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Ian M Mcmackin

from Mountain View, CA
Age ~66
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Also known as:
Ian M Mcmackine, Ian Mc Mackin, Ian Mckrackin
Phone and address:
455 W Evelyn Ave STE 1220, Mountain View, CA 94041
Related to:
Lenore J Mcmackin, 62
Connected to:
Alisha D Mcmackin, 42Daniel D Mcmackin, 59Gary R Mcmackin, 72Harry W Mcmackin, 80Megan M Mcmackin, 41Naomi Y Mcmackin, 49Ruby Mcmackin, 105Russ C Mcmackin, 39Sheila S Mcmackin, 70Stephanie W Mcmackin, 59

Ian Mcmackin Phones & Addresses

  • 455 W Evelyn Ave STE 1220, Mountain View, CA 94041
  • 7700 Capital Of Texas Hwy, Austin, TX 78731 (512) 346-8464
  • 7700 N Capital Of Texas Hwy APT 415, Austin, TX 78731
  • 7 Evergreen Dr, Placitas, NM 87043 (505) 867-0291
  • Albuquerque, NM

Resumes

Resumes

Ian Mcmackin Photo 1

Senior Manager: Nano-Imprint Lithography Group, Engineered Optics

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Location:
455 west Evelyn Ave, Mountain View, CA 94041
Industry:
Semiconductors
Work:
Applied Materials Office of the Cto
Senior Manager: Nano-Imprint Lithography Group, Engineered Optics
Rolith, Inc. Oct 2011 - Sep 2014
Vice President Engineering
Consultant 2008 - 2011
Consultant
Molecular Imprints, Inc. 2002 - 2008
Director of Process Technology
Nline Corporation 2000 - 2002
Senior Optical Engineer
Education:
The Institute of Optics, Univ. of Rochester
Doctorates, Doctor of Philosophy
Skills:
Optics
Laser
Semiconductors
Lithography
Process Simulation
Interferometry
Optical Engineering
Thin Films
R&D
Engineering Management
Nanotechnology
Engineering
Simulations
Design of Experiments
Physics
Mems
Characterization
Semiconductor Industry
Metrology
Photolithography
Optical Fiber
Product Development
Research and Development
Management
Microsoft Office
Project Management
Imprint Lithography
Cross Functional Team Leadership
Integration
Applications Development Management
Powerpoint
Ian Mcmackin Photo 2

Ian Mcmackin

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Publications

Us Patents

Scatterometry Alignment For Imprint Lithography

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US Patent:
7027156, Apr 11, 2006
Filed:
Aug 1, 2002
Appl. No.:
10/210785
Inventors:
Michael P. C. Watts - Austin TX, US
Ian McMackin - Austin TX, US
Assignee:
Molecular Imprints, Inc. - Austin TX
International Classification:
G01B 11/00
G03F 9/00
G03C 5/00
US Classification:
356401, 356400, 430 22, 430 30
Abstract:
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.

Single Phase Fluid Imprint Lithography Method

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US Patent:
7090716, Aug 15, 2006
Filed:
Oct 2, 2003
Appl. No.:
10/677639
Inventors:
Ian M. McMackin - Austin TX, US
Nicholas A. Stacey - Austin TX, US
Daniel A. Babbs - Austin TX, US
Duane J. Voth - Austin TX, US
Michael P. C. Watts - Austin TX, US
Van N. Truskett - Austin TX, US
Frank Y. Xu - Austin TX, US
Ronald D. Voisin - Austin TX, US
Pankaj B. Lad - Austin TX, US
Assignee:
Molecular Imprints, Inc. - Austin TX
Board of Regents, The University of Texas System - Austin TX
International Classification:
B01D 19/00
US Classification:
95246, 95263, 96193, 96202, 427350, 427377, 264 85, 264102, 430327, 438909, 425210, 425815, 425DIG 60
Abstract:
The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.

System For Creating A Turbulent Flow Of Fluid Between A Mold And A Substrate

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US Patent:
7270533, Sep 18, 2007
Filed:
Jul 23, 2004
Appl. No.:
10/898037
Inventors:
Ian M. McMackin - Austin TX, US
Nicholas A. Stacey - Austin TX, US
Daniel A. Babbs - Austin TX, US
Duane J. Voth - Austin TX, US
Mathew P. C. Watts - Austin TX, US
Van N. Truskett - Austin TX, US
Frank Y. Xu - Austin TX, US
Ronald D. Voisin - Austin TX, US
Pankaj B. Lad - Austin TX, US
Assignee:
University of Texas System, Board of Regents - Austin TX
Molecular Imprints, Inc. - Austin TX
International Classification:
B29C 59/00
US Classification:
4253871, 425385, 4254051
Abstract:
The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.

System For Controlling A Volume Of Material On A Mold

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US Patent:
7281919, Oct 16, 2007
Filed:
Apr 7, 2005
Appl. No.:
11/101139
Inventors:
Steven C. Shackleton - Austin TX, US
Ian M. McMackin - Austin TX, US
Pankaj B. Lad - Austin TX, US
Van N. Truskett - Austin TX, US
Assignee:
Molecular Imprints, Inc. - Austin TX
International Classification:
B29C 31/00
US Classification:
425216, 425215
Abstract:
A system for controlling a volume of liquid on a mold that features a body defining a volume with an aperture formed into the body and positioned proximate to the mold. A pump system is in fluid communication with the body, and the aperture and the pump system are established to create a stream of fluid moving between the mold and the volume. In this manner a quantity of fluid is removed while retained upon the mold is a desired portion of the fluid to undertake imprint lithographic processes.

Scatterometry Alignment For Imprint Lithography

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US Patent:
7281921, Oct 16, 2007
Filed:
Feb 3, 2006
Appl. No.:
11/347198
Inventors:
Michael P. C. Watts - Austin TX, US
Ian M. McMackin - Austin TX, US
Assignee:
Molecular Imprints, Inc. - Austin TX
International Classification:
B29C 43/58
B29C 59/00
G01B 11/00
US Classification:
425385, 264 401, 356401, 425150, 425171, 4251744
Abstract:
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.

Moat System For An Imprint Lithography Template

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US Patent:
7309225, Dec 18, 2007
Filed:
Aug 13, 2004
Appl. No.:
10/917761
Inventors:
Ian M. McMackin - Austin TX, US
Pankaj B. Lad - Austin TX, US
Assignee:
Molecular Imprints, Inc. - Austin TX
International Classification:
B29C 59/16
B29C 35/08
US Classification:
425215, 425470, 425810, 425385, 264 136
Abstract:
The present invention is directed to a body having a first area and a second area separated by a recess. The recess is dimensioned to reduce, if not prevent, a liquid moving along a surface of the body from traveling between the first and second areas. One or more alignment marks may be positioned within one of the first and second areas. In this manner, the recess functions as a moat by reducing, if not preventing, a quantity of the liquid from being in superimposition with the alignment marks.

Partial Vacuum Environment Imprinting

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US Patent:
7462028, Dec 9, 2008
Filed:
Apr 2, 2007
Appl. No.:
11/695263
Inventors:
Anshuman Cherala - Austin TX, US
Pankaj B. Lad - DeSoto TX, US
Ian M. McMackin - Austin TX, US
Byung-Jin Choi - Austin TX, US
Assignee:
Molecular Imprints, Inc. - Austin TX
International Classification:
B28B 11/08
US Classification:
425385, 425388
Abstract:
The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.

Imprint Lithography Template To Facilitate Control Of Liquid Movement

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US Patent:
7473090, Jan 6, 2009
Filed:
Jun 13, 2007
Appl. No.:
11/762378
Inventors:
Ian M. McMackin - Austin TX, US
Pankaj B. Lad - DeSoto TX, US
Van N. Truskett - Austin TX, US
Assignee:
Molecular Imprints, Inc. - Austin TX
International Classification:
B29C 35/08
US Classification:
425385, 425394, 425403, 425408
Abstract:
The present invention is directed to a template that features a control surface extending from a periphery of a mold toward a recessed surface of the template forming an oblique angle between a portion of the control surface disposed proximate to the periphery.
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Ian M Mcmackin from Mountain View, CA, age ~66 Get Report