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Rajul V Randive

from Schenectady, NY
Age ~60
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Also known as:
Rajul Y Randive, Fajul V Randive
Related to:
Jennie B Labuhn, 49Ratna R Randive, 56Madhvi M Bansal, 49Ratna RandiveDevyani M Mehta, 81Kaleel JamisonRatna M Mehta, 55Nandini M Labuhn, 52Kokila V RandiveManmohan D Mehta, 83Vidyadhar S Randive, 52
Connected to:
Frederick F Randjbar, 68Mike Randjelovic, 79Nenad Randjelovic, 46Stefan J Randjelovic, 39Sakara I Randklev, 35Aaron K Randle, 58Adrian V Randle, 56Arthur L Randle, 45Aubrisa Randle, 35Austin Randle, 59

Rajul Randive Phones & Addresses

  • Schenectady, NY
  • 43 Market St, Potsdam, NY 13676
  • 1077 East Ave, Rochester, NY 14607
  • 104 Kingsberry Dr, Rochester, NY 14626
  • Albany, NY
  • Pittsford, NY
  • 94 Jessica Ln, Schenectady, NY 12309

Work

Company: Crystalis consulting Jul 2011 Position: Director, applications engineering

Education

Degree: Master of Business Administration, Masters School / High School: University at Albany, Suny 2007 to 2009

Skills

Thin Films • Design of Experiments • Cvd • Sputtering • Process Simulation • Materials Science • Manufacturing • Pvd • Coatings • Semiconductors • Product Development • Metrology • Jmp • Nanotechnology • Semiconductor Industry • Spc • Water Purification • Ellipsometry • Afm • Atomic Layer Deposition • Process Engineering • Tem • Silicon • Photolithography • Ftir • Optics • Failure Analysis • Etching • Photovoltaics • Mocvd • Solar Energy • Plasma Etch • Technology Transfer • Solar Cells • Vacuum • Mems • Technology Development • Semiconductor Manufacturing • Optoelectronics • Microelectronics • Research and Development • Testing • Engineering Management • Materials

Languages

English • Gujarati • Marathi

Interests

Science and Technology • Environment • Disaster and Humanitarian Relief

Industries

Semiconductors

Resumes

Resumes

Rajul Randive Photo 1

Director, Applications Engineering

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Location:
70 Cohoes Ave, Green Island, NY 12183
Industry:
Semiconductors
Work:
Crystalis Consulting
Director, Applications Engineering
Sematech 2003 - 2011
Working on Jda
Veeco Instruments 2000 - 2003
Development Engineer and Operations Manager
Cvc Brasil 1997 - 2002
Engineer
Education:
University at Albany, Suny 2007 - 2009
Master of Business Administration, Masters University at Albany, Suny 1997 - 1998
Master of Business Administration, Masters Clarkson University 1990 - 1997
Doctorates, Doctor of Philosophy, Chemistry Gujarat University 1988 - 1990
Master of Science, Masters, Organic Chemistry
Skills:
Thin Films
Design of Experiments
Cvd
Sputtering
Process Simulation
Materials Science
Manufacturing
Pvd
Coatings
Semiconductors
Product Development
Metrology
Jmp
Nanotechnology
Semiconductor Industry
Spc
Water Purification
Ellipsometry
Afm
Atomic Layer Deposition
Process Engineering
Tem
Silicon
Photolithography
Ftir
Optics
Failure Analysis
Etching
Photovoltaics
Mocvd
Solar Energy
Plasma Etch
Technology Transfer
Solar Cells
Vacuum
Mems
Technology Development
Semiconductor Manufacturing
Optoelectronics
Microelectronics
Research and Development
Testing
Engineering Management
Materials
Interests:
Science and Technology
Environment
Disaster and Humanitarian Relief
Languages:
English
Gujarati
Marathi

Publications

Us Patents

High Throughput Vaporizer

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US Patent:
20030222360, Dec 4, 2003
Filed:
May 29, 2002
Appl. No.:
10/157696
Inventors:
Rajul Randive - Pittsford NY, US
William Messner - Mt. Morris NY, US
International Classification:
B01F003/04
US Classification:
261/128000, 261/021000, 261/DIG065
Abstract:
A two-stage vaporizer includes two vaporizing stages joined by a vaporization chamber located gravitationally below the first vaporizing stage and gravitationally above the second vaporizing stage. A separator covering an outlet within the vaporization chamber allows vaporized precursor from both vaporizing stages to pass through the outlet to chemical vapor deposition system and prevents any remaining liquid precursor from passing through the outlet. The liquid precursor is premixed with carrier gas just prior to entry into the vaporizer. Additional flows of carrier gas pass through the two vaporizing stages in opposite directions to carry the vaporized precursor to the outlet.

Fluid Treatment Reactor

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US Patent:
20210087078, Mar 25, 2021
Filed:
Dec 8, 2020
Appl. No.:
17/115737
Inventors:
- Green Island NY, US
RAJUL RANDIVE - Niskayuna NY, US
STEVEN BERGER - Newburyport MA, US
International Classification:
C02F 1/32
A61L 2/26
A61L 2/10
Abstract:
A system for disinfecting fluid includes a plurality of fluid reactors. Each of the fluid reactors includes at least one UVC LED. The UVC LED includes an LED chip configured to emit UVC radiation and a package coupled with the LED chip. The LED chip has a top surface that defines a chip top surface area. The top surface is formed from a semiconductor material having an index of refraction. The fluid reactor has at least one wall that defines a chamber configured to contain the fluid. The at least one wall has an aperture configured to receive UVC radiation into the chamber. The aperture extends through the at least one wall. The aperture has an aperture area that is (1) smaller than a top surface area of the package and (2) equal to or larger than the chip top surface area.

Fluid Treatment Reactor

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US Patent:
20200331775, Oct 22, 2020
Filed:
Apr 22, 2020
Appl. No.:
16/855939
Inventors:
- Green Island NY, US
RAJUL RANDIVE - Niskayuna NY, US
STEVEN BERGER - Newburyport MA, US
International Classification:
C02F 1/32
A61L 2/26
A61L 2/10
Abstract:
A system for disinfecting fluid includes a UVC LED. The UVC LED includes an LED chip configured to emit UVC radiation and a package coupled with the LED chip. The LED chip has a top surface that defines a chip top surface area. The top surface is formed from a semiconductor material having an index of refraction. The fluid reactor has at least one wall that defines a chamber configured to contain the fluid. The at least one wall has an aperture configured to receive UVC radiation into the chamber. The aperture extends through the at least one wall. The aperture has an aperture area that is (1) smaller than a top surface area of the package and (2) equal to or larger than the chip top surface area.

Systems And Methods For Fluid Treatment With Homogeneous Distribution Of Ultraviolet Light

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US Patent:
20170320755, Nov 9, 2017
Filed:
Jul 21, 2017
Appl. No.:
15/656004
Inventors:
Jianfeng Chen - Ballston Lake NY, US
Rajul V. Randive - Niskayuna NY, US
Craig Moe - Latham NY, US
International Classification:
C02F 1/32
Abstract:
In various embodiments, a fluid is treated by flowing the fluid through a flow cell having (i) a fluid entry, (ii) a fluid exit, (iii) a treatment region disposed between the fluid entry and exit, and (iv) an interior surface reflective to ultraviolet (UV) light, and diffusively reflecting UV light emitted from one or more UV light sources to illuminate the treatment region substantially uniformly, thereby treating the fluid.

Systems And Methods For Fluid Treatment With Homogeneous Distribution Of Ultraviolet Light

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US Patent:
20160200594, Jul 14, 2016
Filed:
Mar 24, 2016
Appl. No.:
15/079173
Inventors:
Jianfeng Chen - Ballston Lake NY, US
Rajul V. Randive - Niskayuna NY, US
Craig Moe - Latham NY, US
International Classification:
C02F 1/32
Abstract:
In various embodiments, a fluid is treated by flowing the fluid through a flow cell having (i) a fluid entry, (ii) a fluid exit, (iii) a treatment region disposed between the fluid entry and exit, and (iv) an interior surface reflective to ultraviolet (UV) light, and diffusively reflecting UV light emitted from one or more UV light sources to illuminate the treatment region substantially uniformly, thereby treating the fluid.

Systems And Methods For Fluid Treatment With Homogeneous Distribution Of Ultraviolet Light

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US Patent:
20150060692, Mar 5, 2015
Filed:
Aug 29, 2014
Appl. No.:
14/472733
Inventors:
Jianfeng Chen - Ballston Lake NY, US
Rajul V. Randive - Niskayuna NY, US
Craig Moe - Latham NY, US
International Classification:
C02F 1/32
US Classification:
250435
Abstract:
In various embodiments, a fluid is treated by flowing the fluid through a flow cell having (i) a fluid entry, (ii) a fluid exit, (iii) a treatment region disposed between the fluid entry and exit, and (iv) an interior surface reflective to ultraviolet (UV) light, and diffusively reflecting UV light emitted from one or more UV light sources to illuminate the treatment region substantially uniformly, thereby treating the fluid.
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Rajul V Randive from Schenectady, NY, age ~60 Get Report