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Norm V Gitis

from Menlo Park, CA
Age ~69
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Also known as:
Norm Victor Gitis, Norm F Gitis, Norm Te Gitis, Naum V Gitis, Norm Giti
Phone and address:
125 Gloria Cir, Menlo Park, CA 94025
(650) 384-6536
Related to:
Paula Gitis, 35Julia Gitis, 39Victor Gitis, 99Marina Gitis, 68
Connected to:
Fred A Gitles, 78Galina Gitlevich, 77Gregory Gitlevich, 63Edward Gitlin, 67Mark I Gitlin, 67Melissa P Gitlin, 40Peter L Gitlin, 75Shari A Gitlin, 35Zohar Z Gitlis, 37Emilie S Gitlitz, 37

Norm Gitis Phones & Addresses

  • 125 Gloria Cir, Menlo Park, CA 94025 (650) 384-6536
  • 1715 Dell Ave, Campbell, CA 95008
  • San Jose, CA
  • 2000 Walnut Ave, Fremont, CA 94538
  • 10131 Firwood Dr, Cupertino, CA 95014 (408) 255-3576
  • Palo Alto, CA
  • Lynn, MA
  • Mountain View, CA

Work

Company: Embolx, inc. Apr 2016 Position: Chair of the board of directors

Education

Degree: Doctorates, Doctor of Philosophy School / High School: Ussr Academy of Sciences 1979 to 1983 Specialities: Philosophy, Mechanical Engineering

Skills

Nanotechnology • Materials Science • R&D • Thin Films • Semiconductors • Patents • Failure Analysis • Afm • Coatings • Tribology • Materials • Characterization • Engineering • Business Development • Optical Microscopy • Engineering Management • Manufacturing • Design of Experiments • Metrology • Physics • Biomedical Engineering • Medical Devices • Public Speaking • Profilometer • Sensors • Optics • Semiconductor Industry • Spectroscopy • Surface Analysis • Finite Element Analysis • Surface Engineering • Lubrication • Polymers • Venture Financing • Business Growth Strategies • Research and Development

Industries

Medical Devices

Resumes

Resumes

Norm Gitis Photo 1

Member, Screening Committee

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Location:
1230 Bordeux Dr, Sunnyvale, CA
Industry:
Medical Devices
Work:
Embolx, Inc.
Chair of the Board of Directors
Ldip
Chair of the Board of Directors
Us Angel Inestors Aug 2013 - Dec 2015
Member, Screening Committee
Life Science Angels Dec 2014 - Dec 2015
Board Member and Chair of Device Screening Committee
First Light Biosciences Dec 2014 - Dec 2015
Board Observer
Education:
Ussr Academy of Sciences 1979 - 1983
Doctorates, Doctor of Philosophy, Philosophy, Mechanical Engineering
Skills:
Nanotechnology
Materials Science
R&D
Thin Films
Semiconductors
Patents
Failure Analysis
Afm
Coatings
Tribology
Materials
Characterization
Engineering
Business Development
Optical Microscopy
Engineering Management
Manufacturing
Design of Experiments
Metrology
Physics
Biomedical Engineering
Medical Devices
Public Speaking
Profilometer
Sensors
Optics
Semiconductor Industry
Spectroscopy
Surface Analysis
Finite Element Analysis
Surface Engineering
Lubrication
Polymers
Venture Financing
Business Growth Strategies
Research and Development

Business Records

Name / Title
Company / Classification
Phones & Addresses
Norm Gitis
Owner
Center for Tribology, Inc.
Computer Software
1717 Dell Ave, Campbell, CA 95008
1715 Dell Ave, Campbell, CA 95008
(408) 376-4040, (408) 376-4050
Norm V. Gitis
President
BRUKER TMT INC
Mfg Computer Peripheral Equipment Testing Laboratory Commercial Physical Research
1717 Dell Ave, Campbell, CA 95008
1715 Dell Ave, Campbell, CA 95008

Publications

Us Patents

Method And Device For Measuring Forces

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US Patent:
6363798, Apr 2, 2002
Filed:
Jul 24, 2000
Appl. No.:
09/624512
Inventors:
Norm Gitis - Cupertino CA, 95014
Michael Vinogradov - Sunnyvale CA, 94087
Vlad Dorfman - Sunnyvale CA, 94086
International Classification:
G01L 504
US Classification:
73862391, 73862381, 73862632, 73862633
Abstract:
The device of the invention is intended for measuring a loading force and a friction force in a tribological tester. The device consists of two deformation-sensitive sensors for simultaneous equal deformation in two opposite directions for eliminating misbalance created in the measurement system when a single sensor is used. Each sensor is a deformable beam having through longitudinal slots extending in different and non-parallel directions and overlapped within the body of the beam. The sensor deforms in one direction under the effect of a loading force measured by two pairs of strain gauges located on opposite sides of the beam near one end of the beam and in another direction under the effect of a friction force measured by another two pairs of strain gauges located on opposite sides of the beam near the other end of the beam. Two sensors are sandwiched between two plates in a diagonally symmetrical positions so as to transmit forces between both plates and at the same time to ensure limited freedom of movement between both plates to allow deformations caused by the applied forces. One plate may be attached to the loading unit of the tester and another plate may support an upper sample for engagement with the lower sample of the tester.

Method And Apparatus For Measuring Friction And Wear Characteristics Of Materials

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US Patent:
6418776, Jul 16, 2002
Filed:
Jul 24, 2000
Appl. No.:
09/624500
Inventors:
Norm Gitis - Cupertino CA
Michael Vinogradov - Sunnyvale CA
Vlad Dorfman - Sunnyvale CA
Assignee:
Center for Tribology, Inc. - Campbell CA
International Classification:
G01N 356
US Classification:
73 10, 73 9
Abstract:
A universal friction tester for testing tribological properties of materials comprises a frame with a carriage sliding in vertical guides and supporting a slide moveable in a horizontal direction. The slide supports a stationary upper specimen, which engages a moveable lower specimen, located in a replaceable module attachable to a base plate of the frame. The modules may be of a rotary, reciprocating, a block-on-ring, or any other type, required for different test conditions. Testing can also be carried out with heating or with the supply of oil in the zone of contact between the specimens.

Method And Apparatus For Controlled Polishing

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US Patent:
6494765, Dec 17, 2002
Filed:
May 17, 2001
Appl. No.:
09/859062
Inventors:
Norm Gitis - Cupertino CA
Michael Vinogradov - Sunnyvale CA
Assignee:
Center for Tribology, Inc. - Campbell CA
International Classification:
B24B 4900
US Classification:
451 5, 451 8, 451287
Abstract:
An apparatus for controlling a polishing process, in particular for detecting an end point of the polishing process, comprising a rotating or orbiting platen with a pad, a rotating head that supports an object to be treated, e. g. , a semiconductor wafer, and performs radial movements with respect to the platen, and a polishing process control system comprising a plurality of groups of various sensing devices for detecting an end point of the process. In the illustrated embodiment one group of the sensing devices is a group of high-frequency acoustic emission sensors built on various levels into components of the rotating head. Another group of sensing devices is represented by force/torque sensors connected with various elements of the rotating head and the platen, respectively, and intended for direct measurement of compression force and friction response (force or torque) between the head and the platen and a coefficient of friction between the wafer and the polishing pad. All groups of sensors work simultaneously and their measurement data is processed and analyzed by a control unit for obtaining accurate and reliable results.

Microscratch Test Indenter And Method Of Microscratch Testing

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US Patent:
6502455, Jan 7, 2003
Filed:
Sep 25, 2000
Appl. No.:
09/668551
Inventors:
Norm Gitis - Cupertino CA
Michael Vinogradov - Sunnyvale CA
Assignee:
Center for Tribology, Inc. - Campbell CA
International Classification:
G01N 324
US Classification:
73150A
Abstract:
A method and an indenter for microscratch test of durability properties of the materials, including resistance of coating films to delamination. The blade-like indenter has a prism-like body defined by a front side, a rear side, a first lateral side, and a second lateral side. The first lateral side and the second lateral side converge and form at their intersection an edge that extends from the front side to the rear side. An angle between the edge and the front side is sharp, and an angle between the first lateral side and the second lateral side is rounded with a radius. During the test, the blade-like indenter is installed at selected angles of attack to the surface of the test material; a relative movement is created between the indenter and the test material with simultaneous mechanical, electrical, and acoustical measurements. Analysis of the test results has confirmed that the micro-blade of the invention with two variable attack angles is the most effective indenter for both scratch resistance and adhesion evaluations, as compared to conventional indenters, such as sharp conical tips. The test method includes monitoring various mechanical, electrical and acoustic parameters of the indenter-to-surface interactions and their mutual correlation for durability evaluation.

Perfluoropolyether Compounds As Magnetic Media Lubricants

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US Patent:
6559108, May 6, 2003
Filed:
Nov 15, 2000
Appl. No.:
09/712891
Inventors:
Jon Lee Howell - Bear DE
David Gareth Vaughan Jones - Wheaton IL
Anthony Joseph Huffmann - Chicago IL
Norm V. Gitis - Cupertino CA
Charles Gao - Fremont CA
Assignee:
E.I. du Pont de Nemours and Company - Wilmington DE
Burmah Castrol Trading, Ltd. - Wiltshire
International Classification:
C10M14704
US Classification:
508427, 508588, 428422
Abstract:
A recording medium comprising a phosphorus-containing fluorocarbon compound is provided. The phosphorus-containing fluorocarbon compound can be used as lubricant or as an additive to a lubricant. The phosphorus-containing fluorocarbon compound can be an esterified aryl phosphorus compound, a salt thereof, or combinations thereof.

Method And Apparatus For Detecting The Presence Of Powdered Material In Envelopes

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US Patent:
6573836, Jun 3, 2003
Filed:
Jan 4, 2002
Appl. No.:
10/035967
Inventors:
Norm Gitis - Cupertino CA
Rashid Mavliev - Santa Clara CA
Alex Meyman - Belmont CA
Oleg Shulepov - Santa Clara CA
Assignee:
Nevmet Corporation - Reno NV
International Classification:
G08B 2100
US Classification:
340603, 340540, 7386322, 73 52
Abstract:
An apparatus for detecting the presence of powdered materials in envelopes comprises a container with an envelope-positioning unit, envelope corner or edge cutter, a powder excitation and extracting means for shaking the contents of the envelope, and a powder detector with a particle intake device, and air circulation system for circulation of the particle-containing air through the powder detector. The detector can be placed inside or outside of the sealed container and is connected to the cutting zone via the particle suction device. In operation, the envelope is placed into the envelope-positioning unit. Either a corner or an edge of the envelope is cut off or perforated so as to allow a part of the powdered material to leave the envelope while maintaining the other contents, except for small particulates, intact and inside the envelope. The envelope is then subjected to vibration or impacts under the effect of the excitation means. In case of detection of a hazardous material, the apparatus will produce alarm signals and will lock the door to restrict access to the apparatus.

Method And Apparatus For Polishing Control With Signal Peak Analysis

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US Patent:
6585562, Jul 1, 2003
Filed:
Sep 17, 2001
Appl. No.:
09/953756
Inventors:
Norm V. Gitis - Cupertino CA
Michael A. Vinogradov-Nurenberg - Sunnyvale CA
Assignee:
Nevmet Corporation - Reno NV
International Classification:
B24B 4900
US Classification:
451 5, 451 8
Abstract:
The apparatus for polishing control with signal peak analysis consists of two major units: a polishing machine and a polishing process control and monitoring system which has sensors for sensing changes on the surface and/or inside the object during polishing. In response to the above changes the sensors generate operating data signals. The control and monitoring system, which also contains a signal conditioning unit and a control unit, amplifies the operating data signals and sends them to a signal analyzer, which determines average values and peaks of the conditioned signals. The analyzer also determines a ratio of the peak signal values to an average signal values and compares the obtained ratio with a preliminarily determined reference value optimized with regard to the specific CMP process carried out on the polishing machine. When the measured signal ratio reflects abnormal conditions, polishing conditions are adjusted back to normal by means of a control signal generated on the basis of the aforementioned ratio. The apparatus of the invention also provides quantitative evaluation of changes in the CMP process and automatic control of the CMP process in a manner that optimizes the process and prevents occurrence of defects that might be caused by the controlled process.

Method And Apparatus For Monitoring Polishing Plate Condition

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US Patent:
6702646, Mar 9, 2004
Filed:
Jul 1, 2002
Appl. No.:
10/184369
Inventors:
Norm Gitis - Cupertino CA
Aleksandr Meyman - Belmont CA
Michael Vinogradov - Sunnyvale CA
Mikhail Faynberg - San Jose CA
Vlad Dorfman - Sunnyvale CA
Assignee:
Nevmet Corporation - Reno NV
International Classification:
B24B 5100
US Classification:
451 5, 451 8, 451 21, 451 56, 451443
Abstract:
An apparatus for monitoring a condition of a polishing plate, in particular for detecting the time for the polishing plate to be reconditioned or replaced, comprising a measuring unit containing at least one sensing unit and a signal-conditioning unit; and a data processing unit. The measuring unit is being in contact with the polishing plate and having a possibility to move relative to it. The sensing unit comprises a probing tip and a set of sensors attached to the back surface of the probing tip, and contains at least one sensor of the group of coefficient of friction sensor, acoustic emission sensor, wear sensor. All sensors work simultaneously and their measurement data is processed and analyzed by a data processing unit for obtaining accurate and reliable results.
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Norm V Gitis from Menlo Park, CA, age ~69 Get Report