Inventors:
John P. McCormick - Palo Alto CA, US
Ivor G. Barber - Los Gatos CA, US
Kumar Nagarajan - San Jose CA, US
Assignee:
LSI Logic Corporation - Milpitas CA
International Classification:
H01L023/34
H01L023/48
H01L023/52
US Classification:
257728, 257774, 257773, 257737, 257738, 257734, 257778, 257724, 257725, 257691, 257698, 257207, 257208, 257211
Abstract:
An integrated circuit having electrically conductive vias with a diameter of between about one micron and about fifty microns. Prior art vias have a diameter of between no less than 0. 3 microns to no more than 0. 8 microns. In this manner, stresses such as those that press down upon the top surface of the integrated circuit can be absorbed by the large vias and transferred past fragile layers, such as low k layers, so that the fragile layers are not damaged by the stresses.