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Herbert A Waggener

from Chippewa Falls, WI
Age ~88

Herbert Waggener Phones & Addresses

  • Chippewa Falls, WI
  • Pottersville, NJ
  • Vancouver, WA
  • 7282 178Th St, Chippewa Falls, WI 54729 (715) 720-1152 (715) 720-1964
  • 7282 178Th St, Chippewa Falls, WI 54729 (715) 720-1152

Work

Position: Professional/Technical

Education

Degree: Graduate or professional degree

Publications

Us Patents

Caster Wheel Lift And Brake Assembly

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US Patent:
8539640, Sep 24, 2013
Filed:
Dec 15, 2012
Appl. No.:
13/716102
Inventors:
Herbert A. Waggener - Chippewa Falls WI, US
International Classification:
B60B 33/00
US Classification:
16 18B, 16 35 R
Abstract:
A caster wheel assembly includes a vertical axis brake and barrier-traversing member. The caster shaft housing contains a stator surface adjacent the caster wheel assembly. The barrier-traversing member with barrier contact surface is biasedly fastened to the caster wheel assembly. A braking surface member is attached to the barrier-traversing member opposite the barrier contact surface and adjacent the stator surface. In operation, the moving caster wheel assembly first contacts an obstacle with the barrier contact surface of the barrier-traversing member. The encountered obstacle elevates the barrier-traversing member and attached braking surface member into contact with the stator surface of the caster shaft housing, thereby restraining rotation of the caster wheel assembly. Then, further forward movement of the rotation-restrained caster wheel assembly allows the barrier-traversing member to elevate the caster wheel, transfer load to the caster wheel, and thereby more easily traverse the obstacle.

Method And Apparatus For Sterilizing Medical Devices Using Glow Discharges

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US Patent:
55737323, Nov 12, 1996
Filed:
Sep 8, 1994
Appl. No.:
8/302621
Inventors:
Herbert A. Waggener - Pottersville NJ
Kazimierz Przydzial - Clark NJ
Assignee:
Waggener, Przydzial and Associates - Chippewa Falls WI
International Classification:
B01J 1908
US Classification:
42218606
Abstract:
A medical device having a regular or irregular shape is sterilized in a sterilizing apparatus comprising a means for moveably supporting the medical device, and a electrode having an anode tip at one end thereof which is positioned to form a gap with a predetermined length between the anode tip and the medical device. To sterilize a portion of an outer surface of the medical device at the anode tip of the electrode, predetermined first and second voltages are applied to the anode tip and the medical device, respectively. The voltage and current applied to the anode tip and the medical device are raised to predetermined values to provide a voltage differential across the gap to form a glow discharge adjacent the outer surface of the medical device for sterilizing the outer surface of the medical device. The entire outer surface around the medical device is sterilized by, for example, positioning a plurality of energized electrodes around the medical device to form a continuous band of glow discharges around the medical device. A length of the medical device can be sterilized by moving the medical device and the anode tips of the electrodes relative to each other while forming a sequence of overlapping glow discharges both along a predetermined length and around the outer surface of the medical device.

Stabilizing Support Mechanism For Electron Beam Apparatus

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US Patent:
56441371, Jul 1, 1997
Filed:
Mar 4, 1996
Appl. No.:
8/610749
Inventors:
Herbert A. Waggener - Chippewa Falls WI
Kurt Werder - Hoboken NJ
International Classification:
G01B 902
US Classification:
2504922
Abstract:
An electron beam apparatus is provided with a support mechanism upon which X and Y axis interferometers are mounted within a vacuum chamber. By employing a flat ring of a low coefficient of thermal expansion glass ceramic composition affixed beneath the chamber upper wall and to which the interferometers are mounted, the normal extremes of vacuum and heat as existing within the chamber are resisted to insure of a fixed horizontal alignment of the beams as projected by the interferometers during operation of the apparatus. Flexure mounts are included for the interferometer ring together with a magnetic shield disposed adjacent the ring undersurface. Stability of workpieces is further enhanced by the use of the same glass ceramic composition in the formation of the carrier and its reference plate of the apparatus.

Method For Producing A Semiconductor Device Using An Electron Beam Exposure Tool And Apparatus For Producing The Device

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US Patent:
50251651, Jun 18, 1991
Filed:
Mar 26, 1990
Appl. No.:
7/499153
Inventors:
Chin-Chin Chen - Scotch Plains NJ
Martin Feldman - Baton Rouge LA
Herbert A. Waggener - Pottersville NJ
Assignee:
AT&T Bell Laboratories - Murray Hill NJ
International Classification:
H01J 3720
US Classification:
2504911
Abstract:
Conventional alignment procedures in electron beam (e-beam) direct write systems typically use an e-beam exposure tool as a scanning electron microscope (SEM) to imagine wafer alignment marks. However, electrical charging of the wafer surface by the electron beam can typically result in image distortions which generally can lead to alignment inaccuracies. The inventive method and apparatus advantageously overcome the alignment inaccuracies associated with the charging effects, by optically aligning the wafer to a reference axis of the electron beam. In a preferred embodiment of this invention, light is focused on a diffraction grating on the wafer, used as an alignment mark, and the diffracted light is spatially filtered and detected. Spatially filtering the diffracted light, eliminating the 0th order of the diffracted light, provides increased depth of focus. Also in this particular embodiment, travel of the wafer stage for optical alignment remains below the electron lens column by mounting an optical head (used for directing light onto the wafer, for spatially filtering the diffracted light, and for directing the spatially filtered light to the detection means) to the pole tip of the electron lens column.

Wear Resistant Ball And Socket Joint

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US Patent:
58794077, Mar 9, 1999
Filed:
Jul 17, 1997
Appl. No.:
8/895747
Inventors:
Herbert A. Waggener - Chippewa Falls WI
International Classification:
A61F 232
US Classification:
623 22
Abstract:
A ball and socket joint providing longevity especially suitable for use in implants in human bodies. The ball is designed to incorporate specified strength, hardness, and smoothness characteristics. The socket has a cooperating bearing surface which is less hard than that of the ball. This combination of characteristics lead to maximal mutual bearing contact which minimizes local friction and abrasion. Both components are biologically inert. One component is hydrophilic. The ball is preferably formed from a ceramic, such as a metal or silicon oxide or carbide. The socket preferably has a noble metal alloy liner partially surrounding the ball. The socket further includes an insulator isolating the liner from the socket structural member, should the latter be formed from a different metal. The liner can be formed in complementary segments to avoid fracture or splitting. The liner is either mechanically entrapped by the socket structural member or is adhered thereto.

X-Ray Masks, Their Fabrication And Use

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US Patent:
50200836, May 28, 1991
Filed:
May 19, 1989
Appl. No.:
7/354408
Inventors:
Martin P. Lepselter - Summit NJ
Herbert A. Waggener - Pottersville NJ
Assignee:
Lepton Inc. - Murry Hill NJ
International Classification:
G21K 500
US Classification:
378 35
Abstract:
An X-ray mask for manufacturing chips is produced by forming an X-ray transparent semiconductor membrane with gaps and including X-ray transparent material in the gaps. In one embodiment the opaque material is formed by sputtering Pt onto the semiconductor material to form Pt silicides in the gaps. In another embodiment the semiconductor material is exposed to W in a silane mixture and the W replaces the semiconductor material so that the W projects into the material.

Method For Fabricating X-Ray Masks

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US Patent:
49328727, Jun 12, 1990
Filed:
Jun 16, 1989
Appl. No.:
7/366937
Inventors:
Herbert A. Waggener - Pottersville NJ
Assignee:
Lepton Inc. - Murray Hill NJ
International Classification:
H01L 2130
US Classification:
437225
Abstract:
In the disclosed method, an X-ray mask is made by forming a semiconductor wafer having a first coefficient of expansion, doping a surface of the wafer, metallizing the wafer, metallizing a washer shaped ring having a lower coefficient of expansion, bonding the ring to the doped surface at the periphery of the wafer at or above room temperature, and processing the wafer by removing the undoped substrate and depositing metallic material on the wafer.
Herbert A Waggener from Chippewa Falls, WI, age ~88 Get Report