US Patent:
20190257768, Aug 22, 2019
Inventors:
- Milpitas CA, US
Pavel Kolchin - Fremont CA, US
Mikhail Haurylau - San Jose CA, US
Robert M. Danen - Pleasanton CA, US
David W. Shortt - Los Gatos CA, US
International Classification:
G01N 21/95
G01N 21/94
G01N 21/64
Abstract:
Systems and methods for determining information for defects on a wafer are provided. One system includes an illumination subsystem configured to direct light having one or more illumination wavelengths to a wafer. The one or more illumination wavelengths are selected to cause fluorescence from one or more materials on the wafer without causing fluorescence from one or more other materials on the wafer. The system also includes a detection subsystem configured to detect only the fluorescence from the one or more materials or to detect non-fluorescent light from the wafer without detecting the fluorescence from the one or more materials. In addition, the system includes a computer subsystem configured to determine information for defects on the wafer using output generated by the detection subsystem responsive to the detected fluorescence or the detected non-fluorescent light.