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Lewis D Meixler

from East Windsor, NJ
Age ~83

Lewis Meixler Phones & Addresses

  • 11 Cherry Brook Ln, Hightstown, NJ 08520 (609) 448-5581
  • East Windsor, NJ

Publications

Us Patents

Radionuclide Detector And Software For Controlling Same

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US Patent:
20050205799, Sep 22, 2005
Filed:
Dec 20, 2004
Appl. No.:
11/017215
Inventors:
Charles Gentile - Plainsboro NJ, US
Lewis Meixler - East Windsor NJ, US
Stephen Langish - Eastampton NJ, US
International Classification:
G01T001/24
US Classification:
250393000
Abstract:
A detector for detecting the presence of suspect radionuclides in a target is disclosed. The detector includes a first detection channel for a first detecting neutron emissions in the target and for providing a first output in accordance with the first detecting, a second detection channel for a second detecting x-ray emissions in the target and for providing a second output in accordance with the second detecting, a third detection channel for a third detecting and an identifying of gamma emissions in the target and for providing a third output in accordance with the third detecting and identifying, a signal manipulation electrically coupled to each of the first, second, and third detection channels, the signal manipulation for receiving the first, second and third outputs and for processing those outputs, and at least one processor electrically coupled to the signal manipulation. The processor determines if the suspect radionuclide is present in the target and provides an alert when the suspect radionuclide is present in the target.

Low Volume Flow Meter

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US Patent:
52183467, Jun 8, 1993
Filed:
May 1, 1991
Appl. No.:
7/694176
Inventors:
Lewis D. Meixler - East Windsor NJ
Assignee:
The United States of America as represented by the United States
Department of Energy - Washington DC
International Classification:
G08B 2100
US Classification:
340606
Abstract:
The low flow monitor provides a means for determining if a fluid flow meets a minimum threshold level of flow. The low flow monitor operates with a minimum of intrusion by the flow detection device into the flow. The electrical portion of the monitor is externally located with respect to the fluid stream which allows for repairs to the monitor without disrupting the flow. The electronics provide for the adjustment of the threshold level to meet the required conditions. The apparatus can be modified to provide an upper limit to the flow monitor by providing for a parallel electronic circuit which provides for a bracketing of the desired flow rate.

Stable Wide Deviation Linear Voltage Controlled Frequency Generator

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US Patent:
40231143, May 10, 1977
Filed:
Sep 29, 1975
Appl. No.:
5/617718
Inventors:
Lewis Donald Meixler - Hightstown NJ
Assignee:
RCA Corporation - New York NY
International Classification:
H03B 304
US Classification:
331 1A
Abstract:
A stable, wide-deviation linear voltage controlled frequency generator including a conventional voltage controlled oscillator (VCO) in a control loop which linearizes the output frequency of the VCO. The control loop includes a crystal oscillator and a digital frequency discriminator. The digital frequency discriminator compares the frequency of the VCO output signal with a stable fixed frequency signal from the crystal oscillator to generate a feedback control signal for the VCO. A novel digital frequency discriminator comprising a digital one shot and a low pass filter is disclosed.

X-Ray Laser Microscope Apparatus

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US Patent:
49792032, Dec 18, 1990
Filed:
Jun 19, 1989
Appl. No.:
7/369206
Inventors:
Szymon Suckewer - Princeton NJ
Darrell S. DiCicco - Plainsboro NJ
Joseph G. Hirschberg - Coral Gables FL
Lewis D. Meixler - East Windsor NJ
Robert Sathre - Princeton NJ
Charles H. Skinner - Lawrenceville NJ
Assignee:
Princeton X-Ray Laser - Monmouth Junction NJ
International Classification:
G21K 700
US Classification:
378206
Abstract:
A microscope consisting of an x-ray contact microscope and an optical microscope. The optical, phase contrast, microscope is used to align a target with respect to a source of soft x-rays. The source of soft x-rays preferably comprises an x-ray laser but could comprise a synchrotron or other pulse source of x-rays. Transparent resist material is used to support the target. The optical microscope is located on the opposite side of the transparent resist material from the target and is employed to align the target with respect to the anticipated soft x-ray laser beam. After alignment with the use of the optical microscope, the target is exposed to the soft x-ray laser beam. The x-ray sensitive transparent resist material whose chemical bonds are altered by the x-ray beam passing through the target mater GOVERNMENT LICENSE RIGHTS This invention was made with government support under Contract No. De-FG02-86ER13609 awarded by the Department of Energy. The Government has certain rights in this invention.
Lewis D Meixler from East Windsor, NJ, age ~83 Get Report