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Michial Duff Howell

from Felton, CA
Age ~60
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Also known as:
Michial D Howell, Michial D Howard, Michael Howell, Michial Hovell
Related to:
Duff HowellDona M Stoller, 63Alicia E Howell, 56Sierra C Howell, 29Richard W Stoller, 74Christopher L Howell, 46Joseph O Howell, 81Wesley J StollerSandra K HowellStephanie E Stoller, 58Sharon D Chastain, 79
Connected to:
Aaron E Howell, 49Abe Howell, 50Adrian Howell, 39Ahmad K Howell, 34Aimee Howell, 51Alana C Howell, 73Allan Howell, 69Ally W Howell, 76Arlene E Howell, 51Arvid L Howell, 90

Michial Howell Phones & Addresses

  • Felton, CA
  • Mountain View, CA
  • Stanford, CA
  • Portland, OR
  • 1911 Sleepy Hollow Ln, Felton, CA 95018

Work

Company: Complete genomics inc 2008 Position: Director of hardware development

Education

School / High School: Stanford University- Palo Alto, CA 1988 Specialities: Ph.D. in Applied Physics

Skills

Physics • Systems Engineering • Experimental Design • Project Management • Rapid Prototyping • Vendor Evaluation • Optics • Fiber Optics • Optical Alignment • Lasers • Fiber Lasers • Mode Locking • Illumination • Cameras • Focusing • Autofocus • Distortion • MTF • Machine Vision • Image Processing • Robotics • Wafer Handling • Controls • Instrument Matching • Thermal Management • Vacuum Systems • Physical Chemistry • Beta Sites • Throughput • Automation • IP Management • Patents • Scripting • Modeling • Biotech • Sonochemistry • Piezoelectrics • Acoustics • Acoustic Transducers • Semiconductors • Documentation • Standards • Failure Analysis • Root Cause Analysis • Statistics • Change Control • Specifications • Training • Coaching • Public Presentation • Six Sigma • Clean Rooms • Word • Excel • PowerPoint.

Resumes

Resumes

Michial Howell Photo 1

Michial Duff Howell Felton, CA

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Work:
Complete Genomics Inc

2008 to 2000
Director of Hardware Development
MDH Technical Consulting
Felton, CA
1993 to 2014
Proprietor
ThermaWave Inc
Fremont, CA
1995 to 2007
Senior Member of the Technical Staff
McKinsey & Company
San Francisco, CA
May 1993 to Jan 1995
Associate
MDH Technical Consulting
San Francisco, CA
1993 to 1995
Associate
Stanford University Department of Applied Physics
Palo Alto, CA
Sep 1986 to May 1993
Research Assistant / Associate
IBM Almaden Research Ctr
San Jose, CA
1986 to 1986
Research Intern
Education:
Stanford University
Palo Alto, CA
1988 to 1993
Ph.D. in Applied Physics
Stanford University
Palo Alto, CA
1986 to 1988
M.S. in Applied Physics
Harvey Mudd College
Claremont, CA
1986
B.S. in Physics
Skills:
Physics, Systems Engineering, Experimental Design, Project Management, Rapid Prototyping, Vendor Evaluation, Optics, Fiber Optics, Optical Alignment, Lasers, Fiber Lasers, Mode Locking, Illumination, Cameras, Focusing, Autofocus, Distortion, MTF, Machine Vision, Image Processing, Robotics, Wafer Handling, Controls, Instrument Matching, Thermal Management, Vacuum Systems, Physical Chemistry, Beta Sites, Throughput, Automation, IP Management, Patents, Scripting, Modeling, Biotech, Sonochemistry, Piezoelectrics, Acoustics, Acoustic Transducers, Semiconductors, Documentation, Standards, Failure Analysis, Root Cause Analysis, Statistics, Change Control, Specifications, Training, Coaching, Public Presentation, Six Sigma, Clean Rooms, Word, Excel, PowerPoint.

Publications

Us Patents

Method And Apparatus For Preparing Semiconductor Wafers For Measurement

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US Patent:
6624393, Sep 23, 2003
Filed:
May 17, 2001
Appl. No.:
09/859917
Inventors:
Michial Duff Howell - Felton CA
Barry Roy Bowman - Dublin CA
Assignee:
Therma-Wave, Inc. - Fremont CA
International Classification:
H05B 368
US Classification:
2194441, 219390, 2194461, 2194481, 21944817, 392416, 118724, 118725
Abstract:
A wafer-cleaning module is disclosed for removing contaminants from a semiconductor wafer prior to measurement in a metrology tool. The cleaning module includes a heating chamber including a heater plate for heating the wafer by conduction. A separate cooling chamber is provided to cool the wafer. The system is controlled by a processor so the heating cycle, cooling cycle and the time periods between these cycles and the measurement cycle are uniform for all wafers.

Method And Apparatus For Preparing Semiconductor Wafers For Measurement

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US Patent:
6861619, Mar 1, 2005
Filed:
Jul 23, 2003
Appl. No.:
10/625407
Inventors:
Michial Duff Howell - Felton CA, US
Barry Roy Bowman - Dublin CA, US
Assignee:
Therma-Wave, Inc. - Fremont CA
International Classification:
H05B003/68
US Classification:
2194441, 2194461, 2194481, 21944817, 21944812, 392416
Abstract:
A wafer-cleaning module can remove contaminants from a semiconductor wafer prior to measurement in a metrology tool. A heating chamber and heater plate of the cleaning module can be used to heat the wafer by conduction, while a separate cooling chamber can be used to cool the wafer. The system is controlled by a processor so the heating cycle, cooling cycle and the time periods between these cycles and the measurement cycle are uniform for all wafers.

Fiber Optic Communication System And Fiber Optic Modulator

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US Patent:
53513185, Sep 27, 1994
Filed:
Apr 5, 1993
Appl. No.:
8/042721
Inventors:
Michial D. Howell - Stanford CA
Gordon S. Kino - Santa Clara County CA
Assignee:
The Board of Trustees of the Leland Stanford Jr./University - Palo Alto CA
International Classification:
G02F 1125
US Classification:
385 3
Abstract:
A modulator adapted to be acoustically coupled to an optical fiber for applying acoustic waves across the fiber at a spatial and phase angle with respect to one another to compress and decompress the optical fiber at said spatial angle responsive to an electrical signal whereby to modulate the polarization state of an optical wave travelling past said modulator. An optical communication system in which light waves are transmitted from a transmitting end to a receiving end and whose polarization is modulated by an acoustic modulator responsive to an input signal and the output signal is demodulated to recover the signal.

Method And Apparatus For Preparing Semiconductor Wafers For Measurement

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US Patent:
62618539, Jul 17, 2001
Filed:
Feb 7, 2000
Appl. No.:
9/499478
Inventors:
Michial Duff Howell - Felton CA
Barry Roy Bowman - Dublin CA
Assignee:
Therma-Wave, Inc. - Fremont CA
International Classification:
H01L 2166
US Classification:
438 14
Abstract:
A wafer-cleaning module is disclosed for removing contaminants from a semiconductor wafer prior to measurement in a metrology tool. The cleaning module includes a heating chamber including a heater plate for heating the wafer by conduction. A separate cooling chamber is provided to cool the wafer. The system is controlled by a processor so the heating cycle, cooling cycle and the time periods between these cycles and the measurement cycle are uniform for all wafers.
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Michial Duff Howell from Felton, CA, age ~60 Get Report