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Robert S Schwenkler

from Garden City, ID
Age ~70
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Also known as:
Robert Scott Schwenkler, Robert Te Schwenkler, Robert Herbert Schwenkler, Robert L Schwenkler, Robert Schwenkler Ira, Bob S Schwenkler, Bob T Schwenkler, Robert R
Phone and address:
3150 Quarterswing Way, Boise, ID 83716
Related to:
T SchwenklerPatricia A Schwenkler, 68Mikel Ann Emerson, 60Patrice A Rheault, 63Bob H Schwenkler, 43Jodie M Schwenkler, 38Therese C Schwenkler, 40Dan A Emerson, 69Patricia A Schwenkler
Connected to:
Allen J Schwenk, 78Anke Schwenke, 61Art C Schwenke, 64Ashley N Schwenk, 41Barbara A Schwenk, 53Bradley J Schwenk, 55Clifford C Schwenk, 71David A Schweninger, 71Diana A Schwenke, 84Doug Schwenke, 54

Robert Schwenkler Phones & Addresses

  • 3150 Quarterswing Way, Boise, ID 83716
  • 31505 Quarterswing Way, Boise, ID 83701
  • 6600 N Hillsboro Pl, Boise, ID 83703
  • Garden City, ID
  • Nampa, ID
  • Round Rock, TX
  • Donnelly, ID
  • Portland, OR
  • Carmen, ID
  • Olympia, WA

Resumes

Resumes

Robert Schwenkler Photo 1

Founder

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Location:
Boise, ID
Industry:
Professional Training & Coaching
Work:
The Brotherhood Community
Founder
Dub Narcotic Studio Sep 2009 - Dec 2013
Recording Studio Wizard
Robert Schwenkler Coaching Sep 2009 - Dec 2013
Owner
Education:
The Evergreen State College 2002 - 2005
Bachelors, Engineering
Skills:
Coaching
Personal Development
Public Speaking
Leadership Development
Workshop Facilitation
Organizational Development
Career Counseling
Training
Management
Social Media Marketing
Customer Service
Research
Social Media
Entrepreneurship
Languages:
Spanish
Robert Schwenkler Photo 2

Owner

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Location:
Boise, ID
Industry:
Health, Wellness And Fitness
Work:
Innovative Solutions 1993 - 1998
Owner
Live-Well Club Ventures Pvt. Ltd. 1993 - 1998
Owner
Prior To 93 1978 - 1993
Various
Education:
The Johns Hopkins University 1972 - 1976

Business Records

Name / Title
Company / Classification
Phones & Addresses
Robert S. Schwenkler
Secretary, Treasurer
Live Well, Inc
6600 N Hillsboro Pl, Boise, ID 83703

Publications

Us Patents

Vapor Jet Dryer Apparatus And Method

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US Patent:
52262421, Jul 13, 1993
Filed:
Feb 18, 1992
Appl. No.:
7/837221
Inventors:
Robert S. Schwenkler - Boise ID
Assignee:
Santa Clara Plastics, division of Preco, Inc. - Boise ID
International Classification:
F26B 2106
US Classification:
34 78
Abstract:
The present invention provides a vapor processing apparatus in which the vapor is generated in a region adjacent to the vapor processing area. This is generally done in a batch process and a limited volume of processing vapor is generated for each batch. The separation of the vapor generation from the processing avoids the contamination of the vapor source and the inadvertent cooling of the vapor generating area. In the preferred embodiment, two vessels are disposed one inside the other such that a vapor generating region is provided in the annular space between vessels. The vapor is injected into the processing region through channels formed in the annular space. In a preferred embodiment, the vapor is isopropyl alcohol and the substrates for processing are silicon wafers.

Method For The Precision Cleaning And Drying Surfaces

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US Patent:
57525323, May 19, 1998
Filed:
Sep 26, 1996
Appl. No.:
8/721363
Inventors:
Robert S. Schwenkler - Boise ID
International Classification:
B08B 1502
US Classification:
1341023
Abstract:
This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention uses an inert gas, typically nitrogen (N. sub. 2) or argon (Ar), as a process gas for carrying the vapor of a drying fluid in a "closed loop" cycle through a process vessel. The carrier gas and is pumped through a vapor generator and the process vessel in a rapid "closed loop" manner with extremely pure IPA vapor. Various embodiments employ the invention including two different vapor drying methods, a water rinse and vapor dry method and a solvent clean and vapor dry method. In either the water rinse and vapor dry method and a solvent clean and vapor dry method rinse water or cleaning fluid is rapidly drained in an unimpeded manner from the vessel while the process vessel is vented.

Method For Precision Drying Surfaces

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US Patent:
57156123, Feb 10, 1998
Filed:
Sep 26, 1996
Appl. No.:
8/721353
Inventors:
Robert S. Schwenkler - Boise ID
International Classification:
F26B 300
US Classification:
34470
Abstract:
This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention uses an inert gas, typically nitrogen (N. sub. 2) or argon (Ar), as a process gas for carrying the vapor of a drying fluid in a "closed loop" cycle through a process vessel. The carrier gas and is pumped through a vapor generator and the process vessel in a rapid "closed loop" manner with extremely pure IPA vapor. Various embodiments employ the invention including two different vapor drying methods, a water rinse and vapor dry method and a solvent clean and vapor dry method. In either the water rinse and vapor dry method and a solvent clean and vapor dry method rinse water or cleaning fluid is rapidly drained in an unimpeded manner from the vessel while the process vessel is vented.

Method For Precision Cleaning And Drying Surfaces

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US Patent:
57491593, May 12, 1998
Filed:
May 22, 1997
Appl. No.:
8/861967
Inventors:
Robert S. Schwenkler - Boise ID
International Classification:
F26B 700
US Classification:
34426
Abstract:
This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention uses an inert gas, typically nitrogen (N. sub. 2) or argon (Ar), as a process gas for carrying the vapor of a drying fluid in a "closed loop" cycle through a process vessel. The carrier gas and is pumped through a vapor generator and the process vessel in a rapid "closed loop" manner with extremely pure IPA vapor. Various embodiments employ the invention including two different vapor drying methods, a water rinse and vapor dry method and a solvent clean and vapor dry method. In either the water rinse and vapor dry method and a solvent clean and vapor dry method rinse water or cleaning fluid is rapidly drained in an unimpeded manner from the vessel while the process vessel is vented.
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Robert S Schwenkler from Garden City, ID, age ~70 Get Report