James E Tappan

6998095, Feb 14, 2006

Aug 15, 2003

10/641480

Marc R. Anderson - Sunnyvale CA, US
Michael J. West - Sunnyvale CA, US
James Tappan - Sunnyvale CA, US

Metara, Inc. - Sunnyvale CA

B01L 11/00

422103, 422 81

A loop dilution system includes a dual-loop multi-way valve. In a first configuration of the multi-way valve, a first loop may be filled with a first solution and a second loop may be filled with a second solution. In a second configuration of the multi-way valve, the first and second loops are serially connected with a pump so that their contents may be mixed with a diluent. In another aspect of the invention, an in-process mass spectrometry (IPMS) system is disclosed that uses an internal standard to determine the concentration of an analyte in a sample. The internal standard has a different molecular composition than the analyte but is sufficiently similar chemically and physically to the analyte such that it behaves substantially the same as the analyte during an ionization process in the mass spectrometer.

7132080, Nov 7, 2006

Aug 15, 2003

10/641946

Marc R. Anderson - Sunnyvale CA, US
Michael J. West - Sunnyvale CA, US
James Tappan - Sunnyvale CA, US

Metara, Inc. - Sunnyvale CA

B01L 3/00

422 99, 422267, 422100, 422101, 2104161, 210791, 210767, 2101981, 436177, 436188

An automated matrix removal module is configurable to automatically withdraw a portion of sample containing an interferent. The module is further configurable to mix the portion of sample with a precipitating reagent selected to react with the interferent to form a precipitant and then filter mixture of sample and precipitant reagent through a filter. Finally, the module is further configurable to flush the precipitant from the filter.

7439499, Oct 21, 2008

Mar 22, 2006

11/386389

Thomas H. Bailey - Sunnyvale CA, US
James E. Tappan - Sunnyvale CA, US

Metara, Inc. - Sunnyvale CA

H01J 49/26
H01J 49/04
G01N 11/00

250288, 250285, 250423 R, 250425

In one embodiment, an analytical apparatus is provided that includes a carriage; and a plurality of electrospray probes pivotably mounted on the carriage, wherein movement of the carriage engages a feature with a selected one of the electrospray probes whereby movement of the feature pivots the selected one of the electrospray probes with respect to the carriage.

8038796, Oct 18, 2011

Dec 30, 2004

11/027481

Anthony J. Ricci - Sunnyvale CA, US
Keith Comendant - Fremont CA, US
James Tappan - Fremont CA, US

Lam Research Corporation - Fremont CA

H01L 21/67
H01L 21/02
C23C 14/50

118724, 118725, 15634527, 15634552, 15634553, 361234, 279128

An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate.

8051556, Nov 8, 2011

Sep 22, 2008

12/232673

Anthony J. Ricci - Sunnyvale CA, US
Keith Comendant - Fremont CA, US
James Tappan - Fremont CA, US

Lam Research Corporation - Fremont CA

C23C 14/50
C23C 16/46
H01L 21/00

29757, 361234, 279128, 118725, 15634552

An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate.

8257548, Sep 4, 2012

Jul 3, 2008

12/167987

James E. Tappan - Fremont CA, US

Lam Research Corporation - Fremont CA

C23F 1/00
H01L 21/306
B05C 13/00
B05C 13/02
B05C 21/00
C23C 16/00
B23K 9/00
B23K 9/02

15634554, 15634547, 15634551, 118500, 118723 E, 118728, 118729, 21912143, 21912158

A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed outside a chamber wall of the plasma processing chamber and pivoted relative to the chamber wall. The support plate may have a first thread. The mechanism may also include an adjustment screw having a second thread that engages the first thread. Turning the adjustment screw may cause translation of a portion of the support plate relative to the adjustment screw. The translation of the portion of the support plate may cause rotation of the support plate relative to the chamber wall, thereby rotating the electrode with respect to an axis that is orthogonal to the insertion direction.

8394233, Mar 12, 2013

Aug 1, 2012

13/563931

James E. Tappan - Fremont CA, US

Lam Research Corporation - Fremont CA

C23F 1/00
H01L 21/306
B05C 13/00
B05C 13/02
C23C 16/00
B23K 9/00
B23K 9/02

15634554, 15634547, 15634551, 118500, 118723 E, 118728, 118729, 21912143, 21912158

A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed outside a chamber wall of the plasma processing chamber and pivoted relative to the chamber wall. The support plate may have a first thread. The mechanism may also include an adjustment screw having a second thread that engages the first thread. Turning the adjustment screw may cause translation of a portion of the support plate relative to the adjustment screw. The translation of the portion of the support plate may cause rotation of the support plate relative to the chamber wall, thereby rotating the electrode with respect to an axis that is orthogonal to the insertion direction.

8438712, May 14, 2013

Feb 4, 2009

12/365327

James E. Tappan - Fremont CA, US

Lam Research Corporation - Fremont CA

B23P 19/04
B25B 27/14

29271, 29256, 29255, 29259

An auto-aligning linear motion apparatus is provided. The apparatus includes a leadscrew. The apparatus also includes a nut arrangement configured to surround the leadscrew, wherein the nut arrangement includes at least a nut, a nut bracket, and a floating collar. A shoulder screw is inserted through a nut bracket slot of the nut bracket and a nut slot of the nut to rest at least partially within the floating collar. One dimension of the nut bracket slot is larger than a dimension through a cross-section area of the shoulder screw to enable the shoulder screw to move within the nut bracket slot to adjust the nut arrangement as the leadscrew is rotated to maintain a concentric relationship between the nut arrangement and the leadscrew.