Joseph H Koestner

39697673, Jul 13, 1976

Apr 2, 1975

5/564406

Donald E. Griffiths - Longmont CO
Joseph H. Koestner - Hopewell Junction NY
David G. Norton - Boulder CO

International Business Machines Corporation - Armonk NY

G11B 5016
G11B 1732
G11B 564

360 99

Semi-rigid washers are coaxially disposed to form an air-permeable spindle for coaxially supporting flexible record disks. A plurality of such washers and disks is coaxially stacked to construct a flexible disk file. Washers preferably have an annular shoulder with a depth slightly different than the thickness of the record disks for firmly supporting and aligning same in the coaxial stack. Alternatively, disks may be adhesively secured to a radial outward portion of each washer. Additionally, each washer has a plurality of radially extending air passageways for facilitating radial air movement which controls the stack of flexible record disks. A radial inward portion of each washer abuts each adjacent washer for forming a firm axial stack of disks. A rigid stabilizing plate at each axial end completes the assembly.

43420907, Jul 27, 1982

Jun 27, 1980

6/163671

George A. Caccoma - Poughkeepsie NY
Joseph H. Koestner - Hopewell Junction NY
Brian C. O'Neill - Millbrook NY
Frank M. Tappen - Plantation FL

International Business Machines Corp. - Armonk NY

G06F 1546

364491

A batch chip placement system for batch positioning semiconductor chips, or the like, upon a substrate containing an array of chip sites or footprints whose actual position on the substrate deviates from the theoretical or nominal position over successive substrates. The positioning is achieved by first sensing the X and Y offsets of a pair of alignment marks on the substrate from their theoretical or nominal position to determine the. DELTA. X and. DELTA. Y correction factors required to obtain the actual X,Y position of the alignment marks. The actual X,Y position of the alignment marks is used to determine actual X,Y chip position values,. theta. rotation and shrinkage factor corrections required to obtain proper orientation and positioning for batch chip placement.

41468104, Mar 27, 1979

Dec 29, 1977

5/865652

William W. Hicks - Wappingers Falls NY
John H. Keller - Newburgh NY
Joseph H. Koestner - Hopewell Junction NY

International Business Machines Corporation - Armonk NY

H01J 724

313 11

In an ion implantation apparatus, a beam defining member such as the acceleration plate is constructed such that the member is maintained at a temperature above the condensation point of the vapor emanating from the source of charged particles, thereby preventing the vapor from condensing on the member and providing a self-cleaning effect.