Resumes
Resumes
Jay Brandinger Phones & Addresses
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2 Queens Ln, Pennington, NJ 08534 (609) 737-1441 (609) 737-1450
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Chester, VA
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Trenton, NJ
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Andover, NJ
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2 Queens Ln, Pennington, NJ 08534 (609) 713-1390
Work
Position:
Professional/Technical
Education
Degree:
Graduate or professional degree
Emails
Business Records
Name / Title
Company / Classification
Phones & Addresses
Chief Executive Officer
Ja Brand Associates Inc
Business Services
Business Services
2 Queens Ln, Pennington, NJ 08534
(609) 737-1441
(609) 737-1441
President
SUPERCONDUCTOR APPLICATIONS, INC
Cn 5300, Princeton, NJ 08543
Publications
Us Patents
Laser Method For Shaping Of Optical Lenses
View pageUS Patent:
6566627, May 20, 2003
Filed:
Aug 7, 2001
Appl. No.:
09/925067
Inventors:
Jay J. Brandinger - Pennington NJ
Brian D. Hoffman - Princeton NJ
Edward T. Polkowski - Lloyd Harbor NY
Brian D. Hoffman - Princeton NJ
Edward T. Polkowski - Lloyd Harbor NY
Assignee:
Westar Photonics, Inc. - Pennington NJ
International Classification:
B23K 2638
US Classification:
21912169, 264400, 700166
Abstract:
A method for making accurate and precise customized corrections to the surface of an optical lens is described. An electronic correction contour is generated from a measured refractive correction for a patient, and transferred to the surface of the lens by ablation etching with one or more laser pulses. After each of the laser pulses, the refractive properties of the lens are measured and compared to the electronic contour correction derived from a patients refractive correction. The ablation etching is terminated in localized areas where the refractive properties match the electronic correction contour. End point detection includes monitoring refractive qualities of the lens during the recontouring process, modifying the pattern through changes in the laser pulses.
Laser Beam Shaping Device And Apparatus For Material Machining
View pageUS Patent:
6605796, Aug 12, 2003
Filed:
May 25, 2001
Appl. No.:
09/866058
Inventors:
Jay J. Brandinger - Pennington NJ
Brian D. Hoffman - Princeton NJ
Edward T. Polkowski - Lloyd Harbor NY
Brian D. Hoffman - Princeton NJ
Edward T. Polkowski - Lloyd Harbor NY
Assignee:
Westar Photonics - Pennington NJ
International Classification:
B23K 2606
US Classification:
21912167, 21912174
Abstract:
A programmable apparatus for laser beam shaping including a preprogrammable mircomirror array produces a spatial energy distribution suitable for accurately and rapidly marking, machining and processing materials. The preprogrammed micromirror array redistributes the laser output beam energy to produce a desired two-dimensional machining pattern on a work piece. The energy pattern created by the preprogrammed micromirror array is changeable between successive pulses of the laser to create accurate, complex three-dimensional machined shapes in a work piece not easily achieved by conventional machining systems. A special application of this invention is laser beam shaping to produce a uniform spatial energy distribution, i. e. homogenizing the beam from a laser with non-uniform energy distribution. Continuous adjustment of beam shaping is provided to maintain beam homogenization in accordance with changes in laser beam output energy profile.
Modulation Of Laser Energy With A Predefined Pattern
View pageUS Patent:
6605799, Aug 12, 2003
Filed:
May 25, 2001
Appl. No.:
09/865936
Inventors:
Jay J. Brandinger - Pennington NJ
Brian D. Hoffman - Princeton NJ
Edward T. Polkowski - Lloyd Harbor NY
Brian D. Hoffman - Princeton NJ
Edward T. Polkowski - Lloyd Harbor NY
Assignee:
Westar Photonics - Pennington NJ
International Classification:
B23K 2636
US Classification:
21912174, 21912177
Abstract:
A laser machining device is capable of simultaneously machining two- or three dimentional patterns on the surface of a workpiece. A micromirror array positioned within a laser cavity generates a patterned plurality of laser beamlets which can be homogenized and deflected by a second micromirror array onto the surface of a workpiece to create a two-dimensional pattern. Alternatively, the second micromirror array can deflect laser beamlets of unequal energy density to produce a three-dimensional pattern.
Method, System And Product For Producing A Reflective Mask Mirror And For Ablating An Object Using Said Reflective Mask Mirror
View pageUS Patent:
6657157, Dec 2, 2003
Filed:
Jun 7, 2000
Appl. No.:
09/589310
Inventors:
Zino Altman - Newtown PA
Edward Polkowski - Lloyd Harbor NY
Jay Brandinger - Pennington NJ
Brian Hoffman - Princeton NJ
Edward Polkowski - Lloyd Harbor NY
Jay Brandinger - Pennington NJ
Brian Hoffman - Princeton NJ
Assignee:
Westar Photonics, Inc. - Pennington NJ
International Classification:
B23K 2600
US Classification:
21912168, 21912169, 21912174, 21912182, 21912183
Abstract:
There is provided a system and method for ablating a surface of a work-piece comprising a radiation source for providing an ablating beam and a plurality of adjustable reflective masks having predetermined mask patterns thereon. The reflective masks are sequentially positioned relative to said radiation source and in the path of said ablating beam for reflecting said ablating beam onto the surface of the work-piece to ablate the work-piece.
Maskless Laser Beam Patterning Ablation Of Multilayered Structures With Continuous Monitoring Of Ablation
View pageUS Patent:
6696008, Feb 24, 2004
Filed:
May 25, 2001
Appl. No.:
09/865939
Inventors:
Jay J. Brandinger - Pennington NJ
Assignee:
Westar Photonics Inc. - Pennington NJ
International Classification:
B23K 2600
US Classification:
264400, 264482, 21912171, 21912174, 21912175, 21912177, 21912181, 21912183
Abstract:
A maskless patterning apparatus allows for laser beam ablation of one or more layers of material while not etching an underlying different material layer. A micromirror array produces the desired complex pattern on the workpiece and a continuous feature and end point detection system provides location and material parameter changes to accurately control the pattern position and depth of etching. End point detection includes monitoring energy reflected from a specially prepared replica of the material to be ablated, whose thickness and consistency match the active workpiece area. The process terminates when the proper amount of material is removed.