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Jerald A Feldman

from Cherry Hill, NJ
Age ~62
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Related to:
Ryan W Brown, 40David Anderson Brown, 63Ralph A Brown, 93Anne I Breikss, 62Asher N Feldman, 28Aaron Gabriel Feldman, 30
Connected to:
Aaron J Feldmann, 32Adina M Feldman, 62Alanna Feldman, 45Alanna Feldman, 40Alejandro J Feldman, 51Alex J Feldmann, 31Alexandra Feldmann, 51Alvin J Feldman, 82Alyson R Feldman, 42Amy J Feldman, 51

Jerald Feldman Phones & Addresses

  • Cherry Hill, NJ
  • 4403 Channing Rd, Wilmington, DE 19802
  • 16 Cinnamon Dr, Hockessin, DE 19707
  • Cambridge, MA
  • Boston, MA

Resumes

Resumes

Jerald Feldman Photo 1

Fellow Scientist

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Location:
Wilmington, DE
Industry:
Chemicals
Work:
Universal Display Corporation
Fellow Scientist
Science, Technology and Research Institute of Delaware (Stride) Jul 2016 - 2016
Founding Member and Board Member
Dupont Oct 1989 - Jan 2016
Senior Principal Investigator
Education:
Massachusetts Institute of Technology 1985 - 1989
Doctorates, Doctor of Philosophy, Philosophy, Chemistry Cornell University 1981 - 1985
Bachelors, Bachelor of Arts, Chemistry
Skills:
Chemistry
R&D
Polymers
Scientific Writing
Catalysis
Electronic Materials
Organometallic Chemistry
Project Management
Leadership
Science
Intellectual Property
Oled Materials
Photoresist Materials
Laboratory
Nmr
Coatings
Materials Science
Spectroscopy
Organic Chemistry
Research and Development
Characterization
Laboratory Skills
Analytical Chemistry
Nuclear Magnetic Resonance
Interests:
Bird Watching
Hiking With My Dog
Environment
Education
Photography
Science and Technology
Art History
Talmud Study
Languages:
English
Certifications:
Six-Sigma Greenbelt
Jerald Feldman Photo 2

Jerald Feldman

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Skills:
San
Jerald Feldman Photo 3

Jerald Feldman

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Business Records

Name / Title
Company / Classification
Phones & Addresses
Jerald R. Feldman
Vice president
JUMBO REALTY, INC
1001 Watertown St, West Newton, MA 02465
187 Newton St, Weston, MA 02493
Jerald R. Feldman
Manager
OAK SQUARE INVESTORS LLC
251 Newbury St, Boston, MA 02116
Jerald R Feldman
Soc signatory
162 HOWARD AVENUE LLC
1001 Watertown St, West Newton, MA 02465
West Newton, MA 02465
Jerald R. Feldman
President
B.E.J. CORPORATION
1001 Watertown St, West Newton, MA 02465
Jerald R. Feldman
President
NEWTON CENTER RESTAURANT CORP
1001 Watertown St, Newton, MA 02165
187 Newton St, Weston, MA
Jerald Feldman
Treasurer
BERGSIDES & WAIS, INC
99 High St, Boston, MA 02110
519 Lewis Wharf, Boston, MA
Jerald R Feldman
Manager
JAMAICA DEVELOPMENT LLC
45 Sudbury Rd, Weston, MA 02493
1001 Watertown St W, Newton, MA 02165
Jerald R Feldman
Manager
INMAN DEVELOPMENT LLC
45 Sudbury Rd, Weston, MA 02493
1001 Watertown W, Newton, MA 02165

Publications

Us Patents

Photoresists, Polymers And Processes For Microlithography

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US Patent:
6593058, Jul 15, 2003
Filed:
Mar 23, 2001
Appl. No.:
09/806096
Inventors:
Andrew Edward Feiring - Wilmington DE
Jerald Feldman - Hockessin DE
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
G03C 173
US Classification:
4302701, 430325, 430326, 430907, 430914, 430331, 526242, 526250, 526255, 526247, 526249, 526253, 526254
Abstract:
Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresist comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one coralently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths 365 nm. Novel fluorine-containing copolymers are also disclosed.

Polymerization Of Olefins

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US Patent:
6613915, Sep 2, 2003
Filed:
Oct 13, 1999
Appl. No.:
09/417323
Inventors:
Lynda Kaye Johnson - Wilmington DE
Alison Margaret Anne Bennett - Wilmington DE
Lin Wang - Hockessin DE
Anju Parthasarathy - Glenmoore PA
Elisabeth Hauptman - Wilmington DE
Robert D. Simpson - Philadelphia PA
Jerald Feldman - Hockessin DE
Edward Bryan Coughlin - Wilmington DE
Steven Dale Ittel - Wilmington DE
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
C07F 1504
US Classification:
548402, 548561, 548564, 556138, 402162
Abstract:
Selected olefins such as ethylene and -olefins are polymerized by nickel [II] complexes of certain monoanionic ligands. The polyolefins are useful in many applications such as molding resins, film, fibers and others. Also described are many novel nickel compounds and their precursors, as well a novel ligands.

Polyfluorinated Epoxides And Associated Polymers And Processes

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US Patent:
6653419, Nov 25, 2003
Filed:
Oct 3, 2001
Appl. No.:
10/009037
Inventors:
Viacheslav Alexandrovich Petrov - Hockessin DE
Andrew Edward Fiering - Wilmington DE
Jerald Feldman - Hockessin DE
Assignee:
E. .I du Pont de Nemours and Company - Wilmington DE
International Classification:
C08F 1612
US Classification:
526247, 526242, 526243, 528408, 528417, 528421, 549519, 549523, 549524, 549539, 549563
Abstract:
A method for producing partially fluorinated epoxides and corresponding polyether homopolymers of these polyfluorinated epoxides is described. Also described is a method for incorporating a fluoroalcohol functional group into a polymer as a pendant group. Certain perfluorinated olefins are also described. These polyfluorinated epoxides and the associated polymers and methods relating to them are useful components in photoresists, particulary in lithographic photoresists for use at low ultraviolet wavelengths (e. g. , 157 nm).

Fluorinated Polymers, Photoresists And Processes For Microlithography

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US Patent:
6790587, Sep 14, 2004
Filed:
Oct 17, 2001
Appl. No.:
09/959077
Inventors:
Andrew Edward Feiring - Wilmington DE
Jerald Feldman - Hockessin DE
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
G03F 7004
US Classification:
4302701, 430325, 430326, 430907, 526242, 526247, 526281
Abstract:
Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparecy, particularly at short wavelengths, e. g. , 157 nm, which makes them highly useful for lithography at these short wavelengths.

Copolymerization Of Olefins

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US Patent:
6803432, Oct 12, 2004
Filed:
Sep 20, 2002
Appl. No.:
10/251041
Inventors:
Alison Margaret Anne Bennett - Wilmington DE
Jerald Feldman - Hockessin DE
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
C08F 4602
US Classification:
526161, 5261691, 526171, 526172, 526134
Abstract:
Ethylene and/or propylene, and -olefins may be copolymerized by contacting then with certain iron or cobalt complexes of selected 2,6-pyridinecarboxaldehydebis(imines) and 2,6-diacylpyridinebis(imines). The polymers produced, some of which are novel, are useful as molding resins.

Fluorinated Polymers Having Ester Groups And Photoresists For Microlithography

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US Patent:
6884564, Apr 26, 2005
Filed:
Oct 25, 2002
Appl. No.:
10/489799
Inventors:
Andrew E. Feiring - Wilmington DE, US
Jerald Feldman - Wilmington DE, US
Gary Newton Taylor - Northborough MA, US
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
G03F007/004
C08F214/18
C08F010/00
US Classification:
4302701, 430326, 430907, 430910, 526242, 526281, 526245
Abstract:
Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of esters derived from fluoroalcohol functional groups that simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e. g. , 157 nm, which makes them highly useful for lithography at these short wavelengths.

Compositions For Microlithography

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US Patent:
6974657, Dec 13, 2005
Filed:
Oct 16, 2001
Appl. No.:
10/380922
Inventors:
Larry L. Berger - Chadds Ford PA, US
Michael Karl Crawford - Glen Mills PA, US
Jerald Feldman - Wilmington DE, US
Lynda Kaye Johnson - Wilmington DE, US
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
G03F007/038
G03F007/039
C08F232/08
US Classification:
4302701, 430905, 430907, 430322, 430325, 526281, 526242
Abstract:
A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1′-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: —C(R)(R)Orwherein Rand R are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF)wherein n is an integer ranging from 2 to about 10 and Ris a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4. 0 mm−at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.

Copolymerization Of Olefins

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US Patent:
7041764, May 9, 2006
Filed:
Aug 16, 2004
Appl. No.:
10/919181
Inventors:
Alison Margaret Anne Bennett - Wilmington DE, US
Jerald Feldman - Wilmington DE, US
Elizabeth Forrester McCord - Hockessin DE, US
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
C08F 210/16
C08F 4/80
C08F 4/70
US Classification:
526348, 526161, 526172, 5261691, 526171
Abstract:
Ethylene and/or propylene, and α-olefins may be copolymerized by contacting then with certain iron or cobalt complexes of selected 2,6-pyridinecarboxaldehydebis(imines) and 2,6-diacylpyridinebis(imines). The polymers produced, some of which are novel, are useful as molding resins.
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Jerald A Feldman from Cherry Hill, NJ, age ~62 Get Report