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Louis Frees Phones & Addresses

  • 4636 Wisteria Cir, Manlius, NY 13104 (315) 682-4346
  • Knoxville, TN

Work

Position: Professional/Technical

Education

Degree: High school graduate or higher

Emails

Public records

Vehicle Records

Louis Frees

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Address:
4636 Wisteria Cir, Manlius, NY 13104
VIN:
1GNDT13S772174410
Make:
CHEVROLET
Model:
TRAILBLAZER
Year:
2007

Publications

Us Patents

Detection Of Nontransient Processing Anomalies In Vacuum Manufacturing Process

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US Patent:
6468814, Oct 22, 2002
Filed:
Jul 21, 1999
Appl. No.:
09/358067
Inventors:
Louis C. Frees - Manlius NY
Valentin Rio - Austin TX
Assignee:
Leybold Inficon, Inc. - East Syracuse NY
International Classification:
H01L 2166
US Classification:
438 14, 438 5, 438 17, 250282, 250283
Abstract:
A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.

Louvered Beam Stop For Lowering X-Ray Limit Of A Total Pressure Gauge

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US Patent:
6476612, Nov 5, 2002
Filed:
Apr 19, 2001
Appl. No.:
09/838402
Inventors:
Robert E. Ellefson - Manlius NY
Louis C. Frees - Manlius NY
Assignee:
Inficon Inc. - East Syracuse NY
International Classification:
G01L 2130
US Classification:
324460, 250281
Abstract:
In an ionization gauge, the effect of X-rays emitted when a collimated electron beam strikes grid surfaces in the gauge structure is reduced by a louvered beam stop. The louvered beam stop creates shadow regions having no X-rays, thus minimizing the amount of X-rays striking the collector plate and reducing the X-ray effect portion of the residual current.

Apparatus For Measuring Total Pressure And Partial Pressure With Common Electron Beam

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US Patent:
6642641, Nov 4, 2003
Filed:
Apr 19, 2001
Appl. No.:
09/838361
Inventors:
Robert E. Ellefson - Manlius NY
Louis C. Frees - Manlius NY
Assignee:
Inficon, Inc. - East Syracuse NY
International Classification:
H01J 4940
US Classification:
3133621, 250282, 250423
Abstract:
An apparatus for determining both total and partial pressures of a gas using one common electron beam includes a partial pressure ionization region and a total pressure ionization region separated by a grid or aperture. A filament produces a plurality of electrons which are focused into an electron beam by a repeller and an aperture or an anode. The interaction between the electron beam and molecules of the gas within the partial pressure and total pressure regions produces first and second ion streams. A focus plate is biased such that the first ion stream is directed to an analyzer which calculates the partial pressure of the gas. An ion collector collects the ions from the second ion stream, where the resulting reference current is used to determine the total pressure of the gas.

Detection Of Nontransient Processing Anomalies In Vacuum Manufacturing Process

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US Patent:
6740195, May 25, 2004
Filed:
Aug 30, 2002
Appl. No.:
10/231536
Inventors:
Louis C. Frees - Manlius NY
Valentin Rio - Austin TX
Assignee:
Leybold Inficon, Inc. - East Syracuse NY
International Classification:
C23F 100
US Classification:
15634524, 15634531, 15634532, 20429803, 20429825, 20429832, 20429835, 118663, 118670, 118679, 118696, 118699, 118703, 118707, 118708, 118712, 118715, 118719
Abstract:
A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.

Replaceable Anode Liner For Ion Source

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US Patent:
7041984, May 9, 2006
Filed:
May 20, 2004
Appl. No.:
10/849765
Inventors:
Robert E. Ellefson - Manlius NY, US
Louis C. Frees - Manlius NY, US
Assignee:
Inficon, Inc. - East Syracuse NY
International Classification:
H01J 27/02
US Classification:
250427, 250423 R, 31511191, 31511181, 60202
Abstract:
A releasable anode liner that is fitted within the interior of the anode of an ion source. The cover permits electrons to be projected into the anode wherein any insulating deposits adhere to the interior of the anode liner, thereby increasing the effective life of the anode without premature replacement or repair.

In-Situ Ion Source Cleaning For Partial Pressure Analyzers Used In Process Monitoring

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US Patent:
20090014644, Jan 15, 2009
Filed:
Jul 10, 2008
Appl. No.:
12/170810
Inventors:
Chenglong Yang - Fremont CA, US
Jeffrey P. Merrill - San Jose CA, US
Louis C. Frees - Manlius NY, US
Steven J. Lakeman - Newbury Park CA, US
Assignee:
Inficon, Inc. - East Syracuse NY
International Classification:
B01D 59/44
US Classification:
250288
Abstract:
An ion source apparatus for partial pressure analyzers and in-situ cleaning method thereof based on inducing a hollow cathode discharge (HCD) inside the ion source. The HCD is formed by applying a high negative voltage to one or more parts of the ion source, including the anode electrode, the lens focus plate and at least one other lens or other form of plate, such as a total pressure collector plate.

Ion Collector Assembly

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US Patent:
60910682, Jul 18, 2000
Filed:
May 4, 1998
Appl. No.:
9/072034
Inventors:
William E. Parfitt - Camillus NY
Timothy L. Karandy - East Syracuse NY
Louis C. Frees - Manlius NY
Robert E. Ellefson - Manlius NY
Assignee:
Leybold Inficon, Inc. - East Syracuse NY
International Classification:
B01D 5944
H01J 4900
US Classification:
250292
Abstract:
An ion collector includes a Faraday collector having a conductive surface disposed substantially parallel to and spaced from the axis of an entering particle beam containing charged and uncharged particles. A grounded plate disposed in the path of the particle beam allows incoming uncharged particles to impinge thereupon. Preferably, the application of a suitable potential to the conductive plate manipulates incoming charged ions to impinge upon either the electron multiplier or the Faraday collector. The ion collector can further include an electron multiplier used in conjunction with the Faraday collector to allow separate modes of operation. Application of a suitable first potential to the electron multiplier can cause charged particles to be deflected directly to the Faraday collector in one mode, and application of a second potential can cause deflection of charged particles to the electron multiplier, with the effects of the uncharged particles on the output of the detector being minimized.

Ion Collecting Electrode For Total Pressure Collector

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US Patent:
58347704, Nov 10, 1998
Filed:
Jul 11, 1997
Appl. No.:
8/891694
Inventors:
David H. Holkeboer - Byron Center MI
Louis C. Frees - Manlius NY
Assignee:
Leybold Inficon, Inc. - East Syracuse NY
International Classification:
H01J 3708
US Classification:
250281
Abstract:
A mass spectrometer gas analyzer includes an ion source for producing ions of a sample gas in a defined ion volume. An ion analyzer collects and analyzes a first portion of the produced ions to determine a partial pressure for a selected gas species within the sample gas. An oppositely disposed ion collector collects a second portion of the ions to determine a total pressure of the contained gas sample. A collecting surface of the ion collector is positioned relative to the incoming ion beam to allow collection of ion current but the surface is configured such that a substantial portion of a plurality of secondary electrons produced by ion bombardment with the ion collector are deflected away from the ionization volume. The partial pressure is thus determined by the ion analyzer without secondary electrons entering the ion analyzer.
Louis C Frees from Manlius, NY, age ~75 Get Report