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Ross Everett Bandy

from Limerick, ME
Age ~46
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Also known as:
Ross E Bandy, Ross E Brandy, Everett Bandy Ross, Ross Bandi, Evere Bandy Ross
Related to:
Richard Lee Thorpe, 94
Connected to:
Allegra A Bandy, 48Angela L Bandy, 40Anita Bandy, 66Audra L Bandy, 90Calvin C Bandy, 100Carolyn D Bandy, 82Cathy Bandy, 46Cody Bandy, 32Daniel C Bandy, 66Darla R Bandy, 52

Ross Bandy Phones & Addresses

  • Limerick, ME
  • Milton, MA
  • Hingham, MA
  • East Boston, MA
  • Somerville, MA
  • Cambridge, MA
  • Beverly, MA

Work

Company: Applied materials Jan 2012 Position: Systems engineer

Education

Degree: Bachelors, Bachelor of Science School / High School: Northeastern University 2015 to 2018

Skills

Nuclear Energy • Ion Implantation • Electronics • Preventive Maintenance • Engineering • Electricians • Manufacturing • Security Clearance • Military • Environmental Compliance • Test Equipment • Power Plants • Power Generation • Navy • Hazardous Waste Management • Environmental Management Systems • Reactor • Facilities Management • Turbines • Nuclear • Maintenance Management • Troubleshooting • Quality Assurance • Technical Training • Field Service • Equipment Maintenance • Root Cause Analysis • Electrical Troubleshooting • Electrical Safety • Electricity • Hazwoper • Industrial Safety • Steam • Plc • High Voltage • Power Distribution • Military Experience • Electrical Controls • Calibration • Instructor Led Training • Nuclear Engineering • Engineering Management • Maintenance and Repair • Inspection • Planned Preventative Maintenance • Plant Maintenance

Industries

Electrical/Electronic Manufacturing

Resumes

Resumes

Ross Bandy Photo 1

Systems Engineer

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Location:
451 Sokokis Trl south, Limerick, ME 04048
Industry:
Electrical/Electronic Manufacturing
Work:
Applied Materials
Systems Engineer
Army National Guard Dec 2008 - Dec 2011
Chemical Decontamination Sergeant
Waste Management Apr 2009 - Dec 2011
Maintenance Supervisor, Power Plant
Varian Semiconductor Jan 2007 - Nov 2008
Final Test and Engineering Technician
Us Navy Oct 1997 - Feb 2006
Nuclear Reactor Operator
Education:
Northeastern University 2015 - 2018
Bachelors, Bachelor of Science Northeastern University 2015 - 2017
University of Massachusetts Boston 2009 - 2012
Skills:
Nuclear Energy
Ion Implantation
Electronics
Preventive Maintenance
Engineering
Electricians
Manufacturing
Security Clearance
Military
Environmental Compliance
Test Equipment
Power Plants
Power Generation
Navy
Hazardous Waste Management
Environmental Management Systems
Reactor
Facilities Management
Turbines
Nuclear
Maintenance Management
Troubleshooting
Quality Assurance
Technical Training
Field Service
Equipment Maintenance
Root Cause Analysis
Electrical Troubleshooting
Electrical Safety
Electricity
Hazwoper
Industrial Safety
Steam
Plc
High Voltage
Power Distribution
Military Experience
Electrical Controls
Calibration
Instructor Led Training
Nuclear Engineering
Engineering Management
Maintenance and Repair
Inspection
Planned Preventative Maintenance
Plant Maintenance

Publications

Us Patents

Method And Device For A Carrier Proximity Mask

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US Patent:
20210090843, Mar 25, 2021
Filed:
Sep 25, 2019
Appl. No.:
16/582249
Inventors:
- Santa Clara CA, US
Charles T. Carlson - Cedar Park TX, US
Rutger Meyer Timmerman Thijssen - Sunnyvale CA, US
Ross Bandy - Milton MA, US
Assignee:
APPLIED Materials, Inc. - Santa Clara CA
International Classification:
H01J 37/09
H01J 37/305
Abstract:
A carrier proximity mask and methods of assembling and using the carrier proximity mask may include providing a first carrier body, second carrier body, and set of one or more clamps. The first carrier body may have one or more openings formed as proximity masks to form structures on a first side of a substrate. The first and second carrier bodies may have one or more contact areas to align with one or more contact areas on a first and second sides of the substrate. The set of one or more clamps may clamp the substrate between the first carrier body and the second carrier body at contact areas to suspend work areas of the substrate between the first and second carrier bodies. The openings to define edges to convolve beams to form structures on the substrate.

Method And Device For A Carrier Proximity Mask

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US Patent:
20210090858, Mar 25, 2021
Filed:
Sep 25, 2019
Appl. No.:
16/582261
Inventors:
- Santa Clara CA, US
Charles T. Carlson - Cedar Park TX, US
Rutger Meyer Timmerman Thijssen - Sunnyvale CA, US
Ross Bandy - Milton MA, US
Ryan Magee - Gloucester MA, US
Assignee:
APPLIED Materials, Inc. - Santa Clara CA
International Classification:
H01J 37/305
G02B 5/18
Abstract:
A carrier proximity mask and methods of assembling and using the carrier proximity mask may include providing a first carrier body, second carrier body, and set of one or more clamps. The first carrier body may have one or more openings formed as proximity masks to form structures on a first side of a substrate. The first and second carrier bodies may have one or more contact areas to align with one or more contact areas on a first and second sides of the substrate. The set of one or more clamps may clamp the substrate between the first carrier body and the second carrier body at contact areas to suspend work areas of the substrate between the first and second carrier bodies. The openings to define edges to convolve beams to form structures on the substrate.

Workpiece Processing Technique

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US Patent:
20190027367, Jan 24, 2019
Filed:
Sep 26, 2018
Appl. No.:
16/142458
Inventors:
- Gloucester MA, US
Kevin Anglin - Somerville MA, US
Ross Bandy - Milton MA, US
International Classification:
H01L 21/285
H01L 21/66
Abstract:
Methods for processing of a workpiece are disclosed. The actual rate at which different portions of an ion beam can process a workpiece, referred to as the processing rate profile, is determined by measuring the amount of material removed from, or added to, a workpiece by the ion beam as a function of ion beam position. An initial thickness profile of a workpiece to be processed is determined. Based on the initial thickness profile, a target thickness profile, and the processing rate profile of the ion beam, a first set of processing parameters are determined. The workpiece is then processed using this first set of processing parameters. In some embodiments, an updated thickness profile is determined after the first process and a second set of processing parameters are determined. A second process is performed using the second set of processing parameters. Optimizations to improve throughput are also disclosed.

Workpiece Processing Technique

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US Patent:
20170005013, Jan 5, 2017
Filed:
Jun 30, 2015
Appl. No.:
14/788306
Inventors:
- Gloucester MA, US
Kevin Anglin - Somerville MA, US
Ross Bandy - Milton MA, US
International Classification:
H01L 21/66
H01L 21/265
H01L 21/02
H01L 21/285
H01L 21/3065
H01L 21/263
Abstract:
Methods for processing of a workpiece are disclosed. The actual rate at which different portions of an ion beam can process a workpiece, referred to as the processing rate profile, is determined by measuring the amount of material removed from, or added to, a workpiece by the ion beam as a function of ion beam position. An initial thickness profile of a workpiece to be processed is determined. Based on the initial thickness profile, a target thickness profile, and the processing rate profile of the ion beam, a first set of processing parameters are determined. The workpiece is then processed using this first set of processing parameters. In some embodiments, an updated thickness profile is determined after the first process and a second set of processing parameters are determined. A second process is performed using the second set of processing parameters. Optimizations to improve throughput are also disclosed.

Apparatus And Method For Endpoint Detection

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US Patent:
20160293503, Oct 6, 2016
Filed:
Apr 3, 2015
Appl. No.:
14/678061
Inventors:
- Gloucester MA, US
Ross Bandy - Milton MA, US
International Classification:
H01L 21/66
H01L 21/265
H01J 37/30
H01L 21/67
H01J 37/32
H01L 21/3065
H01L 21/02
Abstract:
An apparatus to control processing conditions for a substrate. The apparatus may include a current measurement component to perform a plurality of extraction current measurements for extraction current in a processing apparatus housing the substrate, the extraction current comprising ions extracted from a plasma and directed to the substrate; and an endpoint detection component comprising logic to generate an endpoint detection signal based upon a change in extraction current during the plurality of extraction current measurements.
Control profile
Ross Everett Bandy from Limerick, ME, age ~46 Get Report