Inventors:
Ronald L. Spangler - Arlington MA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - Andover MA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US
Assignee:
Cymer, Inc. - San Diego CA
International Classification:
H01J003/10
US Classification:
372 20, 372 25, 372 30, 372 32
Abstract:
An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2. 0 millisecond.