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Ragesh Puthenkovilakam

from Portland, OR
Age ~45
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Also known as:
Ragesh Puthen, Ragesh Puthenkovila, Regesh Puthentoeilakam, Ragesh M
Connected to:
Marianne B Puthenmadom, 59John Puthenpurayil, 77Joseph M Puthenpurakal, 75George Puthenveetil, 49Johney J Puthenvila, 49Joseph P Puthenveetil, 39Suresh K Puthigai, 71Harini Puthiyadeth, 41Ajith K Puthiyottil, 49Adam J Puthoff, 45

Ragesh Puthenkovilakam Phones & Addresses

  • Portland, OR
  • Beaverton, OR
  • 3767 Mentone Ave #211, Los Angeles, CA 90034
  • 3733 Military Ave #4, Los Angeles, CA 90034 (310) 836-7550
  • 3733 Military Ave, La, CA 90034 (310) 836-7550

Resumes

Resumes

Ragesh Puthenkovilakam Photo 1

Sr. Process Engineer At Intel Corporation

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Position:
Sr. Process Engineer at Intel Corporation
Location:
Portland, Oregon Area
Industry:
Semiconductors
Work:
Intel Corporation since Oct 2004
Sr. Process Engineer
University of California, Los Angeles Jan 2001 - Oct 2004
Graduate Research Assistant
University of California, Los Angeles Jan 2001 - Oct 2004
Teaching Assistant
Zuari Industries Ltd May 2003 - Jul 2003
Summer Intern
Education:
University of California, Los Angeles 2000 - 2004
Ph.D, Chemical Engineering Indian Institute of Technology, Kharagpur 1996 - 2000
B. Tech (Hons.), Chemical Engineering
Ragesh Puthenkovilakam Photo 2

Ragesh Puthenkovilakam

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Publications

Us Patents

High Selectivity, Low Stress, And Low Hydrogen Diamond-Like Carbon Hardmasks By High Power Pulsed Low Frequency Rf

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US Patent:
20220216037, Jul 7, 2022
Filed:
May 28, 2020
Appl. No.:
17/595505
Inventors:
- Fremont CA, US
Pramod Subramonium - Beaverton OR, US
Ragesh Puthenkovilakam - Portland OR, US
Rujun Bai - Tigard OR, US
David French - Fort Myers FL, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
H01J 37/32
H01L 21/027
C23C 16/517
C23C 16/52
H01L 21/311
H01L 21/3213
Abstract:
Provided herein are methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate by pulsing a low frequency radio frequency component at a high power. Pulsing low frequency power may be used to increase the selectivity or reduce the stress of an AHM. The AHM may then be used to etch features into underlying layers of the substrate.
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Ragesh Puthenkovilakam from Portland, OR, age ~45 Get Report