Satoru Kobayashi

7988815, Aug 2, 2011

Jul 26, 2007

11/828568

Shahid Rauf - Pleasanton CA, US
Kenneth S. Collins - San Jose CA, US
Kallol Bera - San Jose CA, US
Kartik Ramaswamy - San Jose CA, US
Hiroji Hanawa - Sunnyvale CA, US
Andrew Nguyen - San Jose CA, US
Steven C. Shannon - San Mateo CA, US
Lawrence Wong - Fremont CA, US
Satoru Kobayashi - Mountain View CA, US
Troy S. Detrick - Los Altos CA, US
James P. Cruse - Santa Cruz CA, US

Applied Materials, Inc. - Santa Clara CA

C23C 16/00
H01L 21/306

15634543, 15634547, 15634548, 118723 R, 118723 E, 118723 I

RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.

8513939, Aug 20, 2013

Mar 21, 2011

13/052280

Hiroji Hanawa - Sunnyvale CA, US
Satoru Kobayashi - Santa Clara CA, US
Kartik Ramaswamy - San Jose CA, US
Shahid Rauf - Pleasanton CA, US

Applied Materials, Inc. - Santa Clara CA

G01R 31/02
G01R 27/08

324 725, 324713

An RF voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement.

20090025879, Jan 29, 2009

Jul 26, 2007

11/828713

Shahid Rauf - Pleasanton CA, US
Kenneth S. Collins - San Jose CA, US
Kallol Bera - San Jose CA, US
Kartik Ramaswamy - San Jose CA, US
Andrew Nguyen - San Jose CA, US
Steven C. Shannon - San Mateo CA, US
Lawrence Wong - Fremont CA, US
Satoru Kobayashi - Mountain View CA, US
Troy S. Detrick - Los Altos CA, US
James P. Cruse - Santa Cruz CA, US

H01L 21/306

15634548

RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing a bypass current flow path. The bypass current flow path avoids the pumping port in the chamber floor and avoids the wafer slit valve, and is provided by a conductive annular baffle grounded to and extending from the wafer pedestal. Current flow below the level of the annular baffle can be blocked by providing one or more insulating rings in the sidewall or by providing a dielectric sidewall.

20110005679, Jan 13, 2011

Jul 13, 2009

12/502005

HIROJI HANAWA - Sunnyvale CA, US
Kartik Ramaswamy - San Jose CA, US
Satoru Kobayashi - Mountain View CA, US

Applied Materials, Inc. - Santa Clara CA

H01L 21/3065
H05K 3/07

15634524, 205641

Plasma process uniformity is controlled by maintaining near an optimum value an impedance of a ground return path for VHF source power from an overhead electrode through a workpiece support. A feedback control loop controls a variable reactance element of a reactive circuit that provides isolation between the VHF source power and a lower frequency bias power match circuit.

20130284370, Oct 31, 2013

Mar 14, 2013

13/804616

Satoru Kobayashi - Santa Clara CA, US
Lawrence Wong - Fremont CA, US
Jonathan Liu - Sunnyvale CA, US
Yang Yang - Sunnyvale CA, US
Kartik Ramaswamy - San Jose CA, US
Shahid Rauf - Pleasanton CA, US

H05H 1/46

15634528, 118663

Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

20130320998, Dec 5, 2013

Jul 17, 2013

13/944026

SATORU KOBAYASHI - SANTA CLARA CA, US
KARTIK RAMASWAMY - SAN JOSE CA, US
SHAHID RAUF - PLEASANTON CA, US

APPLIED MATERIALS, INC. - SANTA CLARA CA

G01R 27/32

324629

An RF current probe is encapsulated in a conductive housing to permit its placement inside a plasma reactor chamber. An RF voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement.

53414888, Aug 23, 1994

Feb 14, 1992

7/837555

Satoru Kobayashi - Natick MA

NEC Electronics, Inc. - Mountain View CA

G06F 1200
G11C 700
G11C 800

395425

An N-word write access memory is described. Using a variation of conventional control signals RAS, CAS, WE and OE, an innovative scheme of signal protocol allows the N-bit word write memory to have an input/output bandwidth double that attained in the prior art, using substantially the same components and without affecting the bit-width, hence, the pin-count, of the external data bus.

20200161093, May 21, 2020

Oct 24, 2019

16/663215

- Santa Clara CA, US
Kallol BERA - Fremont CA, US
Jonghoon BAEK - San Jose CA, US
Amit Kumar BANSAL - Milpitas CA, US
Jun MA - San Diego CA, US
Satoru KOBAYASHI - Sunnyvale CA, US

H01J 37/32
C23C 16/505

Embodiments described herein relate to apparatus and techniques for radio frequency (RF) phase control in a process chamber. A process volume is defined in the process chamber by a faceplate electrode and a support pedestal. A grounding bowl is disposed within the process chamber about the support pedestal opposite the process volume. The grounding bowl substantially fills a volume other than the process volume below the support pedestal. A phase tuner circuit is coupled to an RF mesh disposed in the support pedestal and the faceplate electrode. The tuner circuit adjusts a phase difference between a phase of the faceplate electrode and a phase of the RF mesh.