Inventors:
Peter J. Zampardi - Newbury Park CA
Klaus F. Schuegraf - Aliso Viejo CA
Paul Kempf - Santa Ana CA
Peter Asbeck - San Diego CA
Assignee:
Newport Fab, LLC - Newport Beach CA
International Classification:
H01L 21331
Abstract:
In one disclosed embodiment, a collector is deposited and a base is grown on the collector, for example, by epitaxially depositing either silicon or silicon-germanium. An emitter is fabricated on the base followed by implant doping an extrinsic base region. For example, the extrinsic base region can be implant doped using boron. The extrinsic base region doping diffuses out during subsequent thermal processing steps in chip fabrication, creating an out diffusion region in the device, which can adversely affect various operating characteristics, such as parasitic capacitance and linearity. The out diffusion is controlled by counter doping the out diffusion region. For example, the counter doped region can be implant doped using arsenic or phosphorous. Also, for example, the counter doped region can be formed using tilt implanting or, alternatively, by implant doping the counter doped region and forming a spacer on the base prior to implanting the extrinsic base region.