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Natale Mauro Ceglio

from Pleasanton, CA
Age ~80

Natale Ceglio Phones & Addresses

  • 1121 Pineto Pl, Pleasanton, CA 94566
  • Stockton, CA
  • 12606 Stockholm Way, Truckee, CA 96161 (510) 455-8131
  • 1177 Avenida De Las Palmas, Livermore, CA 94550 (510) 455-8131
  • Miami, FL
  • Alameda, CA
  • Novato, CA
  • San Joaquin, CA

Work

Position: Executive, Administrative, and Managerial Occupations

Education

Degree: Associate degree or higher

Publications

Isbn (Books And Publications)

Multilayer Optics for Advanced X-Ray Applications

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Author

Natale M. Ceglio

ISBN #

0819406759

Us Patents

Scalable Wafer Inspection

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US Patent:
6770862, Aug 3, 2004
Filed:
Jul 28, 2003
Appl. No.:
10/628627
Inventors:
Dragos Maciuca - Castro Valley CA
Natale M. Ceglio - Pleasanton CA
Assignee:
KLA-Tencor Technologies Corporation - Milpitas CA
International Classification:
H01L 2700
US Classification:
2502081, 25055941, 25055945, 3562398, 3562374
Abstract:
An imaging system for detecting defects on a substrate. Sensor module ports are disposed on an imaging platform. Sensor modules are removably connected to the sensor module ports, and are adapted to sense swaths on the surface of the substrate. Each of the sensor modules includes a time domain integration sensor, optics, an analog controller, and a digital controller. The time domain integration sensor optically senses the swath. The optics focus light from the swath on the time domain integration sensor. The analog controller receives signals from the time domain integration sensor and provides data signals. The digital controller receives the data signals, integrates the data signals into an image of the swath, and provides the image as digital signals to the sensor module port. A master controller receives the digital signals, composites them into a single image of a desired portion of the surface of the substrate, and detects defects within the image. A stage moves the substrate under the sensor modules under the control of the master controller, until the desired portion of the surface of the substrate has been imaged.

Source-Collector Module With Gic Mirror And Xenon Liquid Euv Lpp Target System

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US Patent:
8258485, Sep 4, 2012
Filed:
Aug 30, 2010
Appl. No.:
12/807165
Inventors:
Richard A. Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
Assignee:
Media Lario SRL - Bosisio Parini
International Classification:
H01J 37/20
US Classification:
250432R, 250504 R
Abstract:
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Source-Collector Module With Gic Mirror And Lpp Euv Light Source

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US Patent:
8330131, Dec 11, 2012
Filed:
Jun 18, 2010
Appl. No.:
12/803075
Inventors:
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
Assignee:
Media Lario, S.R.L. - Bosisio Parini
International Classification:
G21K 5/04
G03B 27/42
US Classification:
250504R, 359350, 359355, 359359
Abstract:
A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Source-Collector Module With Gic Mirror And Tin Rod Euv Lpp Target System

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US Patent:
8344339, Jan 1, 2013
Filed:
Aug 30, 2010
Appl. No.:
12/807166
Inventors:
Richard A. Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
Assignee:
Media Lario S.R.L. - Bosisio Parini
International Classification:
H01J 37/20
US Classification:
250504R
Abstract:
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a rotating Sn rod in the target portion to generate the EUV radiation. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Euv Collector System With Enhanced Euv Radiation Collection

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US Patent:
8587768, Nov 19, 2013
Filed:
Mar 11, 2011
Appl. No.:
13/065008
Inventors:
Natale M. Ceglio - Pleasanton CA, US
Gopal Vasudevan - San Jose CA, US
Assignee:
Media Lario S.R.L. - Bosisio Parini (LC)
International Classification:
G02B 5/10
G03B 27/42
G03B 27/54
G03B 27/72
US Classification:
355 71, 355 53, 355 67, 359853
Abstract:
A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

Source-Collector Module With Gic Mirror And Tin Vapor Lpp Target System

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US Patent:
20110318694, Dec 29, 2011
Filed:
Jun 28, 2010
Appl. No.:
12/803461
Inventors:
Richard Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
International Classification:
H05G 2/00
G03F 7/20
G03B 27/70
US Classification:
430319, 250504 R, 2504921
Abstract:
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Source-Collector Module With Gic Mirror And Xenon Ice Euv Lpp Target System

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US Patent:
20120050706, Mar 1, 2012
Filed:
Aug 30, 2010
Appl. No.:
12/807167
Inventors:
Richard A. Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
International Classification:
G03B 27/52
H05G 2/00
US Classification:
355 55, 250504 R
Abstract:
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon ice provided by the target portion to an irradiation location. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Source-Collector Module With Gic Mirror And Tin Wire Euv Lpp Target System

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US Patent:
20120050707, Mar 1, 2012
Filed:
Aug 30, 2010
Appl. No.:
12/807170
Inventors:
Richard A. Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
International Classification:
G03B 27/52
H05G 2/00
US Classification:
355 55, 250504 R
Abstract:
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a Sn wire provided by the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
Natale Mauro Ceglio from Pleasanton, CA, age ~80 Get Report