Paul E Lustiber

6855916, Feb 15, 2005

Dec 10, 2003

10/732161

Brian Matthews - Somerville MA, US
James R. Willis - Salem MA, US
Paul E. Lustiber - Chelmsford MA, US

Axcelis Technologies, Inc. - Beverly MA

F27B005/14

219390, 219405, 219411, 392416, 392418, 118724, 118725, 118 501

A method for thermally processing a substrate provides a target substrate temperature and generates a move profile of the substrate within a thermal processing system. An amount of heat is provided to the substrate, and one or more temperatures associated with one or more respective locations on the substrate are measured. A predicted temperature profile is further generated, wherein a predicted temperature of the substrate is based on the amount of heat provided and the one or more measured temperatures. The amount of heat provided to the substrate is further regulated, based on the predicted temperature profile, wherein the substrate is thermally processed generally according to the intended substrate temperature profile. The amount of heat provided to the substrate can be further regulated by controlling a position of the substrate within the thermal processing system.

7205231, Apr 17, 2007

Oct 29, 2004

10/976710

Peter A. Frisella - Peabody MA, US
Paul Lustiber - Chelmsford MA, US
James Willis - Salem MA, US

Axcelis Technologies, Inc. - Beverly MA

H01L 21/44

438663, 438 54, 438906, 438715, 257E21082

The present invention is directed to a method for thermally processing a substrate in a thermal processing system. The method provides an amount of heat to the substrate and obtains information associated with the substrate when the amount of heat is provided. For example, the substrate is provided at a presoak position within the thermal processing system, wherein the presoak position, and one or more properties associated with the substrate, such as a position and temperature, are measured. An optimal process parameter value to provide an optimal thermal uniformity of the substrate is then determined, based, at least in part, on the information obtained from the substrate. For example, a soak position of the substrate is determined, wherein the determination is based, at least in part, on the one or more measured properties associated with the substrate, and a thermal uniformity associated with a reference data set.

59593059, Sep 28, 1999

Jun 19, 1998

9/099997

Michael E. Mack - Manchester MA
Michel Pharand - Woburn MA
Paul E. Lustiber - Chelmsford MA
David J. Fish - Melrose MA

Eaton Corporation - Cleveland OH

H01J 37317

25049221

A charge neutralization monitor monitors the operation of a charge neutralization system for an ion implantation system. The charge neutralization system produces neutralizing electrons in a region through which an ion beam passes in treating one or more workpieces. The charge neutralization monitor applies a suitable voltage to a target electrode positioned to collect neutralizing electrons produced by the charge neutralization system. The charge neutralization monitor then determines the available neutralizing electron current that may be produced by the charge neutralization system by monitoring the current flowing through the target electrode.