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Richard A Vaia

from Beavercreek, OH
Age ~55
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Also known as:
Richard Dr Vaia, Richard Arthur Vaia, Rich A Vaia
Phone and address:
3249 Southfield Dr, Dayton, OH 45434
(937) 239-4603
Related to:
Sheryl L Keller, 76Sara Hill, 57Keith PoppleKelly A Soderstrom, 55Howard Thresher
Connected to:
Anthony L Vaia, 36Cheryl L Vaia, 69David H Vaia, 65Jesse Vaiagae, 42Bradley C Vaiana, 49Jacqueline Vaiana, 34Shawn A Vaiana, 59Duane J Vaiani, 52Cheryl A Vaiarella, 68Jill D Vaias, 46

Richard Vaia Phones & Addresses

  • 3249 Southfield Dr, Dayton, OH 45434 (937) 239-4603
  • 2766 Rockledge Trl, Dayton, OH 45430 (937) 429-9826
  • Beavercreek, OH
  • Export, PA
  • Cortland, NY
  • Goleta, CA
  • Ithaca, NY
  • 3249 Southfield Dr, Dayton, OH 45434 (937) 429-9826

Work

Company: United states air force Jun 1995 Position: Technology director, functional materials division

Education

Degree: Doctorates, Doctor of Philosophy School / High School: Cornell University 1987 to 1995 Specialities: Materials Science, Engineering

Skills

Materials Science • Dod • R&D • Program Management • Systems Engineering • Chemistry • Aerospace • Engineering Management • Security Clearance • Military • Leadership • Defense • Simulations • Engineering • Physics • Team Leadership • National Security • Air Force • Technical Writing • Composites • Government Contracting • Space Systems • Materials • Design of Experiments • Technical Leadership • Technology Management • Proposal Writing • Semiconductors

Industries

Military

Resumes

Resumes

Richard Vaia Photo 1

Chief Scientist, Materials And Manufacturing

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Location:
Dayton, OH
Industry:
Military
Work:
United States Air Force
Technology Director, Functional Materials Division
Air Force Research Laboratory
Chief Scientist, Materials and Manufacturing
Education:
Cornell University 1987 - 1995
Doctorates, Doctor of Philosophy, Materials Science, Engineering
Skills:
Materials Science
Dod
R&D
Program Management
Systems Engineering
Chemistry
Aerospace
Engineering Management
Security Clearance
Military
Leadership
Defense
Simulations
Engineering
Physics
Team Leadership
National Security
Air Force
Technical Writing
Composites
Government Contracting
Space Systems
Materials
Design of Experiments
Technical Leadership
Technology Management
Proposal Writing
Semiconductors

Publications

Us Patents

Two-Photon Responsive Chromophores Containing Electron Accepting Cores

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US Patent:
6555682, Apr 29, 2003
Filed:
Jun 13, 2002
Appl. No.:
10/171567
Inventors:
Ramamurthi Kannan - Cincinnati OH
Richard A. Vaia - Beavercreek OH
Assignee:
The United States of America as represented by the Secretary of the Air Force - Washington DC
International Classification:
C07D41714
US Classification:
544180, 544215
Abstract:
Provided are chromophores of the formula wherein x is 3 or 4, wherein Q is selected from the group consisting of wherein L is selected from the group consisting of wherein R is an alkyl group having 1 to 20 carbon atoms, and wherein Z is selected from the group consisting of.

Two-Photon Responsive Chromophores Containing Electron Accepting Core Units

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US Patent:
6730793, May 4, 2004
Filed:
Jun 13, 2002
Appl. No.:
10/171566
Inventors:
Ramamurthi Kannan - Cincinnati OH
Bruce A. Reinhardt - late of Tipp City OH
Richard A. Vaia - Beavercreek OH
Assignee:
The United States of America as represented by the Secretary of the Air Force - Washington DC
International Classification:
C07D51302
US Classification:
548150, 546 83, 548149, 548153, 548156
Abstract:
Provided are chromophores of the formula wherein x is 2 or 3, wherein Q is selected from the group consisting of wherein L is wherein R is an alkyl group having 1 to 20 carbon atoms, and wherein Z is selected from the group consisting of.

Self-Generating Inorganic Passivation Layers For Polymer-Layered Silicate Nanocomposites

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US Patent:
7141277, Nov 28, 2006
Filed:
Mar 4, 2003
Appl. No.:
10/379215
Inventors:
Richard A. Vaia - Beavercreek OH, US
Hao Fong - Germantown MD, US
Jeffrey H. Sanders - Vandalia OH, US
Assignee:
The United States of America as represented by the Secretary of the Air Force - Washington DC
International Classification:
B05D 3/06
H05H 1/24
C23C 14/58
C23C 14/08
US Classification:
427534, 427536, 427539, 427579
Abstract:
A method for preparing high-use temperature, light-weight polymer/inorganic nanocomposite materials with enhanced thermal stability and performance characteristics, which comprises treating a polymer/inorganic nanocomposite material with oxygen plasma under conditions which result in a thin, protective, ceramic-like layer at the surface of the thus-treated nanocomposite material.

Method Of Amplitude Modulated Electrostatic Polymer Nanolithography

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US Patent:
7241992, Jul 10, 2007
Filed:
Jan 19, 2005
Appl. No.:
11/040299
Inventors:
Sergei F. Lyuksyutov - Akron OH, US
Shane Juhl - Dayton OH, US
Richard A. Vaia - Beavercreek OH, US
Pavlo B. Paramonov - Akron OH, US
Assignee:
United States of America as represented by the Secretary of the Air Force - Washington DC
International Classification:
G01N 13/16
US Classification:
250307, 250306, 73105
Abstract:
A method of amplitude modulated electrostatic polymer nanolithography providing rapid creation of features in a polymer film is disclosed. The nanolithography method of the present invention generates features by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters (10-10nm) of polymer by Joule heating enabling high data densities upon the surface of the polymer. This localized Joule heating is accomplished by current flow between the cantilever AFM tip and a conductive wafer upon which the layer of polymer is grown or mounted.

Method Of Polymer Nanolithography

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US Patent:
7431970, Oct 7, 2008
Filed:
Mar 25, 2004
Appl. No.:
10/817406
Inventors:
Sergei Lyuksyutov - Akron OH, US
Shane Juhl - Dayton OH, US
Richard Vaia - Beavercreek OH, US
Assignee:
United States of America as represented by the Secretary of the Air Force - Washington DC
International Classification:
B05D 5/00
US Classification:
427256, 264405
Abstract:
An atomic force microscopy polymer nanolithography method is described. The method of the present invention enables rapid creation of raised or depressed features in a polymer film. The features are generated by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters of polymer by Joule heating. This localized softening of the polymer is accomplished by current flow between the AFM tip and a conductive wafer upon which the layer of polymer is mounted.

Method Of Z-Lift Electrostatic Nanolithography

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US Patent:
7538332, May 26, 2009
Filed:
Sep 1, 2005
Appl. No.:
11/217843
Inventors:
Shane Juhl - Dayton OH, US
Sergei F. Lyuksyutov - Akron OH, US
Richard A. Vaia - Beavercreek OH, US
Assignee:
The United States of America as represented by the Secretary of the Air Force - Washington DC
International Classification:
H01J 37/26
US Classification:
2504922, 250307
Abstract:
The method of the present invention utilizes atomic force microscopy techniques (AFM) for the reversible formation of nanoscale polymeric features by localized heating and mechanical deformation, generated through electrostatically mediated interactions across the polymer film between a conductive backplane and the cantilever AFM tip. This technique utilizes a selective lifting/placement of the cantilevered tip in the z direction (perpendicular to the planar surface of the polymer) to produce nanostructures of precise dimensions in contact AFM mode from regions of polymer locally heated by current flow between the cantilever AFM tip and the conductive substrate.

Nanoparticles And Corona Enhanced Mems Switch Apparatus

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US Patent:
7768366, Aug 3, 2010
Filed:
Oct 29, 2007
Appl. No.:
11/998975
Inventors:
Steven T. Patton - Springfield OH, US
Jeffrey H. Sanders - Vandalia OH, US
Andrey A. Voevodin - Dayton OH, US
Mark Pender - Mauldin SC, US
Richard A. Vaia - Beavercreek OH, US
Robert I. MacCuspie - Beavercreek OH, US
Steve J. Diamanti - Xenia OH, US
Assignee:
The United States of America as represented by the Secretary of the Air Force - Washington DC
International Classification:
H01H 51/22
US Classification:
335 78, 200181
Abstract:
A life and electrical properties enhanced microelectromechanical systems (MEMS) switch apparatus in which a combined nanoparticle and ionic fluid lubricant is used to prolong switch elements operating lifetime and desirable electrical characteristics during this lifetime. Nanoparticle materials such as noble metal particles are combined with ionic corona producing liquid organic materials to achieve a desirable contact lubricant material serving to delay the onset of several disclosed classic contact failure mechanisms. Improvement over other contact lubricant materials and favorable contact testing results are included.

Nanocomposites Of Repeat Sequence Proteins And Phyllosilicate Clays And Their Preparation

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US Patent:
8445641, May 21, 2013
Filed:
Aug 22, 2006
Appl. No.:
11/990665
Inventors:
Lawrence F. Drummy - Huber Heights OH, US
Joseph C. McAuliffe - Sunnyvale CA, US
Rajesh R. Naik - Centerville OH, US
Richard A. Vaia - Beavercreek OH, US
Assignee:
The United States of America as represented by the Secretary of the Air Force - Washington DC
International Classification:
C07K 4/12
US Classification:
530353
Abstract:
Nanocomposites of repeat sequence protein polymers and phyllosilicates demonstrated improved material properties, for example, improved elasticity, and are useful as suture, tissue scaffolding, and biodegradable composite materials.

Isbn (Books And Publications)

Polymer Nanocomposites: Synthesis, Characterization, and Modeling

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Author

Richard A. Vaia

ISBN #

0841237689

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Richard A Vaia from Beavercreek, OH, age ~55 Get Report