Ronald Edward Meunier

7115210, Oct 3, 2006

Feb 2, 2004

10/708009

Robert A. Calderoni - Fairfield VT, US
June Cline - South Burlington VT, US
Kellie L. Dutra - Essex Junction VT, US
Ronald G. Meunier - Essex Junction VT, US
Joseph P. Walko - Jericho VT, US
Justin Wai-chow Wong - South Burlington VT, US

International Business Machines Corporation - Armonk NY

H01I 21/302

216 59, 216 61, 118712, 275E21528, 438 14, 438 16, 455118

Disclosed is a method and system for detecting abnormal plasma discharge that is useful in, for example, detecting plasma leakage in a reactive ion etching (RIE) chamber. The system includes electrical contacts connected to the chamber that provide an input signal to the chamber. This input signal can be generated by a radio frequency (RF) generator that is connected to the electrical contacts. A variable power controller connected to the RF generator gradually increases (ramps) the power of the input signal being supplied to the chamber.

6899785, May 31, 2005

Nov 5, 2001

09/682978

Kellie L. Dutra - Essex Junction VT, US
Margaret L. Gibson - Underhill VT, US
Ronald G. Meunier - Westford VT, US
Jason W. Silbergleit - Essex Junction VT, US

International Business Machines Corporation - Armonk NY

C23F001/00

1563453, 438706, 438905, 134 12, 134 13, 15634535

Undesirable reactions (such as formation of volatile compounds or complexes) are recognized to occur during production processes (such as etching with fluorine) at interior surfaces of a reactor chamber (such as a silicon-based reactor chamber). These undesirable reactions may be minimized and controlled by priming the chamber surface by incorporating seasoning atoms and/or molecules.