Larry David Thompson

42082110, Jun 17, 1980

May 23, 1978

5/908791

Murrae J. S. Bowden - Summit NJ
Eugene D. Feit - Berkeley Heights NJ
Larry F. Thompson - Gillette NJ
Cletus W. Wilkins - Plainfield NJ

Bell Telephone Laboratories, Incorporated - Murray Hill NJ

G03C 500

430314

Radiation sensitive negative resists with requisite stability for dry processing of integrated circuits are polymerized from aromatic moieties containing halogen atoms. Halogen-aryl bridging, generally carbonaceous, increases sensitivity to radiation. Exemplary materials, copolymers prepared from aromatic and glycidyl methacrylate (GMA) comonomers, are suitable for direct processing of large-scale integrated circuits. While electron beam patterning is contemplated both for direct processing and mask making, radiation such as X-ray and deep u. v. may be used.

41304241, Dec 19, 1978

Jul 1, 1977

5/812231

Eugene D. Feit - Berkeley Heights NJ
Larry F. Thompson - Gillette NJ

Bell Telephone Laboratories, Incorporated - Murray Hill NJ

G03C 171

96 351

Negative resist compositions are based on carbonaceous polymers with substituent branches containing epoxy groupings. Exemplary materials which include, for example, a copolymer of glycidyl methacrylate and ethyl acrylate in which epoxy groupings are unesterified show high sensitivity, for example, to electron radiation and to X-rays. Resolution is sufficient to permit expedient fabrication of detailed resist patterns for integrated circuits. High adherence permits use of acid or base reagents and thermal stability permits use of ion milling for circuit fabrication.

40232085, May 10, 1977

Jul 8, 1976

5/703512

Eugene David Feit - Berkeley Heights NJ
Larry Flack Thompson - Gillette NJ

Bell Telephone Laboratories, Incorporated - Murray Hill NJ

G11B 522

360122

Several materials have been proposed as protective coatings for magnetic sensing heads in magnetic tape readers. Some of these, known for hardness, are not very wear resistant. Others that seem to wear well tend to spall. The invention is a polymer coating that wears exceptionally well, can be formed conveniently to encapsulate the magnetic sensing elements, can be photocured and therefore photopatterned, and is inexpensive. The polymer is composed of a mixture of urethane-modified acrylates and methacrylates.

42620813, Apr 14, 1981

Nov 21, 1979

6/096435

Murrae J. S. Bowden - Summit NJ
Eugene D. Feit - Berkeley Heights NJ
Larry F. Thompson - Gillette NJ
Cletus W. Wilkins - Plainfield NJ

Bell Telephone Laboratories, Incorporated - Murray Hill NJ

G03C 168
G03C 500

430280

Radiation sensitive negative resists with requisite stability for dry processing of integrated circuits are polymerized from aromatic moieties containing halogen atoms. Halogen-aryl bridging, generally carbonaceous, increases sensitivity to radiation. Exemplary materials, copolymers prepared from aromatic and glycidyl methacrylate (GMA) comonomers, are suitable for direct processing of large-scale integrated circuits. While electron beam patterning is contemplated both for direct processing and mask making, radiation such as X-ray and deep u. v. may be used.

50866516, Feb 11, 1992

Sep 19, 1990

7/584734

Bruce Westermo - San Diego CA
Larry D. Thompson - El Cajon CA

G01B 716

73763

Devices and methodology are provided for measuring mechanical strain in a structural member. The devices and methodology utilize a material which undergoes a change in phase when strained so that measurement of the phase change indicates strain. Preferably the phase change material is a transformation induced plasticity steel alloy. The elements may be configured as gauges secured to a structural member, but also the elements may perform as part of the structure. A plurality of elements may be organized into a monitoring system, either passive or active, for a complex structure.

45307270, Jul 23, 1985

Feb 24, 1982

6/351876

Larry D. Thompson - San Diego CA
William R. Johnson - San Diego CA

The United States of America as represented by the Department of Energy - Washington DC

C22F 102

148 2

A method and alloys for fabricating wrought components of a high-temperature gas-cooled reactor are disclosed. These wrought, nickel-based alloys, which exhibit strength and excellent resistance to carburization at elevated temperatures, include aluminum and titanium in amounts and ratios to promote the growth of carburization resistant films while preserving the wrought character of the alloys. These alloys also include substantial amounts of molybdenum and/or tungsten as solid-solution strengtheners. Chromium may be included in concentrations less than 10% to assist in fabrication. Minor amounts of carbon and one or more carbide-forming metals also contribute to high-temperature strength.

43728340, Feb 8, 1983

Jun 19, 1981

6/275426

Robert L. Barns - Berkeley Heights NJ
Edwin A. Chandross - Berkeley Heights NJ
Daniel L. Flamm - Chatham Township, Morris County NJ
Louis T. Manzione - Summit NJ
Larry F. Thompson - Gillette NJ

Bell Telephone Laboratories, Incorporated - Murray Hill NJ

B01J 1908

2041571R

Silicon tetrachloride is processed to ultrahigh purity by subjecting it to a specific succession of purification steps. These steps include the photochlorination of the SiCl. sub. 4 using a reactor that allows a long residence time for the SiCl. sub. 4. After photochlorination, highly volatile products such as HCl are removed and the remaining impurities are then separated by a distillation technique.

57503125, May 12, 1998

May 2, 1994

8/236706

Edwin Arthur Chandross - Berkeley Heights NJ
Omkaram Nalamasu - Basking Ridge NJ
Elsa Reichmanis - Westfield NJ
Gary Newton Taylor - Bridgewater NJ
Larry Flack Thompson - Millington NJ

Lucent Technologies Inc. - Murray Hill NJ

G03C 500
G03F 700

4302731

It has been found that surface reactions with basic materials such as amines found in the processing environment during lithographic processing contribute to a loss of linewidth control for resists such as chemically amplified resists. This loss in linewidth results from the reaction of the acid generated by exposing radiation with, for example, the amine resulting in a lack of chemical reaction where such reaction is desired. The problem is solved in one embodiment by employing an acid containing barrier layer on the resist.