Inventors:
Frank Y. Xu - Round Rock TX, US
Niyaz Khusnatdinov - Round Rock TX, US
Assignee:
Molecular Imprints, Inc. - Austin TX
Board of Regents, The University of Texas - Austin TX
International Classification:
B01D 19/00
US Classification:
95246, 95241, 427258, 264 85, 264102, 216 9, 216 52
Abstract:
The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to either the viscous liquid, the substrate, the template, or a combination thereof. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.