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Paul J Labeaume

from Millbury, MA
Age ~41
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Also known as:
Paul J Marino, Paul J Lebeaume, Paul La Beaume
Related to:
Christina La Beaume, 69
Connected to:
David C Labeause, 50Jessica Labeck, 33Jay Labecki, 61Gerald P Labedz, 74Keith Labedz, 44Kimberly A Labedz, 51Carl Labeet, 69Emily E Labeff, 74Victor Labega, 41Justin C Label, 50

Paul Labeaume Phones & Addresses

  • Millbury, MA
  • 1 Camden Dr, Auburn, MA 01501 (508) 832-3973
  • 35 Frost St, Framingham, MA 01701 (508) 309-6773
  • 3 David Rd, Framingham, MA 01701 (508) 309-6773
  • Medford, MA
  • Basking Ridge, NJ

Resumes

Resumes

Paul Labeaume Photo 1

R And D Leader

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Location:
1 Camden Dr, Auburn, MA 01501
Industry:
Chemicals
Work:
Dupont
R and D Leader
The Dow Chemical Company
R and D Manager
The Dow Chemical Company Aug 2016 - Apr 2017
Associate R and D Manager
The Dow Chemical Company Nov 2013 - Aug 2016
Associate Research Scientist
The Dow Chemical Company Feb 2011 - Nov 2013
Senior Chemist
Education:
Northeastern University 2005 - 2010
Doctorates, Doctor of Philosophy, Philosophy, Organic Chemistry Assumption University 2001 - 2005
Bachelors, Bachelor of Arts, Chemistry
Skills:
Organic Chemistry
Organic Synthesis
Chemistry
Polymers
Polymer Chemistry
Uv/Vis
Materials Science
Formulation
Analytical Chemistry
Coatings
Catalysis
Mass Spectrometry
Medicinal Chemistry
Polymer Characterization
Gas Chromatography
Carpentry
Data Analysis
Formulation Chemistry
Drafting Patent Applications
Interests:
Science and Technology
Education
Environment
Paul Labeaume Photo 2

Paul Labeaume

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Publications

Us Patents

Polymerizable Photoacid Generators

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US Patent:
20120171616, Jul 5, 2012
Filed:
Dec 29, 2011
Appl. No.:
13/339948
Inventors:
James W. Thackeray - Braintree MA, US
Suzanne M. Coley - Mansfield MA, US
Vipul Jain - Westborough MA, US
James F. Cameron - Brookline MA, US
Paul J. LaBeaume - Framingham MA, US
Ahmad E. Madkour - Midland MI, US
International Classification:
G03F 7/20
C07C 69/593
G03F 7/004
C07C 69/54
C08F 228/06
C08G 63/688
US Classification:
4302851, 526243, 528354, 430311, 430296, 560221, 560222, 560195
Abstract:
A compound has formula (I):wherein Q is a halogenated or non-halogenated, Colefin-containing group, A is a fluorine-substituted Calkylene group, a fluorine-substituted Ccycloalkylene group, a fluorine-substituted Carylene group, or a fluorine-substituted Calkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G has formula (II):wherein X is S or I, each Ris halogenated or non-halogenated and is independently Calkyl group; a polycyclic or monocyclic Ccycloalkyl group; a polycyclic or monocyclic Caryl group; or a combination of these, wherein when X is S, one of the Rgroups is optionally attached to one adjacent Rgroup by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

Onium Compounds And Methods Of Synthesis Thereof

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US Patent:
20140080056, Mar 20, 2014
Filed:
Sep 16, 2013
Appl. No.:
14/027361
Inventors:
Paul J. LaBEAUME - Auburn MA, US
International Classification:
G03F 7/004
US Classification:
4302701, 549 27, 430325
Abstract:
New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.

Acid Generators And Photoresists Comprising Same

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US Patent:
20140080058, Mar 20, 2014
Filed:
Sep 16, 2013
Appl. No.:
14/027324
Inventors:
Vipul JAIN - North Grafton MA, US
Paul J. LaBEAUME - Auburn MA, US
Jin Wuk SUNG - Worcester MA, US
James W. THACKERAY - Braintree MA, US
International Classification:
G03F 7/027
G03F 7/20
US Classification:
4302811, 430326, 430296, 549 43
Abstract:
Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

Acid Generator Compounds And Photoresists Comprising Same

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US Patent:
20140080060, Mar 20, 2014
Filed:
Sep 16, 2013
Appl. No.:
14/027375
Inventors:
Paul J. LaBEAUME - Auburn MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/038
G03F 7/039
G03F 7/20
US Classification:
4302811, 430325, 430296, 549 43
Abstract:
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, cyclic sulfonium salt and photoresist compositions that comprise such compounds are provided. In another preferred aspect, acid generator compounds are provided that comprise one or more covalently linked acid-labile moieties, particularly ester-containing acid-labile moieties.

Photoresists Comprising Multiple Acid Generator Compounds

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US Patent:
20140080062, Mar 20, 2014
Filed:
Sep 16, 2013
Appl. No.:
14/027400
Inventors:
Jin Wuk SUNG - Worcester MA, US
Paul J. LaBEAUME - Auburn MA, US
Vipul JAIN - North Grafton MA, US
International Classification:
G03F 7/004
G03F 7/20
US Classification:
4302851, 430325, 430296
Abstract:
The present invention relates to new photoresist compositions that comprise (a) a polymer comprising an acid generator bonded thereto; and (b) an acid generator compound that is not bonded to the polymer and that comprises one or more acid-labile groups.

Photoacid Generators

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US Patent:
20120141939, Jun 7, 2012
Filed:
Nov 30, 2011
Appl. No.:
13/307198
Inventors:
James W. Thackeray - Braintree MA, US
Suzanne M. Coley - Mansfield MA, US
James F. Cameron - Brookline MA, US
Paul J. LaBeaume - Framingham MA, US
Ahmad E. Madkour - Midland MI, US
Vipul Jain - Westborough MA, US
International Classification:
G03F 7/20
C07C 309/06
G03F 7/027
US Classification:
4302851, 4302811, 430311, 562113
Abstract:
A photoacid generator compound has formula (I):wherein G has formula (II):In formula (II), X is S or I, each Ris commonly attached to X and is independently Calkyl; polycyclic or monocyclic Ccycloalkyl; polycyclic or monocyclic Caryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more Rgroups are further attached to an adjacent Rgroup, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.

Photoresist Underlayer Compositions And Patterning Methods

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US Patent:
20220197141, Jun 23, 2022
Filed:
Dec 17, 2020
Appl. No.:
17/124743
Inventors:
- Marlborough MA, US
Michael Finch - Chelmsford MA, US
Paul J. LaBeaume - Auburn MA, US
Shintaro Yamada - Shrewsbury MA, US
Suzanne M. Coley - Mansfield MA, US
International Classification:
G03F 7/11
C08F 12/08
C08F 12/22
C09D 125/14
C09D 125/18
C23C 16/02
C23C 16/20
C23C 16/455
G03F 7/16
H01L 21/027
Abstract:
A method of forming a pattern on a substrate, the method including:

Photoresist Underlayer Compositions And Patterning Methods

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US Patent:
20220197142, Jun 23, 2022
Filed:
Dec 17, 2020
Appl. No.:
17/124751
Inventors:
- Marlborough MA, US
Michael Finch - Chelmsford MA, US
Paul J. LaBeaume - Auburn MA, US
Shintaro Yamada - Shrewsbury MA, US
Suzanne M. Coley - Mansfield MA, US
International Classification:
G03F 7/11
C08G 65/40
C09D 171/12
C08G 73/06
C09D 179/04
C08F 220/18
C09D 133/10
C23C 16/02
C23C 16/20
C23C 16/455
G03F 7/16
G03F 7/42
H01L 21/027
Abstract:
A method of forming a pattern on a substrate, the method including:
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Paul J Labeaume from Millbury, MA, age ~41 Get Report