US Patent:
20200335298, Oct 22, 2020
Inventors:
- Veldhoven, NL
Yanqiu WANG - Fremont CA, US
Xiaodong HE - Beijing, CN
Guofan YE - South San Francisco CA, US
International Classification:
H01J 37/24
H01J 37/141
Abstract:
Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source.