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Marc J Tricard

from Glastonbury, CT
Age ~58
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Also known as:
Marc Jm Tricard, Marc Marc Tricard, Leigh Tricard
Related to:
George W Schneider, 64
Connected to:
Julia Tricarico, 60Krista L Tricarico, 52Melina M Tricarico, 55Rose E Tricario, 53Helen H Tricas, 74Anthony J Tricaso, 53Emily A Tricaso, 57Lisa D Tricaso, 53Ronald J Tricca, 76Alan O Trice, 74

Marc Tricard Phones & Addresses

  • Glastonbury, CT
  • 5 Dickinson Xing, Fairport, NY 14450 (585) 421-9903
  • Wrentham, MA
  • 56 Vassar St, Worcester, MA 01602 (508) 795-7974
  • Rochester, NY
  • Middletown, CT
  • Blacksburg, VA

Work

Company: Zygo corporation Jan 2011 Position: Executive director of business development

Education

Degree: MS School / High School: Virginia Polytechnic Institute and State University 1989 to 1993 Specialities: Materials Science

Skills

Electronics • Materials Science • Optics • R&D • Product Development • Metrology • Engineering • New Business Development • Manufacturing • Materials • Strategy • Engineering Management • Business Development

Languages

French

Awards

3 patents. • 60+ Technical Publications. • Numerous presentations inc. several invi... • Recipient of Norton Company’ Special Ach... • Recipient of Society of Automotive Engin...

Interests

High Tech. Business, New Business Develo...

Industries

Nanotechnology

Resumes

Resumes

Marc Tricard Photo 1

Executive Director Of Business Development At Zygo Corporation

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Position:
Executive Director of Business Development at Zygo Corporation
Location:
Hartford, Connecticut Area
Industry:
Nanotechnology
Work:
Zygo Corporation since Jan 2011
Executive Director of Business Development
Cabot Microelectronics Jul 2006 - Dec 2010
Director of Business Development
QED Technologies Oct 2001 - Dec 2010
Director of Business Development
Saint-Gobain Jul 1996 - Aug 2001
Electronics Business Manager, World
Norton Company 1994 - 1996
Product Development Manager
Education:
Virginia Polytechnic Institute and State University 1989 - 1993
MS, Materials Science Ecole nationale supérieure d'Arts et Métiers 1987 - 1990
Skills:
Electronics
Materials Science
Optics
R&D
Product Development
Metrology
Engineering
New Business Development
Manufacturing
Materials
Strategy
Engineering Management
Business Development
Interests:
High Tech. Business, New Business Development, Intellectual Property, International Business, New Technologies, Optics Industry, Precision Engineering and Metrology, Process Development, R&D, Sales and Marketing, Strategic Planning, M&A.
Honor & Awards:
3 patents. 60+ Technical Publications. Numerous presentations inc. several invited talks worldwide. Recipient of Norton Company’ Special Achievement Award. Recipient of Society of Automotive Engineers (SAE) Award for Excellence in Oral Presentation.
Languages:
French

Business Records

Name / Title
Company / Classification
Phones & Addresses
Marc Tricard
Program Director
QED TECHNOLOGIES INTERNATIONAL, INC
Mfg Computer Peripheral Equipment
1040 University Ave, Rochester, NY 14607
(585) 256-6540

Publications

Us Patents

Cutting Device For Separating Individual Laminated Chip Assemblies From A Strip Thereof, Method Of Separation And A Method Of Making The Cutting Device

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US Patent:
20030153247, Aug 14, 2003
Filed:
Feb 12, 2002
Appl. No.:
10/074331
Inventors:
Marc Tricard - Fairport NY, US
Robert Fisher - Maple Shade NJ, US
Robert Corcoran - Oakham MA, US
International Classification:
B24B027/06
B24D005/00
US Classification:
451/028000
Abstract:
An abrasive wheel is used to separate individual laminated chips from a strip by cutting through the copper bridging elements. The abrasive wheel is made up of abrasive particles bonded in a matrix having a high glass transition temperature and a cutting edge having a maximum thickness of the order of 350 micron, whereby the cut is substantially straight and free of smears and burrs.

Uniform Thin Films Produced By Magnetorheological Finishing

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US Patent:
20040029493, Feb 12, 2004
Filed:
Aug 6, 2002
Appl. No.:
10/213631
Inventors:
Marc Tricard - Fairport NY, US
William Kordonski - Webster NY, US
International Classification:
B24B001/00
US Classification:
451/036000
Abstract:
An improved method for producing a thin layer having highly uniform thickness, which layer may be pre-coated on an undulating surface of a substrate element. A working layer of the material is formed having a thickness greater than the final thickness desired. An areal (XY) determination of working layer thickness is made by ellipsometry, laser interferometry, or x-ray diffraction, or other known means. A map of thicknesses to be removed from the free surface of the working layer is entered into the control system of a magnetorheological finishing apparatus. The working layer is mounted on a workpiece holder of the apparatus and correctly indexed to the machine. The machine then removes material by magnetorheological finishing as instructed by the control system to leave a residual layer having a very high degree of thickness uniformity at a nominal average thickness and a very high surface integrity.

Photo-Masks For Lithography

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US Patent:
20150286129, Oct 8, 2015
Filed:
Apr 1, 2015
Appl. No.:
14/676460
Inventors:
- Middlefield CT, US
Marc Tricard - Glastonbury CT, US
International Classification:
G03F 1/22
H05G 2/00
G03F 1/48
G03F 1/76
G03F 1/46
Abstract:
A photo-mask for use in extreme ultraviolet (EUV) lithography, in which the photo-mask has low coefficient of thermal expansion and high specific stiffness.
Control profile
Marc J Tricard from Glastonbury, CT, age ~58 Get Report