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Roger M Bithell

from Oakland, CA
Age ~77
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Connected to:
Barbara G Bither, 89Eileen Bither, 89Dwight R Bitikofer, 73Deborah J Bitker, 63Jennifer F Bitkower, 52Bharath K Bitla, 34Jade Bitla, 43Bethany J Bitler, 34Brad Bitler, 39Bret M Bitler, 57

Roger Bithell Phones & Addresses

  • Oakland, CA
  • 5517 Huntington Ave, Richmond, CA 94804 (510) 528-6528
  • Novato, CA
  • San Rafael, CA

Work

Position: Machine Operators, Assemblers, and Inspectors Occupations

Education

Degree: High school graduate or higher

Emails

r***[email protected]

Publications

Us Patents

Plasma Pressure Pulse Sterilization

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US Patent:
43483577, Sep 7, 1982
Filed:
Dec 12, 1980
Appl. No.:
6/215597
Inventors:
Roger M. Bithell - Richmond CA
Assignee:
Motorola, Inc. - Schaumburg IL
International Classification:
A61L 214
A61L 224
US Classification:
422 22
Abstract:
A sterilization procedure and apparatus is disclosed in which articles of irregular shape or having long, narrow apertures or cavities may be sterilized at low temperature by being subjected to a plasma whose pressure is varied in a cyclic manner so as to provide forced convection of active species into the apertures, cavities, and crevices of the article to be sterilized.

Process Monitor And Method Thereof

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US Patent:
46119191, Sep 16, 1986
Filed:
Mar 9, 1984
Appl. No.:
6/588028
Inventors:
Edward A. Brooks - Novato CA
Roger M. Bithell - Novato CA
Assignee:
Tegal Corporation - Novato CA
International Classification:
G01B 902
US Classification:
356357
Abstract:
A process monitor which is particularly useful for endpoint detection in plasma etching processes does not require the dedication of a test area on the wafer for endpoint detection and also obviates the need for wafer alignment. An improved optical window which does not significantly perturb the RF fields in the plasma chamber is also disclosed. The apparatus reflects laser energy off an area of the wafer comparable to the area of a typical die and extracts the necessary information from the resulting waveform by means of first and second time derivatives.

Pin Lift Plasma Processing

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US Patent:
46247289, Nov 25, 1986
Filed:
Jun 11, 1985
Appl. No.:
6/743341
Inventors:
Roger M. Bithell - Novato CA
Harry Slomowitz - Walnut Creek CA
Assignee:
Tegal Corporation - Novato CA
International Classification:
B44C 122
C03C 1500
H01L 21306
C23F 102
US Classification:
156345
Abstract:
A wafer is supported on pins within a plasma reactor, allowing the plasma to act on both sides of the wafer. Various processes are disclosed for pins-up and pins-down condition. If conductive pins are used, they are preferably flattened. The wafer is preferably biased negatively with respect to the plasma.

Package And Sterilizing Process For Same

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US Patent:
43212328, Mar 23, 1982
Filed:
Mar 25, 1980
Appl. No.:
6/134015
Inventors:
Roger M. Bithell - Richmond CA
Assignee:
Tegal Corporation - Novato CA
International Classification:
A61L 214
US Classification:
422 23
Abstract:
A sterilizable package in which a porous envelope containing the article to be sterilized is subjected to a plasma, said plasma being generated outside of said envelope with the reactive components of the plasma passing through said porous envelope, thereby sterilizing the article through the package.
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Roger M Bithell from Oakland, CA, age ~77 Get Report