of epitaxial deposition, which involves dry-etching a semiconductor substrate with a fluorine containing species and exposing the dry-etched substrate to hydrogen atoms, prior to epitaxially depositing a semiconductor layer to the surface of the substrate.
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Scott W Dunham from Coos Bay, OR, age ~61 Get Report