US Patent:
20190279990, Sep 12, 2019
Inventors:
- Grand Cayman, KY
Joseph Versaggi - Galway NY, US
Steven Bentley - Menands NY, US
International Classification:
H01L 27/11
G11C 11/412
G11C 11/419
H01L 51/05
H01L 29/78
H01L 29/06
H01L 27/28
Abstract:
Structures for a bitcell of a two-port static random access memory (SRAM) and methods for forming a structure for a bitcell of a two-port SRAM. A storage element of the SRAM includes a first pull-up (PU) vertical-transport field-effect transistor (VTFET) with a fin, a first pull-down (PD) VTFET with a fin that is aligned in a first row with the fin of the first PU VTFET, a second PU VTFET with a fin, and a second PD VTFET with a fin that is aligned in a second row with the fin of the second PU VTFET. The structure further includes a read port coupled with the storage element. The read port includes a read port pull-down (RPD) VTFET with a fin and a read port access (RPG) VTFET with a fin that is aligned in a third row with the fin of the RPG VTFET.